Composite substrate

US10211389B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10211389-B2
Application numberUS-201615001501-A
CountryUS
Kind codeB2
Filing dateJan 20, 2016
Priority dateJul 25, 2013
Publication dateFeb 19, 2019
Grant dateFeb 19, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

In the composite substrate 10 , the piezoelectric substrate 12 and the support substrate 14 are bonded by direct bonding using an ion beam. One surface of the piezoelectric substrate 12 is a negatively-polarized surface 12 a and another surface of the piezoelectric substrate 12 is a positively-polarized surface 12 b . An etching rate at which the negatively-polarized surface 12 a is etched with a strong acid may be higher than an etching rate at which the positively-polarized surface 12 b is etched with the strong acid. The positively-polarized surface 12 b of the piezoelectric substrate 12 is directly bonded to the support substrate 14 . The negatively-polarized surface 12 a of the piezoelectric substrate 12 may be etched with the strong acid.

First claim

Opening claim text (preview).

What is claimed is: 1. A composite substrate comprising: a piezoelectric substrate, one surface of which is a negatively-polarized surface and another surface of which is a positively-polarized surface; and a support substrate bonded to the positively-polarized surface of the piezoelectric substrate by direct bonding; wherein the piezoelectric substrate is a lithium tantalate substrate or a lithium niobate substrate, and the support substrate is a silicon substrate or a glass substrate. 2. The composite substrate according to claim 1 , wherein the negatively-polarized surface of the piezoelectric substrate is etched with a strong acid, and wherein an etching rate at which the negatively-polarized surface is etched with the strong acid is higher than an etching rate at which the positively-polarized surface is etched with the strong acid, and an etching rate at which the support substrate is etched with the strong acid is higher than the etching rate at which the negatively-polarized surface is etched with the strong acid. 3. The composite substrate according to claim 2 , wherein the strong acid is hydrofluoric nitric acid or hydrofluoric acid. 4. The composite substrate according to claim 1 , wherein the support substrate has a thermal expansion coefficient smaller than a thermal expansion coefficient of the piezoelectric substrate.

Assignees

Inventors

Classifications

  • for obtaining desired frequency or temperature coefficient · CPC title

  • of temperature influence (cut angles H03H9/02543) · CPC title

  • of combined substrates, multilayered substrates, piezoelectrical layers on not-piezoelectrical substrate · CPC title

  • Electricity · mapped topic

  • Electricity · mapped topic

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What does patent US10211389B2 cover?
In the composite substrate 10 , the piezoelectric substrate 12 and the support substrate 14 are bonded by direct bonding using an ion beam. One surface of the piezoelectric substrate 12 is a negatively-polarized surface 12 a and another surface of the piezoelectric substrate 12 is a positively-polarized surface 12 b . An etching rate at which the negatively-polarized surface 12…
Who is the assignee on this patent?
Ngk Insulators Ltd, Ngk Ceram Device Co Ltd
What technology area does this patent fall under?
Primary CPC classification H03H9/02574. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 19 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).