Conductive film and electronic device having conductive film
US-2016086683-A1 · Mar 24, 2016 · US
US10217543B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10217543-B2 |
| Application number | US-201515532197-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 2, 2015 |
| Priority date | Dec 5, 2014 |
| Publication date | Feb 26, 2019 |
| Grant date | Feb 26, 2019 |
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Provided are: a transparent electroconductive film with good transparency, wherein the transparent electroconductive film has antiblocking properties that can withstand roll-to-roll manufacturing, and white haze on the transparent electroconductive film side is reduced. Also provided is a touch sensor in which the transparent electroconductive film is used. This transparent electroconductive film includes a transparent substrate 1 and a transparent electroconductive film 13 formed on one side of the transparent substrate, wherein the arithmetic mean surface roughness Ra in a 452×595 μm field of view on the surface of the transparent electroconductive film 13 is greater than 0 nm and no more than 10 nm, and the arithmetic mean surface roughness Ra in a 452×595 μm field of view on the surface of the transparent substrate 1 on which the transparent electroconductive film 13 is not formed is greater than 5 nm and less than 100 nm.
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The invention claimed is: 1. A transparent electroconductive film comprising: a transparent substrate; and a transparent electroconductive coating formed on one side of the transparent substrate, wherein the transparent substrate has a second cured resin layer on its one surface on which the transparent electroconductive coating is not formed, the second cured resin layer including particles; arithmetic mean surface roughness Ra in a 452 μm×595 μm field of view on a surface of the transparent electroconductive coating is more than 0 nm and 10 nm or less; arithmetic mean surface roughness Ra in a 452 μm×595 μm field of view on a surface of the second cured resin layer of the transparent substrate on which the transparent electroconductive coating is not formed is more than 5 nm and less than 100 nm; and a difference between the arithmetic mean surface roughness Ra in the 452 μm×595 μm field of view on the surface of the second cured resin layer and the arithmetic mean surface roughness Ra in the 452 μm×595 μm field of view on the surface of the transparent electroconductive coating is 5 nm or more. 2. The transparent electroconductive film according to claim 1 , wherein the transparent substrate includes a first cured resin layer, a transparent resin film, and the second cured resin layer formed in this order; and the first cured resin layer is located on the side on which the transparent electroconductive coating is formed. 3. The transparent electroconductive film according to claim 1 , wherein the transparent electroconductive coating is an indium-based composite oxide. 4. The transparent electroconductive film according to claim 3 , wherein the transparent electroconductive coating is a crystalline layer converted by a heat treatment of an amorphous transparent electroconductive coating formed on the transparent substrate. 5. The transparent electroconductive film according to claim 3 , wherein a thickness of the transparent electroconductive coating is 15 nm to 50 nm. 6. The transparent electroconductive film according to claim 1 , wherein the transparent electroconductive coating includes a metal mesh or a metal nanowire. 7. The transparent electroconductive film according to claim 2 , wherein the transparent resin film includes a polyester-based resin, a polycarbonate-based resin, or a cycloolefin-based resin. 8. The transparent electroconductive film according to claim 1 , wherein a thickness of the transparent substrate is 10 μm to 200 μm. 9. The transparent electroconductive film according to claim 2 , wherein the second cured resin layer includes a plurality of spherical particles and a binder resin layer for fixing the plurality of spherical particles to the transparent resin film; and a difference w−d between a mode particle size w and a thickness d of the binder resin layer is more than 0 and 1.2 μm or less, where w is a mode particle size of the spherical particles and d is a thickness of the binder resin layer. 10. A touch sensor comprising the transparent electroconductive film according to claim 1 . 11. The transparent electroconductive film according to claim 1 , wherein the transparent substrate includes a first cured resin layer having a spherical particle content of 0.0000 to 0.0020 parts by weight based on 100 parts by weight of the solid content of the resin composition of the first cured resin layer, and the second cured resin layer having a spherical particle content of 0.0010 to 0.0300 parts by weight based on 100 parts by weight of the solid content of the resin composition of the second cured resin layer. 12. The transparent electroconductive film according to claim 1 , wherein the transparent substrate includes a first cured resin layer having a spherical particle content of 0.0000 to 0.0015 parts by weight based on 100 parts by weight of the solid content of the resin composition of the first cured resin layer and the second cured resin layer having a spherical particle content of 0.0015 to 0.0200 parts by weight based on 100 parts by weight of the solid content of the resin composition of the second cured resin layer. 13. The transparent electroconductive film according to claim 1 , wherein the transparent substrate includes a first cured resin layer having a spherical particle content of 0.0000 to 0.0010 parts by weight based on 100 parts by weight of the solid content of the resin composition of the first cured resin layer and a second cured resin layer having a spherical particle content of 0.0020 to 0.0150 parts by weight based on 100 parts by weight of the solid content of the resin composition of the second cured resin layer.
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