Divisional exposure apparatus and method of manufacturing liquid crystal display using the same

Patent metadata

Field	Value
Publication number	US-10274760-B2
Application number	US-201715499678-A
Country	US
Kind code	B2
Filing date	Apr 27, 2017
Priority date	Apr 28, 2016
Publication date	Apr 30, 2019
Grant date	Apr 30, 2019

Abstract

Disclosed are a divisional exposure apparatus which allows for forming a PAC layer uniformly on RGBW subpixels by a single mask process, using divisional exposure, in a large-size liquid crystal display with a COT structure, and a method of manufacturing a liquid crystal display using the same. To this end, the sum of illumination intensities at the center of an overlap region is controlled in the range of 120% to 130%, and gradually increases from 100% at the edge (boundary) of the overlap region. Accordingly, the cell gap between the RGB subpixels and the W subpixel is made uniform, thus preventing the problem of spots.

First claim

What is claimed is:

1. A divisional exposure apparatus for exposing a substrate to light in a divided fashion by emitting the light in a light illumination pattern by multiple scans, the divisional exposure apparatus comprising a blade having a bottom edge obliquely crossing the light illumination pattern that is located at one side of the light illumination pattern in an overlap region where scans overlap and that controls a light exposure energy or an illumination intensity depending on a position of the illuminated light,
wherein the overlap region is divided into at least first and second regions, on which the light illuminates, the first and second regions having different rates of increase in the illumination intensity, and minimum and maximum illumination intensities of a non-overlap region are 0% and 100%, respectively.

2. The divisional exposure apparatus of claim 1 , wherein an edge of the overlap region is controlled to have one of the illumination intensities being 100% and the other illumination intensity being 0%.

3. The divisional exposure apparatus of claim 1 , wherein the blade has a curvature at the bottom edge to block the light illumination pattern.

4. The divisional exposure apparatus of claim 3 , wherein a part where the light illumination pattern and the bottom edge meets constitutes the overlap region.

5. The divisional exposure apparatus of claim 3 , wherein, in the second region, the bottom edge of the blade is cut upward, and in the first region, the bottom edge is cut at an angle towards the second region from a point where the light illumination pattern and the bottom edge meet.

6. The divisional exposure apparatus of claim 3 , further comprising an auxiliary blade, corresponding to the part that is obliquely cut towards the second region.

7. The divisional exposure apparatus of claim 6 , wherein the auxiliary blade is installed in the first region.

8. The divisional exposure apparatus of claim 3 , wherein a sum of the illumination intensities at a center of the overlap region is constant, and when the position moves by increments of 1 mm, the illumination intensity of Scan 1 increases by increments of 1% while the illumination intensity of Scan 2 which overlaps Scan 1 decreases by increments of 1%.

9. The divisional exposure apparatus of claim 8 , wherein, at the edge of the overlap region, when the position moves by increments of 3 mm, the illumination intensity of Scan 1 increases by increments of 1% while the illumination intensity of Scan 2 decreases by increments of 1%.

10. The divisional exposure apparatus of claim 8 , wherein the illumination intensity of Scan 1 increases from 0.0% to 2.0% by increments of 1.0% when the position moves by increments of 1 mm in the range of 1 mm to 3 mm, increases from 2.0% to 3.5% by an increment of 1.5% when the position moves in the range of 3 mm to 4 mm, increases from 3.5% to 15.5% by increments of 2.0% when the position moves by increments of 1 mm in the range of 4 mm to 10 mm, increases from 15.5% to 20.5% by increments of 2.5% when the position moves by increments of 1 mm in the range of 10 mm to 12 mm, increases from 20.5% to 23.5% by an increment of 3.0% when the position moves in the range of 12 mm to 13 mm, and increases from 23.5% to 28.5% by increments of 2.5% when the position moves by increments of 1 mm in the range of 13 mm to 15 mm, increases from 28.5% to 38.5% by increments of 2.0% when the position moves by increments of 1 mm in the range of 15 mm to 20 mm, and increases from 38.5% to 40.0% by increments of 1.5% when the position moves in the range of 20 mm to 21 mm.

