Object stage and hot pressing apparatus

US10286595B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10286595-B2
Application numberUS-201515320027-A
CountryUS
Kind codeB2
Filing dateJan 13, 2015
Priority dateAug 20, 2014
Publication dateMay 14, 2019
Grant dateMay 14, 2019

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An object stage and a hot pressing apparatus are disclosed. The object stage includes a base (1) and a support device (2) fixed on the base (1), wherein the support device (2) includes a plurality of detachable support sub-devices (21); the support device is configured to allow a printed circuit board (3) with at least one protruding structure (4) to be placed thereon, and no support sub-device (21) is disposed at a position on the support device (2) corresponding to the protruding structure (1). The object stage reduces manufacture cost, saves production time and improves production efficiency.

First claim

Opening claim text (preview).

The invention claimed is: 1. An object stage, comprising a base and a support device fixed on the base, wherein the support device comprises a plurality of detachable support sub-devices; and the support device is configured to allow a printed circuit board (PCB) with at least one protruding structure to be placed thereon, and no support sub-device is disposed at a position on the support device corresponding to the protruding structure, wherein the base is provided with an electromagnetic coil on its external surface, wherein the electromagnetic coil is configured to provide the base and the support sub-device with opposite magnetic properties when powered on, so that the base and the support sub-devices are attracted with each other, and wherein the electromagnetic coil is further configured to demagnetize both of the base and the support sub-devices when powered off, so that the base and the support sub-devices are no longer attracted with each other. 2. The object stage of claim 1 , wherein the base is provided with location holes while each of the support sub-devices is provided with a location structure cooperated with one of the location holes in a manner of engaging the location structure into the location hole to fix the support sub-devices onto the base; or the base is provided with location structures while each of the support sub-devices is provided with a location hole cooperated with one of the location structures in a manner of engaging the location structure into the location hole to fix the support sub-devices on the base. 3. The object stage of claim 2 , wherein the location structure is clipped into the location hole. 4. The object stage of claim 1 , wherein a rim is further disposed at an edge of the base and configured to block the support sub-devices so as to prevent the support sub-devices from falling off the base. 5. The object stage of claim 4 , wherein a height of the rim is less than that of the support sub-device. 6. The object stage of claim 1 , wherein the base is provided with first vacuum holes, the support sub-devices are provided with second vacuum holes, and the first vacuum holes are disposed opposite to the second vacuum holes respectively; and the first vacuum holes and the second vacuum holes form vacuum air paths which are configured to absorb the PCB under a vacuum state. 7. The object stage of claim 6 , wherein the first vacuum holes and the second vacuum holes are evenly distributed. 8. The object stage of claim 6 , wherein orthographic projections of the second vacuum holes on the base are exactly consistent with the first vacuum holes, respectively. 9. The object stage of claim 1 , wherein an area of an orthographic projection of the support device on the base is less than or equal to an area of a supporting surface of the base. 10. A hot pressing apparatus, comprising an object stage, the object stage comprises a base and a support device fixed on the base, wherein the support device comprises a plurality of detachable support sub-devices; and the support device is configured to allow a printed circuit board (PCB) with at least one protruding structure to be placed thereon, and no support sub-device is disposed at a position on the support device corresponding to the protruding structure, wherein the base is provided with an electromagnetic coil on its external surface, wherein the electromagnetic coil is configured to provide the base and the support sub-device with opposite magnetic properties when powered on, so that the base and the support sub-devices are attracted with each other, and wherein the electromagnetic coil is further configured to demagnetize both of the base and the support sub-devices when powered off, so that the base and the support sub-devices are no longer attracted with each other. 11. The hot pressing apparatus of claim 10 , wherein the base is provided with location holes while each of the support sub-devices is provided with a location structure cooperated with one of the location holes in a manner of engaging the location structure into the location hole to fix the support sub-devices onto the base; or the base is provided with location structures while each of the support sub-devices is provided with a location hole cooperated with one of the location structures in a manner of engaging the location structure into the location hole to fix the support sub-devices on the base. 12. The hot pressing apparatus of claim 10 , wherein the base is provided with first vacuum holes, the support sub-devices are provided with second vacuum holes, and the first vacuum holes are disposed opposite to the second vacuum holes respectively; and the first vacuum holes and the second vacuum holes form vacuum air paths which are configured to absorb the PCB under a vacuum state. 13. The hot pressing apparatus of claim 11 , wherein the base is provided with first vacuum holes, the support sub-devices are provided with second vacuum holes, and the first vacuum holes are disposed opposite to the second vacuum holes respectively; and the first vacuum holes and the second vacuum holes form vacuum air paths which are configured to absorb the PCB under a vacuum state. 14. The object stage of claim 2 , wherein the base is provided with first vacuum holes, the support sub-devices are provided with second vacuum holes, and the first vacuum holes are disposed opposite to the second vacuum holes respectively; and the first vacuum holes and the second vacuum holes form vacuum air paths which are configured to absorb the PCB under a vacuum state. 15. The hot pressing apparatus of claim 11 , wherein the location structure is clipped into the location hole.

Assignees

Inventors

Classifications

  • Female die used for patterning or transferring, e.g. temporary substrate having recessed pattern · CPC title

  • B29C51/261Primary

    Handling means, e.g. transfer means, feeding means (B29C51/44 takes precedence) · CPC title

  • by applying an anisotropic conductive adhesive layer over an array of pads · CPC title

  • Printed circuits · CPC title

  • Using vacuum or low pressure · CPC title

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What does patent US10286595B2 cover?
An object stage and a hot pressing apparatus are disclosed. The object stage includes a base (1) and a support device (2) fixed on the base (1), wherein the support device (2) includes a plurality of detachable support sub-devices (21); the support device is configured to allow a printed circuit board (3) with at least one protruding structure (4) to be placed thereon, and no support sub-device…
Who is the assignee on this patent?
Boe Technology Group Co Ltd
What technology area does this patent fall under?
Primary CPC classification B29C51/261. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue May 14 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).