Gas decomposition reactor feedback control using raman spectrometry

US10207236B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10207236-B2
Application numberUS-201615044734-A
CountryUS
Kind codeB2
Filing dateFeb 16, 2016
Priority dateMar 14, 2013
Publication dateFeb 19, 2019
Grant dateFeb 19, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A gas decomposition reactor for the decomposition of a gas into a mixture of solid and gaseous by-products is disclosed. The gas decomposition reactor includes a reactor vessel, a Raman spectrometer, and a processor. The reactor vessel has an inlet for receiving inlet gas and an exhaust outlet for releasing exhaust gas. The Raman spectrometer is connected with the exhaust outlet for determining a chemical conversion within the reactor chamber and generating a corresponding signal. The processor is connected with the Raman spectrometer to receive the signal from the Raman spectrometer. The processor is capable of comparing the signal with a set of values and calculating differences between the signal and the set of values. The processor is connected with the inlet to regulate a flow of the inlet gas.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of operating a gas decomposition reactor having an inlet and an exhaust outlet, the method comprising: continuously measuring a chemical composition of an exhaust gas located within the exhaust outlet using Raman spectra and generating a corresponding exhaust signal, wherein at least two components of the exhaust gas are detected simultaneously; continuously measuring a chemical composition of an inlet gas located within the inlet using Raman spectra and generating a corresponding inlet signal; comparing the measured chemical composition of the exhaust gas to the measured chemical composition of the inlet gas to ratiometrically determine a conversion efficiency of a reaction in the gas decomposition reactor based at least in part on the inlet signal and the exhaust signal; and adjusting a flow of an inlet gas through the inlet based at least in part on the determined conversion efficiency to change a subsequently measured chemical composition of a subsequent exhaust gas located within the gas outlet. 2. The method of claim 1 , wherein the chemical composition of the exhaust gas is measured by a Raman spectrometer. 3. The method of claim 2 , wherein a processor is connected with the Raman spectrometer to receive a signal from the Raman spectrometer to compare the measured chemical composition of the exhaust gas to the measured chemical composition of the inlet gas. 4. The method of claim 1 , wherein the flow of the inlet gas is adjusted by a pressure control system. 5. The method of claim 4 , wherein the pressure control system is connected with the inlet gas for regulating the flow of the inlet gas through the inlet. 6. The method of claim 1 , wherein the inlet gas comprises a first gas and a second gas and the chemical composition of the inlet gas is measured by a Raman spectrometer. 7. The method of claim 1 , wherein the flow of the inlet gas through the inlet is adjusted in real time based at least in part on the determined conversion efficiency. 8. The method of claim 1 , wherein a Raman spectrometer is connected with the inlet and the exhaust outlet through Raman probes for determining the chemical composition of the inlet gas and the exhaust gas. 9. The method of claim 1 , wherein the inlet gas is a mixture of a first gas and a second gas. 10. The method of claim 9 , wherein a flow of one of the first gas and the second gas is regulated by a pressure control system connected with one of the first gas and the second gas. 11. The method of claim 1 , wherein the gas decomposition reactor is a fluidized bed reactor. 12. The method of claim 11 , wherein the inlet gas is a mixture of a reaction gas and a fluidizing gas. 13. The method of claim 12 , wherein a flow of the reaction gas and the flow of the fluidizing gas is regulated by a pressure control system separately connected with a source of the reaction gas and a source of the fluidizing gas. 14. The method of claim 12 , wherein the reaction gas is silane and the fluidizing gas is hydrogen.

Assignees

Inventors

Classifications

  • by decomposition of silicon halides or halosilanes or reduction thereof with hydrogen as the only reducing agent · CPC title

  • controlling the composition of the reactive mixture · CPC title

  • controlling the flow · CPC title

  • B01J8/1809Primary

    Controlling processes · CPC title

  • Dynamically variable (in-line) parameter values · CPC title

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What does patent US10207236B2 cover?
A gas decomposition reactor for the decomposition of a gas into a mixture of solid and gaseous by-products is disclosed. The gas decomposition reactor includes a reactor vessel, a Raman spectrometer, and a processor. The reactor vessel has an inlet for receiving inlet gas and an exhaust outlet for releasing exhaust gas. The Raman spectrometer is connected with the exhaust outlet for determining…
Who is the assignee on this patent?
Sunedison Inc, Corner Star Ltd
What technology area does this patent fall under?
Primary CPC classification B01J8/1809. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Feb 19 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).