Electronic skin
US-2017086704-A1 · Mar 30, 2017 · US
US10267690B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10267690-B2 |
| Application number | US-201715703122-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 13, 2017 |
| Priority date | Sep 13, 2016 |
| Publication date | Apr 23, 2019 |
| Grant date | Apr 23, 2019 |
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A capacitive force sensor is provided that includes a first support layer and a second support layer, a dielectric layer disposed between the first support layer and the second support layer, where the dielectric layer is a non-conductive elastomer that is incompressible in the a normal direction and deflects in a shear direction, a layer of parallel conductive traces disposed between and bonded to the dielectric layer and the first support layer, and a conductive layer of parallel shear channel traces having at least two distinct channels disposed between and bonded to the dielectric layer and the second support layer, where the parallel conductive traces and the parallel shear channel traces are locally parallel to each other and provide capacitive shear force measurement sensitivity while rejecting normal forces, where the normal force measurement is decoupled from the shear force measurement.
Opening claim text (preview).
What is claimed: 1. A capacitive force sensor comprising: a) a first support layer and a second support layer; b) a dielectric layer disposed between said first support layer and said second support layer, wherein said dielectric layer comprises a non-conductive elastomer, wherein said dielectric layer comprises a thickness-to-area ratio that is configured to increase an effective compressive stiffness without affecting a shear stiffness, wherein said dielectric layer is effectively incompressible in a normal direction and deflects in a shear direction, wherein a normal force response is mechanically decoupled from a shear force response; c) a layer of parallel conductive traces disposed between and bonded to said dielectric layer and said first support layer; and d) a conductive layer of parallel and separate shear channel traces having at least two distinct channels disposed between and bonded to said dielectric layer and said second support layer; wherein said parallel conductive traces and said parallel shear channel traces are locally parallel to each other and provide a capacitive shear force measurement sensitivity while rejecting a normal forces force measurement. 2. The capacitive force sensor of claim 1 , wherein said parallel conductive traces and said parallel shear channel traces are parallel across said dielectric layer for providing shear force sensitivity in a single direction. 3. The capacitive force sensor of claim 1 , further comprises a first region and a second region, wherein said parallel conductive traces and said parallel shear channel traces in said first region are orthogonal to said parallel conductive traces and said parallel shear channel traces in said second region, wherein said parallel shear channel traces and said parallel conductive traces in said first region and said second region are configured to provide shear force sensitivity in two orthogonal directions. 4. The capacitive force sensor of claim 1 , further comprising four quadrants, wherein said parallel conductive traces and said parallel shear channel traces in a first said quadrant and a second said quadrant are orthogonal to said parallel conductive traces and said parallel shear channel traces in a third said quadrant and a fourth said quadrant, wherein said parallel shear channel traces and said parallel conductive traces in said four quadrants are configured to provide shear force sensitivity in two orthogonal directions and torsion sensitivity about a single axis. 5. The capacitive force sensor of claim 1 , further comprising: a) a third support layer; b) a second dielectric layer, wherein said second dielectric layer is disposed between said second support layer and said third support layer, wherein said second dielectric layer comprises a deformable and non-conductive material forming a patterned structure having gaps; c) a conductive ground layer disposed between and bonded to said third support layer and said second dielectric layer; and d) a conductive layer of normal taxel traces having two distinct channels disposed between and bonded to said second dielectric layer and said second support layer; wherein said normal taxel traces are configured to provide capacitive force measurements having sensitivity in a normal direction for measuring a force component (Fz) and two moment and torque components (Mx, My).
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