Stabilised resin composition

US10214627B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10214627-B2
Application numberUS-201515311032-A
CountryUS
Kind codeB2
Filing dateMay 13, 2015
Priority dateMay 15, 2014
Publication dateFeb 26, 2019
Grant dateFeb 26, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The invention is directed to a resin composition that has both high heat resistance and high resistance against ultraviolet radiation. The invention is further directed to an article comprising said composition, and to the use of a combination of compounds for stabilising a resin composition. The resin composition of the invention comprises (A) a polypropylene resin, (B) an optionally substituted linear or branched alkyl ester of 3-(alkylated 4′-hydroxyphenyl) propionic acid having a molecular weight of 750 g/mol or less, (C) a hindered amine light stabiliser, having a molecular weight of 1250 g/mol or more, wherein the hindered amine is comprised in the backbone of the hindered amine light stabiliser molecule, and (D) a thiosynergist.

First claim

Opening claim text (preview).

The invention claimed is: 1. A resin composition comprising (A) a polypropylene resin, (B) an optionally substituted linear or branched alkyl ester of 3-(alkylated 4′-hydroxyphenyl) propionic acid having a molecular weight of 750 g/mol or less, (C) a hindered amine light stabiliser, having a molecular weight of 1250 g/mol or more, wherein the hindered amine is comprised in the backbone of the hindered amine light stabiliser molecule, and (D) a thiosynergist comprising a sulphur-based hydroperoxide decomposer. 2. A resin composition according to claim 1 , further comprising (E) a phenolic antioxidant different from (B). 3. A resin composition according to claim 1 , further comprising (F) an antioxidant different from (B) and (E), selected from the group consisting of secondary antioxidants and non-phenolic antioxidants. 4. A resin composition according to claim 1 , wherein said a polypropylene resin (A) is a heterophasic polypropylene comprising a polypropylene homopolymer matrix phase and a disperse propylene/α-olefin elastomeric copolymer phase. 5. A resin composition according to claim 1 , wherein said phenolic antioxidant (B) has one phenolic group per molecule. 6. A resin composition according to claim 1 , wherein the phenolic antioxidant (B) is selected from the group consisting of C 1-20 -3-(3,5-di-t-butyl-4-hydroxyphenyl)propionates, preferably the phenolic antioxidant (B) is selected from the group consisting of methyl-3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate, octyl-3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate, isooctyl-3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate, tridecyl-3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate, tetradecyl-3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate, heptadecyl-3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate, hexadecyl-3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate, heptadecyl-3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate, octadecyl-3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate, and nonadecyl-3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate. 7. A resin composition according to claim 1 , wherein said hindered amine light stabiliser (C) has a molecular weight of from 1500-4000 g/mol. 8. A resin composition according to claim 1 , wherein said hindered amine light stabiliser (C) comprises a group according to formula (I) in the backbone 9. A resin composition according to claim 1 , wherein said hindered amine light stabiliser (C) comprises a group according to formula (II) in the backbone 10. A resin composition according to claim 1 , wherein said hindered amine light stabiliser (C) comprises a group according to formula (III) in the backbone 11. A resin composition according to claim 1 , wherein the hindered amine light stabiliser (C) is selected from the group consisting of wherein n is in the range of 9-16, and wherein m is in the range of 3-10. 12. A resin composition according to claim 11 , wherein the hindered amine light stabiliser (C) is (poly(4-hydroxy-2,2,6,6-tetramethyl-1-piperidine ethanol-alt-1,4-butanedioic acid), or a polymer of 2,2,4,4-tetramethyl-7-oxa-3,20-diaza-dispiro[5.1.11.2]-heneicosan-21-on and epichlorohydrin. 