Selective interfacial mitigation of graphene defects

Patent metadata

Field	Value
Publication number	US-10213746-B2
Application number	US-201615099410-A
Country	US
Kind code	B2
Filing date	Apr 14, 2016
Priority date	Apr 14, 2016
Publication date	Feb 26, 2019
Grant date	Feb 26, 2019

Abstract

A method for the repair of defects in a graphene or other two-dimensional material through interfacial polymerization.

First claim

What is claimed is:

1. A method comprising:
disposing a first reactant on a first side of a two-dimensional material including defects;
disposing a second reactant on a second side of the two-dimensional material such that the first reactant and second reactant undergo a polymerization reaction and form polymer regions filling the defects; and
after the polymerization reaction forms the polymer regions, adhering the polymer regions to a support structure.

2. The method of claim 1 , wherein adhering the polymer regions to the support structure comprises forming covalent bonds between the polymer regions and the support structure.

3. The method of claim 1 , wherein the adhering the polymer regions to the support structure comprises forming molecular entanglement between the polymer regions and the support structure.

4. The method of claim 1 , further comprising adhering a polymer handling region formed along at least a portion of an edge of the two-dimensional material to the support structure.

5. The method of claim 1 , wherein the two-dimensional material comprises graphene.

6. The method of claim 1 , wherein the support structure is a porous support structure.

7. The method of claim 1 , wherein the polymer regions have a thickness in the range of 3 nm to 100 μm.

8. The method of claim 1 , wherein the polymer regions are biocompatible or bio-inert.

9. The method of claim 1 , further comprising treating the support structure to enhance adhesion between the polymer regions and the support structure.

10. The method of claim 1 , wherein the polymer regions are adhered to the support structure such that a distance between adjacent polymer regions is less than a length of the two-dimensional material between the adjacent polymer regions.

11. The method of claim 1 , wherein the polymer regions are adhered to the support structure such that folds are formed in the two-dimensional material.

12. A method comprising:
forming holes in a two-dimensional material including defects;
disposing a first reactant on a first side of the two-dimensional material;
disposing a second reactant on a second side of the two-dimensional material such that the first reactant and second reactant undergo a polymerization reaction and form polymer regions filling the defects and holes; and
adhering the polymer regions to a support structure.

13. The method of claim 12 , wherein the ratio of the area of the holes to the area of the two-dimensional material is in the range of 5% to 50%.

14. The method of claim 12 , wherein the polymer regions have a thickness in the range of 3 nm to 100 μm.

15. The method of claim 12 , wherein the holes are randomly distributed across the two-dimensional material.

16. The method of claim 12 , wherein the holes are arranged in a periodic array.

17. The method of claim 12 , wherein the polymer regions are adhered to the support structure such that a distance between adjacent polymer regions is less than a length of the two-dimensional material between the adjacent polymer regions.

18. The method of claim 12 , wherein the polymer regions are adhered to the support structure such that folds are formed in the two-dimensional material.

19. A method comprising:
forming pores in a two-dimensional material including defects, wherein the defects have a size greater than 15 nm, and the pores have a size that is less than the size of the defects;
disposing a first reactant on a first side of the two-dimensional material; and
disposing a second reactant on a second side of the two-dimensional material such that the first reactant and second reactant undergo a polymerization reaction and form polymer regions filling the defects;
wherein the pores are not filled by the polymer regions.

20. The method of claim 19 , wherein at least one of the first reactant and the second reactant comprises a dendrimer.

21. The method of claim 19 , further comprising applying an electric potential to the two-dimensional material to attract the first reactant and the second reactant to the defects in the graphene material.

22. The method of claim 19 , further comprising heating the first reactant and the second reactant to increase a rate of diffusion thereof and increase a rate of the polymerization reaction.

23. The method of claim 19 , wherein the first reactant is ionic, the second reactant is ionic, and the first and second reactants have opposite charges.

24. The method of claim 19 , further comprising forming holes in the two-dimensional material with a size greater than the size of the pores, such that the holes are filled by polymer regions formed during the polymerization reaction.

25. A method comprising:
disposing a first reactant on a first side of a two-dimensional material and extending beyond at least a portion of an edge of the two-dimensional material;
disposing a second reactant on a second side of the two-dimensional material and extending beyond the at least a portion of the edge of the two-dimensional material;
wherein the first reactant and second reactant undergo a polymerization reaction and form a polymer handling region at least a portion of the edge of the two-dimensional material.

26. The method of claim 25 , wherein the polymer handling region extends along the entire circumference of the two-dimensional material.

27. The method of claim 25 , wherein the polymer handling region extends from the at least a portion of the edge of the two-dimensional material for a distance of at least about 1 mm.

28. The method of claim 25 , wherein the polymer handling region has a thickness in the range of 3 nm to 100 μm.

29. A method comprising:
disposing a first reactant on a first side of a two-dimensional material containing defects;
disposing a second reactant on a second side of the two-dimensional material such that the first reactant and second reactant undergo a polymerization reaction and form polymer regions filling the defects; and
forming pores in the two-dimensional material by impacting the two-dimensional material with nanoparticles.

30. The method of claim 29 , wherein the nanoparticles have an energy of 2 keV to 500 keV per nanoparticle.

31. The method of claim 29 , wherein the nanoparticles have a size of 2 nm to 50 nm.

32. The method of claim 29 , wherein the size of the pores is from 1 nm to 100 nm.

33. The method of claim 29 , wherein the fluence of the nanoparticles is 1×10 8 to 1×10 12 nanoparticles/cm 2 .

34. The method of claim 29 , wherein the two-dimensional material comprises graphene.

35. A method comprising:
forming pores in a two-dimensional material including defects by impacting the two-dimensional material with nanoparticles;
disposing a first reactant on a first side of the two-dimensional material; and
disposing a second reactant on a second side of the two-dimensional material such that the first reactant and second reactant undergo a polymerization reaction and form polymer regions filling the defects;
wherein the pores are not filled by the polymer regions.

36. The method of claim 35 , wherein the nanoparticles have an energy of 2 keV to 500 keV per nanoparticle.

37. The method of claim 35 , wherein the nanoparticles have a size o

Assignees

• Lockheed Corp

Inventors

• Liu Han
• Simon Sarah M
• Sinsabaugh Steven Lloyd

Classifications

• B01D2323/40

  in-situ membrane formation · CPC title

• B01D67/0006

  by chemical reactions (in-situ polymerisation, polycondensation, cross-linking or reaction for manufacturing composite membranes B01D69/125) · CPC title

• B01D69/105

  Support pretreatment · CPC title

• B01D2323/286

  Closing of pores, e.g. for membrane sealing · CPC title

• B01D2323/28

  Pore treatments · CPC title