Density and power controlled plasma antenna

US10211522B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10211522-B2
Application numberUS-201615219814-A
CountryUS
Kind codeB2
Filing dateJul 26, 2016
Priority dateJul 26, 2016
Publication dateFeb 19, 2019
Grant dateFeb 19, 2019

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A plasma antenna assembly may include a plasma antenna element, a plasma density sensor operably coupled to the plasma antenna element to measure plasma density during ionization of the plasma antenna element, a driver circuit operably coupled to the plasma antenna element to selectively provide pulsed current to the plasma antenna element for ionization of plasma in the plasma antenna element, and a controller operably coupled to the driver circuit and the plasma density sensor to provide control of the plasma density of the plasma antenna element.

First claim

Opening claim text (preview).

What is claimed is: 1. A plasma antenna assembly comprising: a plasma antenna element; a plasma density sensor operably coupled to the plasma antenna element to measure plasma density during ionization of the plasma antenna element; a driver circuit operably coupled to the plasma antenna element to selectively provide pulsed current to the plasma antenna element for ionization of plasma in the plasma antenna element; and a controller operably coupled to the driver circuit and the plasma density sensor to provide control of the plasma density of the plasma antenna element. 2. The plasma antenna assembly of claim 1 , wherein the controller is configured to control a pulse width of the pulsed current based on plasma density measured by the plasma density sensor. 3. The plasma antenna assembly of claim 2 , wherein the controller is configured to direct an increase to the pulse width responsive to the plasma density measured being less than a target plasma density. 4. The plasma antenna assembly of claim 2 , wherein the controller is configured to direct a decrease to the pulse width responsive to the plasma density measured being greater than a target plasma density. 5. The plasma antenna assembly of claim 1 , wherein the driver circuit comprises a voltage doubler circuit configured to double a source voltage provided by the driver circuit to the plasma antenna element for ionization. 6. The plasma antenna assembly of claim 5 , wherein the voltage doubler circuit is configured to charge a first capacitor and a second capacitor in parallel from the source voltage and discharge the first and second capacitors in series across a first spark gap and a second spark gap to provide ionization current pulses to the plasma antenna element. 7. The plasma antenna assembly of claim 5 , wherein the voltage doubler circuit is configured to charge a first capacitor and a second capacitor in parallel from the source voltage and discharge the first and second capacitors in series across a first spark gap and a first electronic switch to provide ionization current pulses to the plasma antenna element. 8. The plasma antenna assembly of claim 5 , wherein the voltage doubler circuit is configured to charge a first capacitor and a second capacitor in parallel from the source voltage and discharge the first and second capacitors in series across a first electronic switch and a second electronic switch to provide ionization current pulses to the plasma antenna element. 9. The plasma antenna assembly of claim 8 , wherein the first and second electronic switches are each triggered by a respective one of a first trigger circuit and a second trigger circuit, the first and second trigger circuits being controlled by a synchronization circuit. 10. The plasma antenna assembly of claim 9 , wherein the synchronization circuit comprises a CMOS timer integrated circuit configured to enable shortening of a pulse width of the current pulses. 11. The plasma antenna assembly of claim 8 , wherein the first and second electronic switches comprise insulated-gate bipolar transistors (IGBTs). 12. The plasma antenna assembly of claim 1 , wherein the plasma density sensor comprises an interferometer. 13. The plasma antenna assembly of claim 12 , wherein the controller is configured to receive the measured plasma density from the interferometer and compare the measured plasma density to a desired plasma density to adjust a pulse width of the current pulses based on a difference between the measured plasma density and the desired plasma density. 14. The plasma antenna assembly of claim 13 , wherein the desired plasma density is input via the controller. 15. A method comprising: receiving an indication of a desired plasma density of a plasma antenna element; measuring a current plasma density during ionization of the plasma antenna element with current pulses; comparing the current plasma density to the desired plasma density; and adjusting the current plasma density via a driving circuit that applies the current pulses to the plasma antenna element based on a result of the comparing. 16. The method of claim 15 , wherein adjusting the current plasma density comprises altering a pulse width of the current pulses to increase plasma density responsive to current plasma density being less than desired plasma density. 17. The method of claim 15 , wherein adjusting the current plasma density comprises altering a pulse width of the current pulses to decrease plasma density responsive to current plasma density being greater than desired plasma density. 18. The method of claim 15 , wherein adjusting the current plasma density comprises controlling a pulse width of the current pulses via a pulsing circuit that comprises a voltage doubler. 19. The method of claim 18 , wherein controlling the pulse width comprises employing a synchronization circuit to control triggering of a first electronic switch and a second electronic switch of the voltage doubler in synchronization. 20. The method of claim 19 , wherein controlling the pulse width comprises employing two capacitors that charge in parallel and discharge in series to discharge in synchronization responsive to operation of the synchronization circuit.

Assignees

Inventors

Classifications

  • DC, AC or pulsed generators · CPC title

  • H01Q1/366Primary

    using an ionized gas · CPC title

  • varying the electric or magnetic characteristics of reflecting, refracting, or diffracting devices associated with the radiating element · CPC title

  • Electricity · mapped topic

  • H05H1/46Primary

    using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H1/26 takes precedence) · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10211522B2 cover?
A plasma antenna assembly may include a plasma antenna element, a plasma density sensor operably coupled to the plasma antenna element to measure plasma density during ionization of the plasma antenna element, a driver circuit operably coupled to the plasma antenna element to selectively provide pulsed current to the plasma antenna element for ionization of plasma in the plasma antenna element,…
Who is the assignee on this patent?
Smartsky Networks LLC
What technology area does this patent fall under?
Primary CPC classification H01Q1/366. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 19 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).