13. A resin composition according to claim 1 , wherein the resin composition is substantially free from hindered amine light stabilisers having a molecular weight of less than 1250 g/mol. 14. A resin composition according to claim 1 , wherein the resin composition is completely free from hindered amine light stabilisers having a molecular weight of less than 1250 g/mol. 15. A resin composition according to claim 1 , wherein said thiosynergist (D) is selected from the group consisting of dilauryl thiodipropionate, distearyl-3,3′-thiodipropionate and neopentanetetrayl tetrakis(3-dodecylthiopropionate). 16. Resin composition according to claim 1 , wherein said thiosynergist is distearyl-3,3′-thiodipropionate. 17. A resin composition according to claim 1 , wherein said phenolic antioxidant (E) has two or more phenolic groups per molecule. 18. A resin composition according to claim 1 , wherein said phenolic antioxidant (E) is selected from the group consisting of 2,2′-methylenebis(4-methyl-6-t-butylphenol), 4,4′-butylidenebis(3-methyl-6-t-butylphenol), 4,4′-thiobis(3-methyl-6-t-butylphenol), 2,2′-thiobis(4-methyl-6-t-butylphenol), 4,4′-methylenebis(2,6-di-t-butylphenol), 2,2′-methylenebis[6-(1-methylcyclohexyl)-p-cresol], 2,2′-ethylidenebis(2,4-di-t-butylphenol), 2,2′-butylidenebis(2-t-butyl-4-methylphenol), 1,1,3-tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane, triethylene glycol-bis[3-(3-t-butyl-5-methyl-4-hydroxyphenyl)propionate], 1,6-hexanediol-bis[3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], 2,2-thiodiethylenebis[3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], N,N′-hexamethylenebis(3,5-di-t-butyl-4-hydroxyhydrocinnamide), 3,5-di-t-butyl-4-hydroxybenzylphosphonate-diethyl ester 1,3,5-tris(2,6-dimethyl-3-hydroxy-4-t-butylbenzyl)isocyanurate, 1,3,5-tris[(3,5-di-t-butyl-4-hydroxyphenyl)propionyloxyethyl]isocyanurate, tris(4-t-butyl-2,6-dimethyl-3-hydroxybenzyl)isocyanurate, 2,4-bis(n-octylthio)-6-(4-hydroxy-3,5-t-butylanilino)-1,3,5-triazine, tetrakis[methylene-3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate] methane, bis(3,5-di-t-butyl-4-hydroxybenzylphosphonic acid ethyl ester) calcium, bis(3,5-di-t-butyl-4-hydroxybenzylphosphonic acid ethyl ester) nickel, bis[3,3-bis(3-t-4-hydroxyphenyl)butyric acid] glycol ester, N,N′-bis[3 ,5-di-t-butyl-4-hydroxyphenyl)propionyl]hydrazine, 2,2′-oxaimidobis[ethyl-3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], 2,2′-methylenebis(4-methyl-6-t-butylphenol)terephthalate, 1,3,5-trimethyl-2,4,6-tris(3,5-di-t-butyl-4-hydroxybenzyl) benzene, 3,9-bis[1,1-dimethyl-2-{13-(3-t-butyl-4-hydroxy-5-methylphenyl)propionyloxy} ethyl]-2,4,8,10-tetraoxaspiro[5,5]-undecane, 2,2-bis[4-(2-)3,5-di-t-butyl-4-hydroxyhydrocinnamoyloxy))ethoxyphenyl] propane, and alkyl esters of β-(3,5-di-t-butyl-4-hydroxyphenyl)propionic acid. 19. A resin composition according to claim 1 , wherein the antioxidant (F) is selected from the group consisting of phosphite secondary antioxidants. 20. A resin composition according to claim 1 , wherein the antioxidant (F) is selected from the group consisting of tris(nonylphenyl)phosphite, tris(2,4-di-i-butylphenyl)phosphite, bis(2,4-di-i-butylphenyl)pentaerythritol diphosphite, bis(2,6-di-i-butyl-4-methylphenyl) pentaerythritol diphosphite, bis(2,4-di-i-butyl-6-methylphenyl)pentaerythritol diphosphite, bis(2,4,6-tri-i-butylphenyl)pentaerythritol diphosphite, tetrakis(2,4-di-i-butylphenyl)-4,4′-biphenylenediphosphonite, bis(2,4-di-i-butyl-6-methylphenyl)methyl phosphite, and bis(2,4-di-i-butyl-6-methylphenyl)ethyl phosphite, more preferably the antioxidant (F) is selected from tris(2,4-di-i-butylphenyl)phosphite, bis(2,4-di-i-butyl-6-methylphenyl)ethyl phosphite, bis(2,4-di-i-butylphenyl) pentaerythritol diphosphite, and tetrakis(2,4-di-i-butylphenyl)-4,4′-biphenylenediphosphonite, most preferably the antioxidant (F) i

Assignees

Inventors

Classifications

  • Esters of phosphorous acids, e.g. of H3PO3 · CPC title

  • Silicon-containing compounds · CPC title

  • Copolymers of propene (C08L23/16 takes precedence) · CPC title

  • Thiols · CPC title

  • with phenols · CPC title

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What does patent US10214627B2 cover?
The invention is directed to a resin composition that has both high heat resistance and high resistance against ultraviolet radiation. The invention is further directed to an article comprising said composition, and to the use of a combination of compounds for stabilising a resin composition. The resin composition of the invention comprises (A) a polypropylene resin, (B) an optionally substitut…
Who is the assignee on this patent?
Sabic Global Technologies Bv
What technology area does this patent fall under?
Primary CPC classification C08K5/005. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Feb 26 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).