Method of depositing abradable coatings under polymer gels
US-2016312628-A1 · Oct 27, 2016 · US
US10260139B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10260139-B2 |
| Application number | US-201615074522-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 18, 2016 |
| Priority date | Mar 19, 2015 |
| Publication date | Apr 16, 2019 |
| Grant date | Apr 16, 2019 |
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An article may include a substrate including a ceramic or a CMC; a bond layer on the substrate; and a diffusion barrier layer between the substrate and the bond layer. The diffusion barrier layer may include at least one of molybdenum metal, tantalum metal, tungsten metal, or niobium metal. In some examples, the article may include a stabilizing layer that includes at least one of a silicide of molybdenum (MoSi2), tantalum (TaSi2), tungsten (WSi2), or niobium (NbSi2), between the diffusion barrier layer and the bond layer.
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What is claimed is: 1. An article comprising: a substrate comprising a ceramic or a ceramic matrix composite; a diffusion barrier layer on the substrate, wherein the diffusion barrier layer comprises at least one free-form metal selected from the group consisting of free-form molybdenum, free-form tantalum, free-form tungsten, and free-form niobium; and a bond layer on the diffusion barrier layer, wherein the bond layer comprises free-form silicon. 2. The article of claim 1 , wherein the diffusion barrier layer comprises free-form molybdenum. 3. The article of claim 1 , wherein the diffusion barrier layer further comprises silicon carbide (SiC). 4. The article of claim 1 , wherein the diffusion barrier layer further comprises a transition metal other than the least one free-form metal. 5. The article of claim 1 , wherein the diffusion barrier layer further comprises at least one of MoSi 2 , TaSi 2 , WSi 2 , or NbSi 2 . 6. The article of claim 1 , wherein the coefficient of thermal expansion (CTE) of the diffusion barrier layer is between about 4 parts per million per degree Celsius (ppm/° C.) and about 6 ppm/° C. 7. The article of claim 1 , further comprising a stabilizing layer comprising at least one of MoSi 2 , TaSi 2 , WSi 2 , or NbSi 2 , wherein the stabilizing layer is between the diffusion barrier layer and the bond layer. 8. The article of claim 7 , wherein the stabilizing layer has a coefficient of thermal expansion (CTE) that is between a CTE of the diffusion barrier layer and a CTE of the bond layer. 9. The article of claim 7 , wherein the stabilizing layer further comprises silicon carbide (SiC). 10. The article of claim 1 , further comprising an environmental barrier coating on the bond layer. 11. The article of claim 10 , wherein the environmental barrier coating is abradable and comprises a porous microstructure. 12. The article of claim 10 , further comprising a porous abradable layer on the environmental barrier coating. 13. A method comprising: forming a diffusion barrier layer on a substrate comprising a ceramic or ceramic matrix composite, wherein the diffusion barrier layer comprises at least one free-form metal selected from the group consisting of free-form molybdenum, free-form tantalum, free-form tungsten, and free-form niobium; and forming a bond layer on the diffusion barrier layer, wherein the bond layer comprises free-form silicon. 14. The method of claim 13 , wherein the diffusion barrier layer comprises free-form molybdenum. 15. The method of claim 13 , further comprising forming a stabilizing layer between the diffusion barrier layer and the bond layer, wherein the stabilizing layer comprises at least one of MoSi 2 , TaSi 2 , WSi 2 , or NbSi 2 . 16. The method of claim 15 , wherein at least one of the diffusion barrier layer or the stabilizing layer further comprises silicon carbide (SiC). 17. The method of claim 13 , further comprising forming an environmental barrier coating on the bond layer. 18. The method of claim 17 , further comprising forming an abradable layer on the environmental barrier coating. 19. An article comprising: a substrate comprising a ceramic or a ceramic matrix composite; a diffusion barrier layer on the substrate, wherein the diffusion barrier comprises at least one free-form metal selected from the group consisting of free-form molybdenum, free-form tantalum, free-form tungsten, and free-form niobium; a stabilizing layer on the diffusion barrier layer, wherein the stabilizing layer comprises at least one silicide of the at least one free-form metal of the diffusion barrier layer; and a bond layer on the stabilizing layer. 20. The article of claim 1 , wherein the diffusion barrier layer further comprises a reaction product of the at least one free-form metal and at least one of boron or calcium.
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