Magnetoresistance effect element

US10224067B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10224067-B2
Application numberUS-201615554410-A
CountryUS
Kind codeB2
Filing dateMar 28, 2016
Priority dateMar 31, 2015
Publication dateMar 5, 2019
Grant dateMar 5, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

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A magnetoresistance effect element has a first ferromagnetic metal layer, a second ferromagnetic metal layer, and a tunnel barrier layer that is sandwiched between the first and second ferromagnetic metal layers, the tunnel barrier layer is expressed by a chemical formula of AB 2 O x , and has a spinel structure in which cations are arranged in a disordered manner, A represents a divalent cation that is either Mg or Zn, and B represents a trivalent cation that includes a plurality of elements selected from the group consisting of Al, Ga, and In.

First claim

Opening claim text (preview).

The invention claimed is: 1. A magnetoresistance effect element comprising: a first ferromagnetic metal layer; a second ferromagnetic metal layer; and a tunnel barrier layer that is sandwiched between the first and second ferromagnetic metal layers, wherein the tunnel barrier layer is expressed by a chemical formula of AB 2 O x (0<x≤4), and has a spinel structure in which cations are arranged in a disordered manner, A represents a divalent cation that is either Mg or Zn, and B represents a trivalent cation that includes a plurality of elements selected from the group consisting of Al, Ga, and In, and wherein the tunnel barrier layer comprises: at least one lattice-matched portion that is lattice-matched with both of the first ferromagnetic metal layer and the second ferromagnetic metal layer; and at least one lattice-mismatched portion that is not lattice-matched with at least one of the first ferromagnetic metal layer and the second ferromagnetic metal layer, and wherein, when viewed as an inverse Fourier transform image in a stacking direction of a cross-section TEM image of the interface between the tunnel barrier layer and the first and/or the second ferromagnetic metal layer, a lattice-matched portion is made up of a plurality of sequential, continuously-connected lattice lines, and a lattice-mismatched portion is made up of a plurality of sequential, non-continuously-connected lattice lines and/or no lattice lines. 2. The magnetoresistance effect element according to claim 1 , wherein a volume ratio of the lattice-matched portion with respect to a volume of the entire tunnel barrier layer is 65% to 95%. 3. The magnetoresistance effect element according to claim 1 , wherein a difference in ionic radius between the plurality of elements of the trivalent cation is 0.2 Å or less. 4. The magnetoresistance effect element according to claim 1 , wherein the number of constituent elements in a unit cell of the divalent cation is smaller than half that of the trivalent cation. 5. The magnetoresistance effect element according to claim 1 , wherein a magnetoresistance ratio is 100% or greater under application of a bias voltage of 1 V or greater at a room temperature. 6. The magnetoresistance effect element according to claim 1 , wherein the first ferromagnetic metal layer has larger coercivity than the second ferromagnetic metal layer. 7. The magnetoresistance effect element according to claim 1 , wherein at least one of the first ferromagnetic metal layer and the second ferromagnetic metal layer has magnetic anisotropy perpendicular to a stacking direction. 8. The magnetoresistance effect element according to claim 1 , wherein at least one of the first ferromagnetic metal layer and the second ferromagnetic metal layer is Co 2 Mn 1-a Fe a Al b Si 1-b (0≤a≤1, 0≤b≤1). 9. The magnetoresistance effect element according to claim 1 , wherein in the trivalent cation, a proportion of any one of Al, Ga, or In as a main component is 85% to less than 100%.

Assignees

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Classifications

  • Half-metallic, e.g. epitaxial CrO2 or NiMnSb films · CPC title

  • details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell · CPC title

  • of IV type, e.g. Ge1-xMnx · CPC title

  • large or giant magnetoresistive effects [GMR], e.g. as generated in spin-valve [SV] devices · CPC title

  • G11B5/3909Primary

    Arrangements using a magnetic tunnel junction · CPC title

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What does patent US10224067B2 cover?
A magnetoresistance effect element has a first ferromagnetic metal layer, a second ferromagnetic metal layer, and a tunnel barrier layer that is sandwiched between the first and second ferromagnetic metal layers, the tunnel barrier layer is expressed by a chemical formula of AB 2 O x , and has a spinel structure in which cations are arranged in a disordered manner, A represents a divalent catio…
Who is the assignee on this patent?
Tdk Corp
What technology area does this patent fall under?
Primary CPC classification G11B5/3909. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Mar 05 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).