Plasma aviation antenna
US-9444132-B2 · Sep 13, 2016 · US
US10211522B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10211522-B2 |
| Application number | US-201615219814-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 26, 2016 |
| Priority date | Jul 26, 2016 |
| Publication date | Feb 19, 2019 |
| Grant date | Feb 19, 2019 |
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A plasma antenna assembly may include a plasma antenna element, a plasma density sensor operably coupled to the plasma antenna element to measure plasma density during ionization of the plasma antenna element, a driver circuit operably coupled to the plasma antenna element to selectively provide pulsed current to the plasma antenna element for ionization of plasma in the plasma antenna element, and a controller operably coupled to the driver circuit and the plasma density sensor to provide control of the plasma density of the plasma antenna element.
Opening claim text (preview).
What is claimed is: 1. A plasma antenna assembly comprising: a plasma antenna element; a plasma density sensor operably coupled to the plasma antenna element to measure plasma density during ionization of the plasma antenna element; a driver circuit operably coupled to the plasma antenna element to selectively provide pulsed current to the plasma antenna element for ionization of plasma in the plasma antenna element; and a controller operably coupled to the driver circuit and the plasma density sensor to provide control of the plasma density of the plasma antenna element. 2. The plasma antenna assembly of claim 1 , wherein the controller is configured to control a pulse width of the pulsed current based on plasma density measured by the plasma density sensor. 3. The plasma antenna assembly of claim 2 , wherein the controller is configured to direct an increase to the pulse width responsive to the plasma density measured being less than a target plasma density. 4. The plasma antenna assembly of claim 2 , wherein the controller is configured to direct a decrease to the pulse width responsive to the plasma density measured being greater than a target plasma density. 5. The plasma antenna assembly of claim 1 , wherein the driver circuit comprises a voltage doubler circuit configured to double a source voltage provided by the driver circuit to the plasma antenna element for ionization. 6. The plasma antenna assembly of claim 5 , wherein the voltage doubler circuit is configured to charge a first capacitor and a second capacitor in parallel from the source voltage and discharge the first and second capacitors in series across a first spark gap and a second spark gap to provide ionization current pulses to the plasma antenna element. 7. The plasma antenna assembly of claim 5 , wherein the voltage doubler circuit is configured to charge a first capacitor and a second capacitor in parallel from the source voltage and discharge the first and second capacitors in series across a first spark gap and a first electronic switch to provide ionization current pulses to the plasma antenna element. 8. The plasma antenna assembly of claim 5 , wherein the voltage doubler circuit is configured to charge a first capacitor and a second capacitor in parallel from the source voltage and discharge the first and second capacitors in series across a first electronic switch and a second electronic switch to provide ionization current pulses to the plasma antenna element. 9. The plasma antenna assembly of claim 8 , wherein the first and second electronic switches are each triggered by a respective one of a first trigger circuit and a second trigger circuit, the first and second trigger circuits being controlled by a synchronization circuit. 10. The plasma antenna assembly of claim 9 , wherein the synchronization circuit comprises a CMOS timer integrated circuit configured to enable shortening of a pulse width of the current pulses. 11. The plasma antenna assembly of claim 8 , wherein the first and second electronic switches comprise insulated-gate bipolar transistors (IGBTs). 12. The plasma antenna assembly of claim 1 , wherein the plasma density sensor comprises an interferometer. 13. The plasma antenna assembly of claim 12 , wherein the controller is configured to receive the measured plasma density from the interferometer and compare the measured plasma density to a desired plasma density to adjust a pulse width of the current pulses based on a difference between the measured plasma density and the desired plasma density. 14. The plasma antenna assembly of claim 13 , wherein the desired plasma density is input via the controller. 15. A method comprising: receiving an indication of a desired plasma density of a plasma antenna element; measuring a current plasma density during ionization of the plasma antenna element with current pulses; comparing the current plasma density to the desired plasma density; and adjusting the current plasma density via a driving circuit that applies the current pulses to the plasma antenna element based on a result of the comparing. 16. The method of claim 15 , wherein adjusting the current plasma density comprises altering a pulse width of the current pulses to increase plasma density responsive to current plasma density being less than desired plasma density. 17. The method of claim 15 , wherein adjusting the current plasma density comprises altering a pulse width of the current pulses to decrease plasma density responsive to current plasma density being greater than desired plasma density. 18. The method of claim 15 , wherein adjusting the current plasma density comprises controlling a pulse width of the current pulses via a pulsing circuit that comprises a voltage doubler. 19. The method of claim 18 , wherein controlling the pulse width comprises employing a synchronization circuit to control triggering of a first electronic switch and a second electronic switch of the voltage doubler in synchronization. 20. The method of claim 19 , wherein controlling the pulse width comprises employing two capacitors that charge in parallel and discharge in series to discharge in synchronization responsive to operation of the synchronization circuit.
DC, AC or pulsed generators · CPC title
using an ionized gas · CPC title
varying the electric or magnetic characteristics of reflecting, refracting, or diffracting devices associated with the radiating element · CPC title
Electricity · mapped topic
using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H1/26 takes precedence) · CPC title
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