11. The divisional exposure apparatus of claim 10 , wherein the illumination intensity of Scan 2 decreases from 100.0% to 80.0% by decrements of 1.0% when the position moves by increments of 1 mm in the range of 1 mm to 21 mm.

12. The divisional exposure apparatus of claim 1 , wherein a sum of the illumination intensities at an edge of the overlap region has a linear shape or a shape of a cubic polynomial curve having an inflection point, in the range of 100% to 120%.

13. The divisional exposure apparatus of claim 1 , wherein the overlap region is divided into a 1-1 region, a 1-2 region, a 1-3 region, and a second region for different illumination intensities of different scans, and the 1-1, 1-2, 1-3, and second regions are linear with different slopes.

14. The divisional exposure apparatus of claim 13 , wherein the illumination intensity of Scan 1 increases from 0.0% to 10.0% by increments of 1.0% when the position moves by increments of 1 mm in the range of 1 mm to 11 mm in the 1-1 region, increases from 10.0% to 40.0% by increments of 1.5% when the position moves by increments of 1 mm in the range of 11 mm to 31 mm in the 1-2 region, increases from 40.0% to 90.0% by increments of 1.0% when the position moves by increments of 1 mm in the range of 31 mm to 81 mm in the second region, and increases from 90.0% to 100% in increments of 0.5% when the position moves by increments of 1 mm in the range of 81 mm to 101 mm in the 1-3 region.

15. The divisional exposure apparatus of claim 14 , wherein the illumination intensity of Scan 2 decreases from 100.0% to 90.0% by decrements of 0.5% when the position moves by increments of 1 mm in the range of 1 mm to 21 mm, decreases from 90.0% to 40.0% by decrements of 1.0% when the position moves by increments of 1 mm in the range of 21 mm to 71 mm, decreases from 40.0% to 10.0% by decrements of 1.5% when the position moves by increments of 1 mm in the range of 71 mm to 91 mm, and decreases from 10.0% to 0.0% by decrements of 1.0% when the position moves by increments of 1 mm in the range of 91 mm to 101 mm.

16. The divisional exposure apparatus of claim 1 , wherein, when the position moves by increments of 1 mm in the range of 1 mm to 41 mm, the illumination intensity of Scan 1 increases from 0.0% to 40.0% by increments of 1.0% while the illumination intensity of Scan 2 decreases from 100.0% to 80.0% by decrements of 0.5%, when the position moves by increments of 1 mm in the range of 41 mm to 81 mm, the illumination intensity of Scan 1 increases from 40.0% to 80.0% by increments of 1% while the illumination intensity of Scan 2 decreases from 80% to 40.0% by decrements of 1%, and when the position moves by increments of 1 mm in the range of 81 mm to 121 mm, the illumination intensity of Scan 1 increases from 80.0% to 100.0% by increments of 0.5% while the illumination intensity of Scan 2 decreases from 40.0% to 0.0% by decrements of 1.0%.

17. A divisional exposure apparatus for exposing a substrate to light in a divided fashion by emitting light in a light illumination pattern by multiple scans, the divisional exposure apparatus comprising a blade having a bottom edge obliquely crossing the light illumination pattern that is located at one side of the light illumination pattern in an overlap region where scans overlap and that controls a light exposure energy or an illumination intensity depending on a position of the illuminated light,
wherein the blade serves to control a sum of the illumination intensities at a center of the overlap region in the range of 120% to 130%, where minimum and maximum illumination intensities of a non-overlap region are 0% and 100%, respectively.

18. The divisional exposure apparatus of claim 17 , wherein the light exposure energy for the edge of the overlap region is controlled to have one of the illumination intensities being 100% and the other illumination intensity being 0%.

19. The divisional exposure apparatus

Assignees

• Lg Display Co Ltd

Inventors

• Lee Donghyun

Classifications

• G02F2001/136222

  Physics · mapped topic

• G02F1/1368

  in which the switching element is a three-electrode device {(G02F1/136277 takes precedence)} · CPC title

• G02F2001/136236

  Physics · mapped topic

• G02F1/1303 Primary

  Apparatus specially adapted to the manufacture of LCDs · CPC title

• G03F7/70083

  Non-homogeneous intensity distribution in the mask plane · CPC title