Multicathode deposition system and methods
US-12051576-B2 · Jul 30, 2024 · US
US10240229B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10240229-B2 |
| Application number | US-201515311904-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 26, 2015 |
| Priority date | May 26, 2014 |
| Publication date | Mar 26, 2019 |
| Grant date | Mar 26, 2019 |
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The present invention concerns substrates coated with an Mo 1-x-y Si X B Y layer, said layer comprising the T2 phase, and a method for the production thereof.
Opening claim text (preview).
The invention claimed is: 1. Sputter-coated forming tool with a Mo 1-x-y Si x B y layer, having a T2 phase, wherein the value of x ranges from 0.28 to 0.37 and the value of y ranges from 0.08 to 0.14. 2. The sputter-coated forming tool of claim 1 , wherein the Mo 1-x-y Si x B y layer has a hardness value in the range of 17.5 to 27 GPa. 3. Method for the production of the Mo 1-x-y Si x B y layer of claim 1 by magnetron sputtering using a Mo—Si composite target and an elementary B target, wherein the layer is heated to a temperature of at least 900° C. after deposition, whereby the T2 phase is formed. 4. Forming tool with a Mo 1-x-y Si x B y layer having the T2 phase, wherein the Mo 1-x-y Si x B y layer was applied onto the surface of a tool by means of a method according to claim 3 .
Borides · CPC title
using pulsed power to the target · CPC title
Selection of materials · CPC title
Tools as parts of machines covered by this subclass · CPC title
Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances · CPC title
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