Lithographic apparatus substrate table and method of loading a substrate

Patent metadata

Field	Value
Publication number	US-10236203-B2
Application number	US-201615767514-A
Country	US
Kind code	B2
Filing date	Sep 28, 2016
Priority date	Oct 29, 2015
Publication date	Mar 19, 2019
Grant date	Mar 19, 2019

Abstract

A lithographic apparatus substrate table comprises a plurality of first projections, whereby the first projections define a first substrate supporting plane and a plurality of second projections, whereby the second projections define a second substrate supporting plane. The substrate table further comprises a clamping device configured to exert a clamping force onto the substrate. The second substrate supporting plane is parallel to the first substrate supporting plane. The second substrate supporting plane is offset in respect of the first substrate supporting plane in a direction perpendicular to the first and second substrate supporting planes. The lithographic apparatus substrate table is configured to support the substrate on the second projections at the second substrate supporting plane before application of the clamping force by the clamping device. The second projections are configured to deform upon application by the clamping device of the clamping force onto the substrate, thereby providing the substrate to move from the second substrate supporting plane to the first substrate supporting plane when clamped by the clamping device.

First claim

What is claimed is:

1. A lithographic apparatus substrate table constructed to hold a substrate, the lithographic apparatus substrate table comprising:
first and second projections defining corresponding first and second substrate supporting planes; and
a clamping device configured to exert a clamping force onto the substrate,
wherein the second substrate supporting plane is parallel to the first substrate supporting plane, the second substrate supporting plane being offset with respect to the first substrate, supporting plane in a direction perpendicular to the first and second substrate supporting planes,
wherein the lithographic apparatus substrate table is configured to support the substrate on the second projections at the second substrate supporting plane before application of the clamping force by the clamping device, and
wherein the second projections are configured to deform upon application by the clamping device of the clamping force onto the substrate, thereby providing the substrate to move from the second substrate supporting plane to the first substrate supporting plane when clamped by the clamping device.

2. The lithographic apparatus substrate table of claim 1 , wherein the substrate table comprises a plurality of burls configured for supporting the substrate, each burl being provided with at least one first projection and at least one second projection.

3. The lithographic apparatus substrate table of claim 2 , wherein:
a surface of the burl facing the second substrate loading surface has a concave shape,
a circumferential outer part of the burl at a circumferential edge of the concave shaped surface forming the second projection, and
a center part of the burl forming the first projection.

4. The lithographic apparatus substrate table of claim 1 , wherein the second projections comprise a spherically shaped substrate carrying surface.

5. The lithographic apparatus substrate table of claim 1 , wherein the second projections comprise a flat substrate carrying surface.

6. The lithographic apparatus substrate table of claim 1 , wherein the second projections comprise a cross section as seen in a direction of the first and second substrate loading surfaces, which cross section increases towards the second substrate supporting plane.

7. The lithographic apparatus substrate table of claim 1 , wherein the substrate table comprises a plurality of burls configured for supporting the substrate, each of the first and second projections forming a burl.

8. The lithographic apparatus substrate table of claim 1 , wherein the amount of the first projections exceeds the amount of the second projections of the substrate table.

9. The lithographic apparatus substrate table of claim 1 , wherein a cross sectional diameter of the first projections, as seen in a direction parallel to the first and second substrate loading surfaces exceeds a cross sectional diameter of the first projections.

10. A lithographic apparatus comprising:
a lithographic apparatus substrate table constructed to hold a substrate, the lithographic apparatus substrate table comprising:
first and second projections defining respective first and second supporting planes, and
a clamping device configured to exert a clamping force onto the substrate,
wherein the second substrate supporting plane is parallel to the first substrate supporting plane, the second substrate supporting plane being offset with respect to the first substrate supporting plane in a direction perpendicular to the first and second substrate supporting planes,
wherein the lithographic apparatus substrate table is configured to support the substrate on the second projections at the second substrate supporting plane before application of the clamping force by the clamping device, and
wherein the second projections are configured to deform upon application by the clamping device of the clamping force onto the substrate, thereby providing the substrate to move from the second substrate supporting plane to the first substrate supporting plane when clamped by the clamping device.

11. A method of loading a substrate onto a substrate table of the lithographic apparatus of claim 10 , the method comprising:
supporting the substrate on the second projections at the second substrate supporting plane, before application of the clamping force by the clamping device; and
applying by the clamping device the clamping force onto the substrate causing the second projections to deform, thereby providing the substrate to move from the second substrate supporting plane to the first substrate supporting plane when clamped by the clamping device.

Assignees

• Asml Netherlands Bv

Inventors

• Valefi Mahdiar
• Lafarre Raymond Wilhelmus Louis

Classifications

• H10P72/7616

  characterised by a coating, a hardness or a material · CPC title

• H10P72/7614

  characterised by a plurality of individual support members, e.g. support posts or protrusions · CPC title

• H10P72/72

  using electrostatic chucks · CPC title

• H10P72/78 Primary

  using vacuum or suction, e.g. Bernoulli chucks · CPC title

• G03F7/70716

  Stages · CPC title