Pellicle for preventing thermal accumulation and extreme ultra-violet lithography apparatus having the same

Patent metadata

Field	Value
Publication number	US-10274820-B2
Application number	US-201815919653-A
Country	US
Kind code	B2
Filing date	Mar 13, 2018
Priority date	May 13, 2015
Publication date	Apr 30, 2019
Grant date	Apr 30, 2019

Abstract

A pellicle for lithography processes, including extreme ultraviolet (EUV) lithography may mitigate thermal accumulation in a membrane of the pellicle. The pellicle includes a membrane and at least one thermal buffer layer on at least one surface of the membrane. An emissivity of the thermal buffer layer may be greater than an emissivity of the membrane. A carbon content of the thermal buffer layer may be greater than a carbon content of the membrane. Multiple thermal buffer layers may be on separate surfaces of the membrane, and the thermal buffer layers may have different properties. A capping layer may be on at least one thermal buffer layer, and the capping layer may include a hydrogen resistant material. A thermal buffer layer may extend over some or all of a surface of the membrane. A thermal buffer layer may be between at least two membranes.

First claim

What is claimed is:

1. A pellicle comprising:
a first membrane configured to be on an optical pattern of a reticle;
a second membrane on the first membrane; and
an inner thermal buffer layer between the first membrane and the second membrane, the inner thermal buffer layer associated with an emissivity, the emissivity of the inner thermal buffer layer being greater than each of an emissivity of the first membrane and an emissivity of the second membrane,
wherein the pellicle is configured to be on the reticle during EUV lithography, such that EUV light passes through the second membrane, the inner thermal buffer layer, and the first membrane to be reflected from the optical pattern in the reticle, heat is generated at the first membrane based on the EUV light passing through the first membrane, heat is generated at the second membrane based on the EUV light passing through the second membrane, and the inner thermal buffer layer discharges the heat generated at the first membrane and the heat generated at the second membrane to an external environment based on the inner thermal buffer layer being associated with the emissivity that is greater than each of the emissivity of the first membrane and the emissivity of the second membrane.

2. The pellicle of claim 1 , wherein sides of the inner thermal buffer layer are vertically aligned with sides of the first membrane and sides of the second membrane.

3. The pellicle of claim 1 , further comprising:
a first outer thermal buffer layer on the first membrane, the first outer thermal buffer layer associated with an emissivity, the emissivity of the first outer thermal buffer layer being greater than the emissivity of the first membrane; and
a second outer thermal buffer layer on the second membrane, the second outer thermal buffer layer associated with an emissivity, the emissivity of the second outer thermal buffer layer being greater than the emissivity of the second membrane.

4. The pellicle of claim 3 , wherein the emissivity of the second outer thermal buffer layer equals the emissivity of the first outer thermal buffer layer.

5. The pellicle of claim 3 , wherein a vertical thickness of the inner thermal buffer layer is lower than a vertical thickness of the first outer thermal buffer layer and a vertical thickness of the second outer thermal buffer layer.

6. The pellicle of claim 5 , wherein the vertical thickness of the second outer thermal buffer layer equals the vertical thickness of the first outer thermal buffer layer.

7. The pellicle of claim 3 , further comprising:
a first capping layer on the first outer thermal buffer layer, the first capping layer including a first amount of carbon, the first amount of carbon being lower than an amount of carbon included in the first outer thermal buffer layer; and
a second capping layer on the second outer thermal buffer layer, the second capping layer including a second amount of carbon, the second amount of carbon being lower than an amount of carbon included in the second outer thermal buffer layer.

8. The pellicle of claim 7 , wherein the amount of the carbon included in the second capping layer equals the amount of carbon included in the first capping layer.

9. The pellicle of claim 7 , wherein a vertical thickness of the first capping layer is lower than a vertical thickness of the first outer thermal buffer layer, and a vertical thickness of the second capping layer is lower than a vertical thickness of the second outer thermal buffer layer.

10. The pellicle of claim 9 , wherein the vertical thickness of the second capping layer equals the vertical thickness of the first capping layer.

11. A pellicle comprising:
a membrane; and
a thermal buffer layer on a surface of the membrane, the thermal buffer layer including a first carbon content, the first carbon content being greater than a carbon content of the membrane.

12. The pellicle of claim 11 , wherein a vertical thickness of the thermal buffer layer is different than a vertical thickness of the membrane.

13. The pellicle of claim 11 , further comprising:
a capping layer, wherein the thermal buffer layer is between the membrane and the capping layer, and the first carbon content is greater than a carbon content of the capping layer.

14. The pellicle of claim 11 , wherein
the thermal buffer layer is associated with a first emissivity; and
the first emissivity is greater than an emissivity of the membrane.

15. The pellicle of claim 14 , wherein
the membrane includes a first membrane and a second membrane, the second membrane on the first membrane;
the thermal buffer layer is between the first membrane and the second membrane; and
the first emissivity is greater than each of an emissivity of the first membrane and an emissivity of the second membrane.

Assignees

• Samsung Electronics Co Ltd

Inventors

• Jeon Hwanchul
• Kim Munja
• Kwon Sungwon
• Kim Byunggook
• Chalykh Roman
• Jung Yongseok
• Choi Jaehyuck

Classifications

• G03F7/70983

  Optical system protection, e.g. pellicles or removable covers for protection of mask · CPC title

• G03F1/64 Primary

  characterised by the frames, e.g. structure or material, including bonding means therefor · CPC title

• G03F1/62

  Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof · CPC title

• G03F7/2004 Primary

  characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light · CPC title