Hall current plasma source having a center-mounted cathode or a surface-mounted cathode

US10269526B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10269526-B2
Application numberUS-201815901763-A
CountryUS
Kind codeB2
Filing dateFeb 21, 2018
Priority dateFeb 3, 2017
Publication dateApr 23, 2019
Grant dateApr 23, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

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A miniature Hall current plasma source apparatus having magnetic shielding of the walls from ionized plasma, an integrated discharge channel and gas distributor, an instant-start hollow cathode mounted to the plasma source, and an externally mounted keeper, is described. The apparatus offers advantages over existing other Hall current plasma sources having similar power levels, including: lower mass, longer lifetime, lower part count including fewer power supplies, and the ability to be continuously adjustable to lower average power levels using pulsed operation and adjustment of the pulse duty cycle. The Hall current plasma source can provide propulsion for small spacecraft that either do not have sufficient power to accommodate a propulsion system or do not have available volume to incorporate the larger propulsion systems currently available. The present low-power Hall current plasma source can be used to provide energetic ions to assist the deposition of thin films in plasma processing applications.

First claim

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What is claimed: 1. A Hall current plasma source, comprising: a cylindrical magnetizable core having a first end, a second end, and a first axis, said cylindrical magnetizable core having an outer surface and a channel therethrough between the first end and the second end along the first axis; a conducting wire coil wound around the outer surface of said cylindrical magnetizable core; a first cylindrical magnetic screen having a second axis collinear with the first axis enclosing said conducting wire coil, said first cylindrical magnetic screen having an outer diameter; a hollow cathode discharge apparatus adapted to ionize a first chosen gas, comprising: a tube disposed in the channel of said cylindrical magnetizable core and electrically insulated from the cylindrical magnetizable core, the tube having a first end and a second end and an inside surface having an insert of low-work-function material attached to the inside surface of said tube, the first end of said tube adapted to receive the first chosen gas; and a keeper element having a hole therethrough for permitting the first chosen gas from said tube to pass therethrough, said keeper element being electrically isolated from said tube; a second cylindrical magnetic screen having a third axis collinear with the first axis, and an inner diameter which is larger than the outer diameter of said first cylindrical magnetic screen, forming an annular region therebetween; at least one cylindrical anode band disposed in the annular region; an annular ion channel having an open end and a closed end formed in the annular region adapted to electrically isolate said first cylindrical magnetic screen and said second cylindrical magnetic screen from said at least one cylindrical anode band; and a gas plenum adapted to receive a second chosen gas and for distributing the second chosen gas into said annular ion channel. 2. The Hall current plasma source of claim 1 , further comprising a flat end plate having a first side and an opposing second side, the first end of the cylindrical magnetizable core being attached to the second side of the flat end plate, wherein said flat end plate comprises magnetizable material. 3. The Hall current plasma source of claim 1 , wherein said annular ion channel is fabricated from materials chosen from polycarbonate, polyether ether ketone, PEEK, graphite, boron nitride, and petalite ceramic. 4. The Hall current plasma source of claim 1 , wherein said low-work-function material comprises 12CaO-7Al 2 O 3 . 5. The Hall current plasma source of claim 1 , wherein the first chosen gas and the second chosen gas comprise the same gas. 6. The Hall current plasma source of claim 1 , wherein the annular ion channel is tapered such that it is wider toward the open end thereof. 7. A Hall current plasma source, comprising: a cylindrical magnetizable core having a first end and a second end and a first axis, said cylindrical magnetizable core having an outer surface; a conducting wire coil wound around the outer surface of said cylindrical magnetizable core; a first cylindrical magnetic screen having a second axis collinear with the first axis enclosing said conducting wire coil, said first cylindrical magnetic screen having an outer diameter; a second cylindrical magnetic screen having a third axis collinear with the first axis, and an inner diameter which is larger than the outer diameter of said first cylindrical magnetic screen, forming an annular region therebetween; at least one cylindrical anode band disposed in the annular region; an annular ion channel having an open end and a closed end formed in the annular region adapted to electrically isolate said first cylindrical magnetic screen and said second cylindrical magnetic screen from said at least one cylindrical anode band; a gas plenum adapted to receive a first chosen gas and for distributing the first chosen gas into said annular ion channel; and a hollow cathode discharge apparatus for ionizing a second chosen gas disposed on or above the second end of said cylindrical magnetizable core. 8. The Hall current plasma source of claim 7 , wherein the annular ion channel is tapered such that it is wider toward the open end thereof. 