Self-cleaning coatings and methods for making same

Patent metadata

Field	Value
Publication number	US-10266702-B2
Application number	US-201313913728-A
Country	US
Kind code	B2
Filing date	Jun 10, 2013
Priority date	Jun 8, 2012
Publication date	Apr 23, 2019
Grant date	Apr 23, 2019

Abstract

A method of forming a self-cleaning coating on a substrate comprises the step of selecting a substrate, cleaning the substrate, and/or roughening the substrate using an abrasive. In an embodiment, roughening of the substrate create microscopic tortuous grooves. Another embodiment of the method comprises coating the roughened surface with at least one hydrophobic chemical agent. In an exemplary embodiment, the hydrophobic chemical agent covalently binds with the substrate creating nanoscopic grooves. Another embodiment of the present disclosure pertains to an apparatus for depositing a self-cleaning coating on a flat substrate. A further embodiment of the present disclosure pertains to a self-cleaning coating on a substrate comprising a hydrophobic chemical agent covalently bonded to at least one roughened surface of the substrate.

First claim

What is claimed is:

1. A method of forming a self-cleaning coating on a substrate comprising the steps of:
selecting a substrate;
cleaning the substrate;
roughening the substrate in a roughening station, wherein the roughening consists of
a first roughening step with a first abrasive moved by a vertical actuator to contact the substrate to create a first set of microscopic grooves, wherein the substrate is roughened by a back-and-forth motion along a first axis performed by a first actuator to form the first set of microscopic grooves, and the first set of microscopic grooves range in depth from about 1 μm to about 1 mm, and
optionally includes a second roughening step with the first abrasive to create a second set of microscopic grooves, wherein the substrate is roughened by another back-and-forth motion along a second axis performed by a second actuator to form the second set of microscopic grooves;

washing the substrate with de-ionized water; and
transferring the substrate to a deposition station and coating the roughened surface with at least one hydrophobic chemical agent, wherein the at least one hydrophobic chemical agent is a chlorosilane or a derivative bearing similar structure, the coating step is performed by evaporating the at least one hydrophobic chemical agent with a heating element in a well-controlled environment, wherein the well-controlled environment is a chamber providing humidity control, the hydrophobic chemical agent binds to the roughened surface and formation of the coating creates a nanoscopic topography of nanoscopic features on the microscopic grooves that range in depth from about 10 nm to about 1 μm, and wherein the coated substrate has a light transmission or reflection similar to or higher than that of the uncoated substrate.

2. The method of claim 1 , wherein the substrate is a flat or a non-flat-substrate.

3. The method of claim 1 , wherein the substrate comprises metals, metal oxides, organic/inorganic composites containing metals/metal oxides and plastic with silicon dioxide or metal oxides layer by sol-gel formation or other methods.

4. The method of claim 1 , wherein the step of roughening the substrate to create the microscopic grooves comprises using a mechanical grinder or a polisher.

5. The method of claim 4 , wherein the mechanical grinder is used with grinding disc or an abrasive paper.

6. The method of claim 4 , wherein the polisher is used with a polishing suspension.

7. The method of claim 4 , further comprising using at least one abrasive, wherein the hardness of the at least one abrasive is greater than that of the substrate.

8. The method of claim 7 , wherein the abrasive is selected from the group consisting of diamond, carbonado, boron, boron nitride, corundum, silicon carbide, tungsten carbide, titanium carbide, chromium, silicon nitride, topaz, zirconia, tungsten, quartz and glass.

9. The method of claim 1 , wherein the step of roughening and activating the substrate is by ozone plasma treatment.

10. The method of claim 1 , wherein the at least one hydrophobic chemical agent also comprises a fluoroalkylsilane selected from the group consisting of trichloro(3,3,3-trifluoropropyl)silane, dichloro-methyl(3,3,3-trifluoropropyl)silane, chloro-dimethyl(3,3,3-trifluoropropyl)silane, trichloro(1H,1H,2H,2H-perfluorooctyl)silane, dichloro-methyl(1H,1H,2H,2H-perfluorooctyl)silane, chloro-dimethyl(1H,1H,2H,2H-perfluorooctyl)silane, trichloro(3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl)silane, dichloro-methyl(3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl)silane, chlorodimethyl(3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl)silane, trichloro(1H,1H,2H,2H-perfluorodecyl)silane, dichloro-methyl(1H,1H,2H,2H-perfluorodecyl)silane, chloro-dimethyl(1H,1H,2H,2H-perfluorodecyl)silane, trichloro(1H,1H,2H,2H-perfluorododecyl)silane, dichloro-methyl(1H, 1H,2H,2H-perfluorododecyl)silane, chloro-dimethyl(1H,1H,2H,2H-perfluorododecyl)silane and derivatives bearing similar structures.

11. The method of claim 1 , wherein the at least one hydrophobic chemical agent is dichlorosilane, trichlorosilane, chlorotrimethylsilane, dichlorodimethylsilane, trichloromethylsilane, chlorophenylsilane, dichlorophenylsilane, trichlorophenylsilane, chloromethylphenylsilane, chlorodimethylphenylsilane, dichloromethylphenylsilane, chlorodimethylphenethylsilane, dichloromethylphenethylsilane, trichlorophenethylsilane, chlorodimethyldodecylsilane, dichloromethyldodecylsilane, trichlorododecylsilane, chlorodecyldimethylsilane, dichlorodecylmethylsilane, trichlorodecyl silane, chlorodimethyloctadecylsilane, dichloromethyloctadecylsilane, trichlorooctadecylsilane, chlorodimethyloctylsilane, dichloromethyloctylsilane, trichlorooctylsilane, chlorodimethylhexylsilane, dichloromethylhexylsilane, trichlorohexylsilane, chlorodimethylthexylsilane, dichloromethylthexylsilane, trichlorothexylsilane, allyldichloromethylsilane, allylchlorodimethylsilane, allyltrichlorosilane, (cyclohexylmethyl)chlorodimethylsilane, (cyclohexylmethyl)dichloromethylsilane, or (cyclohexylmethyl)trichlorosilane.

12. The step of claim 1 , wherein the humidity is controlled to about 20% of related humidity.

13. The method of claim 1 , further comprising drying the substrate in ambient conditions.

14. The method of claim 1 , wherein the coating step is conducted by controlling the evaporation of the hydrophobic chemical agent.

15. The method of claim 14 , wherein controlling the evaporation of the hydrophobic chemical agent comprises controlling the pressure of injection and the temperature of heating of the hydrophobic chemical agent.

16. The method of claim 1 , wherein the at least one hydrophobic chemical agent is solvent-free.

Assignees

• Curran Seamus
• LIAO Kang Shyang
• Barton Killian
• Univ Houston System

Inventors

• Curran Seamus
• Liao Kang-Shyang
• Barton Killian

Classifications

• B05D3/02

  by baking {(B05D3/04 takes precedence)} · CPC title

• Y10T428/265

  1 mil or less · CPC title

• B05D3/142

  Pretreatment · CPC title

• B05D5/083 Primary

  involving the use of fluoropolymers · CPC title

• H02S40/10

  Cleaning arrangements · CPC title