Hard surface cleaners comprising a copolymer

US10273436B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10273436-B2
Application numberUS-201715481487-A
CountryUS
Kind codeB2
Filing dateApr 7, 2017
Priority dateApr 8, 2016
Publication dateApr 30, 2019
Grant dateApr 30, 2019

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

The need for a liquid hard surface cleaning composition which provides reduced drying time is met by formulating the composition using copolymer comprising non-ionic monomeric units, a low level of cationic monomeric units, and other optional monomers.

First claim

Opening claim text (preview).

What is claimed is: 1. A hard surface cleaning composition comprising a copolymer, wherein the hard surface composition comprises: a) from about 0.1 to about 25 wt % of an ethoxylated non-ionic surfactant b) from about 0.1 to about 7 wt % of the copolymer comprises: i. from about 80 to about 90% by weight of at least one monoethylenically unsaturated polyalkylene oxide monomer of the formula I (monomer A)  in which the variables have the following meanings: X is —CO; Y is —O—; R 1 is hydrogen; R 2 is ethylene, linear or branched propylene or mixtures thereof; R 3 is methyl; n is an integer from 20 to 50, ii. from about 5 to about 20% by weight of at least one quaternized nitrogen-containing monomer, selected from the group consisting of at least one of the monomers of the formula IIa to IIc (monomer B)  in which the variables have the following meanings: R is C1-C4 alkyl or benzyl; R′ is hydrogen or methyl; Y —NH—; A is C1-C6 alkylene; X − is halide, C1-C4-alkyl sulfate, C1-C4-alkylsulfonate and C1-C4-alkyl carbonate, iii. from about 1 to about 5% by weight of at least one anionic monoethylenically unsaturated monomer (monomer C), and iv. from about 5 to about 20% by weight of at least one other non-ionic monoethylenically unsaturated monomer (monomer D), wherein: the weight ratio of Monomer A to Monomer B is from 3:1 to 5:1, the molar ratio of monomer B to monomer C is greater than about 1, the copolymer has a weight average molecular weight (Mw) from about 20,000 g/mol to about 500,000 g/mol, and the copolymer and the non-ionic surfactant are present in a weight ratio of from about 0.03 to about 0.5, wherein the pH is from about 10.0 to about 11. 2. The hard surface cleaning composition according to claim 1 , wherein the weight ratio of monomer B to monomer C is greater than about 1. 3. The hard surface cleaning composition according to claim 1 wherein monomer B is a salt of 3-methyl-1-vinylimidazolium. 4. The hard surface cleaning composition according to claim 1 wherein monomer A is methylpolyethylene glycol (meth)acrylate. 5. The hard surface cleaning composition according to claim 1 wherein monomer A is methylpolyethylene glycol (meth)acrylate and wherein monomer B is a salt of 3-methyl-1-vinylimidazolium, and monomer D is N-vinylimidazole. 6. The hard surface cleaning composition according to claim 1 wherein the composition further comprises: from about 0.05 wt % to about 6 wt % of the composition of amine oxide surfactant, and from about 0.05 wt % to about 5 wt % of an anionic surfactant. 7. The hard surface cleaning composition according to claim 6 , wherein the composition comprises: a) from about 0.05 to about 3 wt % of the copolymer; b) from about 4.0 wt % to about 9.0 wt % of the non-ionic surfactant; c) from about 0.1 wt % to about 4.5 wt % of the composition of amine oxide surfactant, and d) from about 1.5 wt % to about 3.5 wt % of an anionic surfactant. 8. A method of improving shine of treated hard surfaces, the method comprising the following steps: a) diluting a liquid hard surface cleaning composition of claim 1 ; and b) applying the liquid hard surface cleaning composition to a hard surface. 9. The method according to claim 8 , subsequently comprising the step of rinsing. 10. The method according to claim 8 , wherein the liquid hard surface cleaning composition is sprayed onto the hard surface. 11. The method according to claim 8 , wherein the method also reduces the drying time of treated hard surfaces.

Assignees

Inventors

Classifications

  • Quaternary ammonium compounds · CPC title

  • Chemistry & Metallurgy · mapped topic

  • C11D3/3776Primary

    Heterocyclic compounds, e.g. lactam · CPC title

  • Mixtures of non-ionic with anionic compounds · CPC title

  • Amino oxides · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10273436B2 cover?
The need for a liquid hard surface cleaning composition which provides reduced drying time is met by formulating the composition using copolymer comprising non-ionic monomeric units, a low level of cationic monomeric units, and other optional monomers.
Who is the assignee on this patent?
Procter & Gamble
What technology area does this patent fall under?
Primary CPC classification C11D3/3776. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Apr 30 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).