Glass substrate

Patent metadata

Field	Value
Publication number	US-10233113-B2
Application number	US-201615556067-A
Country	US
Kind code	B2
Filing date	Mar 3, 2016
Priority date	Mar 10, 2015
Publication date	Mar 19, 2019
Grant date	Mar 19, 2019

Abstract

A technical object of the present invention is to devise an alkali-free glass that has a high etching rate in a HF-based chemical and a high strain point while having excellent productivity (particularly, devitrification resistance), to thereby reduce the production cost of a glass substrate, and then increase thinning efficiency and reduce the thermal shrinkage of the glass substrate in a production process of a display panel. In order to achieve the above-mentioned object, a glass substrate of the present invention includes as a glass composition, in terms of mol %, 65% to 75% of SiO2, 11% to 15% of Al2O3, 0% to 5% of B2O3, 0% to 5% of MgO, 0% to 10% of CaO, 0% to 5% of SrO, 0% to 6% of BaO, and 0.01% to 5% of P2O5, and has a molar ratio (MgO+CaO+SrO+BaO)/Al2O3 of from 0.7 to 1.5.

First claim

The invention claimed is:

1. A glass substrate, which comprises as a glass composition, in terms of mol %, 65% to 75% of SiO 2 , 11% to 15% of Al 2 O 3 , 0% to 5% of B 2 O 3 , 0% to 5% of MgO, 0% to 10% of CaO, 0% to 5% of SrO, 0% to 6% of BaO, and 0.01% to 5% of P 2 O 5 , has a molar ratio (MgO+CaO+SrO+BaO)/Al 2 O 3 of from 0.7 to 1.5, and the value {[Al 2 O 3 ]+2×[P 2 O 5 ]} is 13 mol % or more.

2. The glass substrate according to claim 1 , wherein the glass substrate satisfies a relationship of {2×[SiO 2 ]−[MgO]−[CaO]−[SrO]−[BaO]}≤133% in terms of mol %.

3. The glass substrate according to claim 1 , wherein the glass substrate has a content of Li 2 O+Na 2 O+K 2 O of 0.5 mol % or less in the glass composition.

4. The glass substrate according to claim 1 , wherein the glass substrate has a content of B 2 O 3 of 3.0 mol % or less in the glass composition.

5. The glass substrate according to claim 1 , wherein the glass substrate has a content of Fe 2 O 3 +Cr 2 O 3 of 0.02 mol % or less in the glass composition.

6. The glass substrate according to claim 1 , wherein the glass substrate has a strain point of 710° C. or more.

7. The glass substrate according to claim 1 , wherein the glass substrate has an etching depth of 25 μm or more when immersed in a 10 mass % HF aqueous solution at room temperature for 30 minutes.

8. The glass substrate according to claim 1 , wherein the glass substrate has a Young's modulus of 75 GPa or more.

9. The glass substrate according to claim 1 , wherein the glass substrate has a specific Young's modulus of 30 GPa/(g/cm 3 ) or more.

10. A liquid crystal display comprising the glass substrate according to claim 1 .

11. An OLED display comprising the glass substrate according to claim 1 .

12. A high-definition display driven by a polysilicon or oxide TFT comprising the glass substrate according to claim 1 .

Assignees

• Nippon Electric Glass Co

Inventors

• Hayashi Masahiro

Classifications

• C03C3/093 Primary

  containing zinc or zirconium · CPC title

• C03C3/097 Primary

  containing phosphorus, niobium or tantalum · CPC title

• C03B17/064

  by the overflow downdraw fusion process; Isopipes therefor · CPC title

• C03C3/087

  containing calcium oxide, e.g. common sheet or container glass · CPC title

• G02F1/133302

  Rigid substrates, e.g. inorganic substrates · CPC title