Methods for depositing films with organoaminodisilane precursors

Patent metadata

Field	Value
Publication number	US-10283350-B2
Application number	US-201815976028-A
Country	US
Kind code	B2
Filing date	May 10, 2018
Priority date	Jun 1, 2012
Publication date	May 7, 2019
Grant date	May 7, 2019

Abstract

Described herein are precursors and methods for forming silicon-containing films. In one aspect, there is provided a precursor of Formula I:

wherein R 1 is selected from linear or branched C 3 to C 10 alkyl group, linear or branched C 3 to C 10 alkenyl group, linear or branched C 3 to C 10 alkynyl group, C 1 to C 6 dialkylamino group, electron withdrawing group, and C 6 to C 10 aryl group; R 2 is selected from hydrogen, linear or branched C 1 to C 10 alkyl group, linear or branched C 3 to C 6 alkenyl group, linear or branched C 3 to C 6 alkynyl group, C 1 to C 6 dialkylamino group, C 6 to C 10 aryl group, linear or branched C 1 to C 6 fluorinated alkyl group, electron withdrawing group, and C 4 to C 10 aryl group; optionally wherein R 1 and R 2 are linked together to form ring selected from substituted or unsubstituted aromatic ring or substituted or unsubstituted aliphatic ring; and n=1 or 2.

First claim

The invention claimed is:

1. A composition comprising greater than 99.5% by weight pure organoaminodisilane wherein the organoaminodisilane is made by a process comprising reacting disilane with a secondary amine with Formula II:

in the presence of a catalyst, wherein R 1 and R 2 are each independently selected from the group consisting of isopropyl, isobutyl, sec-butyl, tert-butyl, pentyl, iso-pentyl, tert-pentyl, hexyl, iso-hexyl, and neo-hexyl, provided that both R 1 and R 2 are not di-iso-propyl, or R 1 and R 2 may be linked to form a ring.

2. The composition of claim 1 wherein R 1 and R 2 are linked to form a ring selected from the group consisting of
a. pyrrolidino wherein R 1 =propyl and R 2 =Me,
b. piperidino wherein R 1 =propyl and R 2 =Et,
c. 2,6-dimethylpiperidino wherein R 1 =iso-propyl and R 2 =sec-butyl, and
d. 2,5-dimethylpyrrolidino wherein R 1 =R 2 =iso-propyl.

3. The composition of claim 2 wherein R 1 and R 2 are linked to form a pyrrolidino moiety.

4. The composition of claim 2 wherein R 1 and R 2 are linked to form a piperidino moiety.

5. The composition of claim 2 wherein R 1 and R 2 are linked to form a 2, 6-dimethylpiperidino moiety.

6. The composition of claim 2 wherein R 1 and R 2 are linked to form a 2, 5-dimethylpyrrolidino moiety.

7. The composition of claim 1 wherein at least one of R 1 and R 2 is isobutyl.

8. The composition of claim 1 wherein at least one of R 1 and R 2 is sec-butyl.

9. The composition of claim 1 wherein at least one of R 1 and R 2 is tert-butyl.

10. The composition of claim 1 wherein at least one of R 1 and R 2 is pentyl.

11. The composition of claim 1 wherein at least one of R 1 and R 2 is iso-pentyl.

12. The composition of claim 1 wherein at least one of R 1 and R 2 is tert-pentyl.

13. The composition of claim 1 wherein at least one of R 1 and R 2 is hexyl.

14. The composition of claim 1 wherein at least one of R 1 and R 2 is neo-pentyl.

Assignees

• Versum Mat Us Llc

Inventors

• Xiao Manchao
• Lei Xinjian
• Spence Daniel P
• Chandra Haripin
• Han Bing
• O'Neill Mark Leonard
• Mayorga Steven Gerard
• Mallikarjunan Anupama

Classifications

• H10P14/69433

  the material being a silicon nitride not containing oxygen, e.g. SixNy or SixByNz · CPC title

• H10P14/69215

  the material being a silicon oxide, e.g. SiO2 · CPC title

• H10P14/6922

  the material containing Si, O and at least one of H, N, C, F or other non-metal elements, e.g. SiOC, SiOC:H or SiONC · CPC title

• H10P14/6905

  being a silicon carbide or silicon carbonitride and not containing oxygen, e.g. SiC or SiC:H · CPC title

• H10P14/6687

  the compound comprising silicon and nitrogen · CPC title