9. The Hall current plasma source of claim 7 , wherein said hollow cathode discharge apparatus comprises: a base member having an outside surface and an inside surface, and an inlet therethrough for permitting the second chosen gas to flow; a low-work function material or cathode instant start material; an electrical insulator positioned between the inside surface of said base member and said low-work function material and through which the second chosen gas flows around said low-work function material; a keeper having a hole therethrough through which the second chosen gas flows, and having an outer surface; second electrical insulator positioned adjacent to at least a portion of the outer surface of said keeper; and a cover member forming a chamber with said base member and having an opening therein facing said low-work function material, said second electrical insulator, said low-work function material, and at least a portion of said keeper positioned in said chamber; wherein the second chosen gas is flowed around said low-work function material and between said low-work function material and said keeper, and through the hole in said keeper to the outside of said chamber. 10. The Hall current plasma source of claim 9 , further comprising radiation shielding surrounding said low-work function material. 11. The Hall current plasma source of claim 9 , wherein said low-work function material comprises 12CaO-7Al 2 O 3 . 12. The Hall current plasma source of claim 7 , wherein said hollow cathode discharge apparatus comprises: a base member having an outside surface and an inside surface; a low-work function material or cathode instant start material; an electrical insulator positioned between the inside surface of said base member and said low-work function material; a keeper having a hole therethrough; second electrically insulating material covering at least a portion of the outer surface of said keeper; and a cover member having an inlet therethrough for permitting the second chosen gas to flow, forming a chamber with said base member, and having an opening therein facing said low-work function material, said second electrical insulator, said low-work function material, and at least a portion of said keeper positioned in said chamber; wherein the second chosen gas is flowed around said low-work function material and between said low-work function material and said keeper, and through the hole in said keeper to the outside of said chamber. 13. The Hall current plasma source of claim 12 , further comprising radiation shielding surrounding said low-work function material. 14. The Hall current plasma source of claim 12 , wherein the low-work function material comprises 12CaO-7Al 2 O 3 . 15. A Hall current plasma source, comprising: a cylindrical magnetizable core having an outer surface and a first axis; a conducting wire coil wound around the outer surface of said cylindrical magnetizable core; a first cylindrical magnetic screen having a second axis collinear with the first axis enclosing said conducting wire coil, said first cylindrical magnetic screen having an outer diameter; a second cylindrical magnetic screen having a third axis collinear with the first axis, and an inner diameter which is larger than the outer diameter of said first cylindrical magnetic screen, forming an annular region therebetween; at least one cylindrica

Assignees

Inventors

Classifications

  • H01J27/146Primary

    End-Hall type ion sources, wherein the magnetic field confines the electrons in a central cylinder · CPC title

  • Hall-effect ion sources with closed electron drift · CPC title

  • F03H1/0075Primary

    with an annular channel; Hall-effect thrusters with closed electron drift · CPC title

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What does patent US10269526B2 cover?
A miniature Hall current plasma source apparatus having magnetic shielding of the walls from ionized plasma, an integrated discharge channel and gas distributor, an instant-start hollow cathode mounted to the plasma source, and an externally mounted keeper, is described. The apparatus offers advantages over existing other Hall current plasma sources having similar power levels, including: lower…
Who is the assignee on this patent?
Univ Colorado State Res Found
What technology area does this patent fall under?
Primary CPC classification H01J27/146. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 23 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).