Silicone rubber material for soft lithography

Patent metadata

Field	Value
Publication number	US-10220563-B2
Application number	US-201514697687-A
Country	US
Kind code	B2
Filing date	Apr 28, 2015
Priority date	Jun 2, 2008
Publication date	Mar 5, 2019
Grant date	Mar 5, 2019

Abstract

The present invention relates to a silicone rubber like material and a printing device including a stamp layer comprising such a material. The material is suitable for use in soft lithography as it enables stable features having dimensions in the nanometer range to be obtained on a substrate, and also allows for the accommodation onto rough and non-flat substrate surfaces. The invention also relates to methods for manufacturing the silicone rubber like material and stamp layer and use thereof in lithographic processes.

First claim

The invention claimed is:

1. A printing device comprising:
a first patterned stamp layer; and
a second, deformable layer, wherein
the first patterned stamp layer having a patterned external contact surface and an internal surface in direct contact with the second layer,
the first layer comprises a silicone rubber like material comprising at least one Q branched and/or T branched (poly)siloxane crosslinked by at least one linear polysiloxane, wherein the silicone rubber like material has a Young's modulus in a range of 7 MPa to 80 MPa, wherein the silicone rubber like material is crosslinked at a temperature below 50° C. and
the second layer comprises a deformable material having a low Young's modulus as compared to that of the silicone rubber like material.

2. The printing device according to claim 1 wherein the external surface of the first layer comprises a pattern of features.

3. A patterned stamp layer comprising:
a silicone rubber like material having a Young's modulus in the range of from 7 MPa to 80 MPa, the material comprising at least one functional linear polysiloxane crosslinked to at least one functional T branched and/or functional Q branched (poly)siloxane, wherein the silicone rubber like material is crosslinked at a temperature below 50° C. and wherein
the at least one functional T branched (poly)siloxane is formed from precursors including hydride functional T branched (poly)siloxane precursors, vinyl functional T branched (poly)siloxane precursors, and mixtures thereof,
the at least one functional Q branched (poly)siloxane is formed from precursors including hydride functional Q branched (poly)siloxane precursors, vinyl functional Q branched (poly)siloxane precursors and mixtures thereof,
the at least one functional linear polysiloxane is selected from the group consisting of a hydride functional linear polysiloxane, a vinyl functional linear polysiloxane and mixtures thereof, and
when the at least one functional linear polysiloxane is a mixture of vinyl functional and hydride functional linear polysiloxanes, a ratio of hydride functional linear polysiloxane to vinyl functional linear polysiloxane is in a range of from 2:10 to 8:10.

4. The patterned stamp layer of claim 3 , wherein the patterned stamp layer is suitable for use in an imprint lithographic process.

5. The patterned stamp layer of claim 3 , wherein the functional T and/or Q branched (poly)siloxanes and the functional linear polysiloxanes are miscible.

Assignees

• Koninklijke Philips Nv

Inventors

• Verschuuren Marcus Antonius

Classifications

• B82Y40/00

  Manufacture or treatment of nanostructures · CPC title

• B41C1/08

  by embossing, e.g. with a typewriter (typewriters adapted therefor B41J3/38) · CPC title

• C08G77/20

  containing silicon bound to unsaturated aliphatic groups · CPC title

• B41N1/12 Primary

  non-metallic other than stone {, e.g. printing plates or foils comprising inorganic materials in an organic matrix (B41N1/003, B41N1/006 take precedence)} · CPC title

• B82Y10/00

  Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic · CPC title