Manufacturing method of micro-nano structure antireflective coating layer and display apparatus thereof

Patent metadata

Field	Value
Publication number	US-10274645-B2
Application number	US-201615325448-A
Country	US
Kind code	B2
Filing date	Dec 28, 2016
Priority date	Nov 22, 2016
Publication date	Apr 30, 2019
Grant date	Apr 30, 2019

Abstract

A manufacturing method of micro-nano structure antireflective coating layer and a display apparatus thereof are described. The method includes providing a substrate, forming a silicon oxide layer on the substrate, forming a graphene layer with a hexagonal honeycomb lattice on the silicon oxide layer, and forming a bottom surface of the antireflective coating layer in the nucleation points by serving the graphene layer as a growing base layer, wherein a diffusion length and an atomic mass of diffusion atoms of the antireflective coating layer are decreased with time by a gradient growing manner to form a upper surface of the antireflective coating layer.

First claim

What is claimed is:

1. A method of manufacturing a micro-nano structure antireflective coating layer, comprising:
providing a substrate;
forming a silicon oxide layer on the substrate, wherein the silicon oxide layer comprises a plurality of holes which provide a plurality of nucleation points of an antireflective coating layer;
forming a graphene layer with a hexagonal honeycomb lattice on the silicon oxide layer; and
forming a bottom surface of the antireflective coating layer in the nucleation points whereby the graphene layer serves as a growing base layer so that the bottom surface is a hexagonal shape, wherein a diffusion length and an atomic mass of diffusion atoms of the antireflective coating layer are decreased with time by a gradient growing manner to form a upper surface of the antireflective coating layer;
wherein the gradient growing manner comprises a growth temperature adjustment and a control concentration of a growth source, and wherein a material of the antireflective coating layer is either zinc oxide or silicon.

2. The method of manufacturing the micro-nano structure antireflective coating layer of claim 1 , wherein a formation the graphene layer is selected from one group consisting of a chemical vapor deposition method, an epitaxially silicon carbide extension in a temperature annealing manner, and an epitaxially single crystal metal surface extension manner.

3. The method of manufacturing the micro-nano structure antireflective coating layer of claim 1 , wherein a shape of the upper surface is either a hexagonal or circular shape.

4. The method of manufacturing the micro-nano structure antireflective coating layer of claim 3 , wherein an area of the bottom surface is greater than an area of the upper surface.

5. The method of manufacturing the micro-nano structure antireflective coating layer of claim 1 , wherein a diameter of the bottom surface has a range from 100 to 900 nanometers.

6. The method of manufacturing the micro-nano structure antireflective coating layer of claim 1 , wherein a distance between the bottom surface and the upper surface has a range from 100 to 1000 nanometers.

7. A method of manufacturing a micro-nano structure antireflective coating layer, comprising:
providing a substrate;
forming a silicon oxide layer on the substrate, wherein the silicon oxide layer comprises a plurality of holes which provide a plurality of nucleation points of an antireflective coating layer;
forming a graphene layer with a hexagonal honeycomb lattice on the silicon oxide layer; and
forming a bottom surface of the antireflective coating layer in the nucleation points whereby the graphene layer serves as a growing base layer so that the bottom surface is a hexagonal shape, wherein a diffusion length and an atomic mass of diffusion atoms of the antireflective coating layer are decreased with time by a gradient growing manner to form a upper surface of the antireflective coating layer.

8. The method of manufacturing the micro-nano structure antireflective coating layer of claim 7 , wherein the gradient growing manner comprises a growth temperature adjustment and a control concentration of a growth source.

9. The method of manufacturing the micro-nano structure antireflective coating layer of claim 7 , wherein a material of the antireflective coating layer is either zinc oxide or silicon.

10. The method of manufacturing the micro-nano structure antireflective coating layer of claim 7 , wherein a formation the graphene layer is selected from one group consisting of a chemical vapor deposition method, an epitaxially silicon carbide extension in a temperature annealing manner, and an epitaxially single crystal metal surface extension manner.

11. The method of manufacturing the micro-nano structure antireflective coating layer of claim 7 , wherein a shape of the upper surface is either a hexagonal or circular shape.

12. The method of manufacturing the micro-nano structure antireflective coating layer of claim 11 , wherein an area of the bottom surface is greater than an area of the upper surface.

13. The method of manufacturing the micro-nano structure antireflective coating layer of claim 11 , wherein a distance between the bottom surface and the upper surface has a range from 100 to 1000 nanometers.

14. The method of manufacturing the micro-nano structure antireflective coating layer of claim 7 , wherein a diameter of the bottom surface has a range from 100 to 900 nanometers.

Assignees

• Wuhan China Star Optoelectronics Technology Co Ltd

Inventors

• Zha Guowei

Classifications

• C03C17/23

  Oxides (C03C17/02 takes precedence) · CPC title

• C03C17/3441

  comprising carbon, a carbide or oxycarbide · CPC title

• G02B1/118

  having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures · CPC title

• C03C2217/734

  comprising an alternation of high and low refractive indexes · CPC title

• C01B2204/20

  Graphene characterized by its properties · CPC title