Curable composition and patterning method using the same

Patent metadata

Field	Value
Publication number	US-10233274-B2
Application number	US-201314406028-A
Country	US
Kind code	B2
Filing date	May 21, 2013
Priority date	Jun 6, 2012
Publication date	Mar 19, 2019
Grant date	Mar 19, 2019

Abstract

A curable composition contains a polymerizable compound and a polymerization initiator. The polymerization initiator initiates polymerization to cure the polymerizable compound. The curable composition further contains compounds having the following general formulae (1) and (2):

wherein X1 is selected from a hydroxy group, a carboxy group, a sulfo group, an amino group, and an alkoxy group, l1 denotes an integer in the range of 0 to 7, m1 denotes an integer in the range of 1 to 5, and n1 denotes an integer in the range of 1 to 16, and X2 is selected from a hydroxy group, a carboxy group, a sulfo group, an amino group, and an alkoxy group, l2 denotes an integer in the range of 0 to 7, m2 denotes an integer in the range of 1 to 5, and n2 denotes an integer in the range of 1 to 16.

First claim

The invention claimed is:

1. A curable composition, comprising: a polymerizable compound; and a polymerization initiator, wherein the polymerization initiator initiates polymerization to cure the polymerizable compound, and the curable composition further contains at least a compound having the following general formula (1) and a compound having the following general formula (2):

wherein X1 denotes a hydroxy group, l1 denotes an integer in the range of 0 to 7, m1 denotes 2, and n1 denotes an integer in the range of 1 to 16, and X2 denotes a hydroxy group, l2 denotes an integer in the range of 0 to 7, m2 denotes 1, and n2 denotes an integer in the range of 1 to 16,
wherein the weight percentage of the compound having the general formula (1) is higher than the weight percentage of the compound having the general formula (2), and
wherein the total concentration of the compound having the general formula (1) and the compound having the general formula (2) is equal to or more than 1.35 wt % wherein the curable composition has a surface tension of at least 26.1 mN/m.

2. The curable composition according to claim 1 , wherein the curable composition is a photo-curable composition, which can polymerize by receiving light.

3. The curable composition according to claim 1 for use in UV nanoimprint lithography.

4. The curable composition according to claim 1 , wherein the compound having the general formula (1) constitutes 1.1% to 5% by weight of the curable composition, and the compound having the general formula (2) constitutes 0.25% to 5% by weight of the curable composition.

5. The curable composition according to claim 1 ,
wherein the weight percentage of the compound having the general formula (1) is in the range of 0.1% to 5% by weight, the weight percentage of the compound having the general formula (2) is in the range of 0.01% to 5% by weight, and the weight percentage of the compound having the general formula (1) is equal to or higher than the compound having the general formula (2),
wherein, in the general formula (1), X1 denotes a hydroxy group, l1 denotes an integer in the range of 4 to 6, and n1 denotes an integer in the range of 5 to 7, and
wherein, in the general formula (2), X2 denotes a hydroxy group, l2 denotes an integer in the range of 4 to 6, and n2 denotes an integer in the range of 2 to 4.

6. The curable composition according to claim 1 , wherein the compound having the general formula (1) is hexa(ethylene glycol) mono-1H,1H-perfluoroheptyl ether, and the compound having the general formula (2) is tri(propylene glycol) mono-1H,1H-perfluoroheptyl ether.

7. The curable composition according to claim 1 , wherein the curable composition contains 1.1 wt % or less of the compound having the general formula (1) and 0.25 wt % or more of the compound having the general formula (2).

8. A patterning method for forming a pattern on a substrate using the curable composition according to claim 1 , comprising:
placing the curable composition on the substrate;
bringing the curable composition into contact with a mold;
irradiating the curable composition with heat or light to cure the curable composition; and
releasing the cured composition from the mold.

9. The patterning method according to claim 8 , wherein the mold is made of quartz.

10. The patterning method according to claim 8 , wherein the curing involves irradiating the curable composition with light through the mold having recessed and raised portions on its surface.

11. A method for manufacturing a circuit board, comprising: etching or implanting ions into a substrate in accordance with a pattern formed by the patterning method according to claim 8 , thereby forming a circuit structure on the substrate in accordance with the pattern.

12. The patterning method according to claim 8 , wherein the curable composition is applied to a surface of the mold in advance.

Assignees

• Canon Kk

Inventors

• Mihara Chieko
• Ito Toshiki
• Okinaka Motoki

Classifications

• C08F20/18

  with acrylic or methacrylic acids · CPC title

• Y10T428/24802

  Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] · CPC title

• B82Y10/00

  Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic · CPC title

• B29C59/02

  by mechanical means, e.g. pressing {(B29C59/007 takes precedence; embossing expanded porous articles B29C44/5627)} · CPC title

• G03F7/0046

  with perfluoro compounds, e.g. for dry lithography (G03F7/0048 takes precedence) · CPC title