Ring modulators with low-loss and large free spectral range (fsr) on a silicon-on-insulator (soi) platform
US-2024369864-A1 · Nov 7, 2024 · US
US10216016B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10216016-B2 |
| Application number | US-201514810444-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 27, 2015 |
| Priority date | Jul 25, 2014 |
| Publication date | Feb 26, 2019 |
| Grant date | Feb 26, 2019 |
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Methods, systems, and devices are disclosed for linear optical phase modulators. In some aspects, a linear optical phase modulator device is provided to include a substrate; a PN junction formed on the substrate to include a P region, a N region and a depletion region formed by the P and N regions; and an optical waveguide formed on the substrate and structured to guide light in one or more optical modes to have a spatial optical intensity distribution based on a free carrier density spatial distribution in the PN junction in such that the depletion region exhibits a substantially linear response with regard to a voltage applied to the PN junction to modulate a phase of the light guided by the optical waveguide.
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What is claimed are techniques and structures as described and shown, including: 1. A linear optical phase modulator device, comprising: a substrate; a PN junction formed on the substrate to include a P region, a N region and a depletion region formed by the P and N regions; and an optical waveguide formed on the substrate and structured to guide light in one or more optical modes to have a spatial optical intensity distribution based on a free carrier density spatial distribution in the PN junction, the optical waveguide structured to allow a second order optical mode to have a first optical peak inside the P region and a second optical peak inside the N region such that a voltage applied to the PN junction to modulate a phase of the light guided by the optical waveguide has a linear relationship with the phase of the light. 2. The device of claim 1 , wherein the optical waveguide has an optical field intensity which increases as distance from the junction increases. 3. The device of claim 1 , wherein the PN junction is located between peaks of an optical field. 4. The device of claim 1 , wherein the optical waveguide has a width of 800 nm to 1500 nm. 5. The device of claim 1 , wherein the optical waveguide has a height of 200 nm to 500 nm. 6. The device of claim 1 , wherein the linearity of the device depends on a waveguide width and doping concentrations of the P region and the N region. 7. The device of claim 1 , wherein the P region and N region include boron and phosphorous.
in an optical waveguide structure (G02F1/017, {G02F1/2257} take precedence) · CPC title
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