Lens design method and radiation source substrate

US10199740B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10199740-B2
Application numberUS-201515327084-A
CountryUS
Kind codeB2
Filing dateMar 18, 2015
Priority dateJul 24, 2014
Publication dateFeb 5, 2019
Grant dateFeb 5, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A lens design method is disclosed for designing a lens to reshape an actual far-field radiation pattern of a radiation source, such as a spiral antenna, to a preferred far-field radiation pattern. The method comprises:—determining a preferred far-field radiation pattern of the radiation source;—deriving a corresponding near-field radiation pattern from the preferred far-field radiation pattern;—determining an actual near-field pattern of the radiation source;—mapping an electric field and a magnetic field of the actual near-field radiation pattern to the derived near-field radiation pattern using a transfer relationship, the transfer relationship comprising material parameters which characterize the lens; and,—determining the material parameters.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for reshaping an actual far-field radiation pattern of a radiation source to a preferred far-field radiation pattern, the method comprising: determining a preferred far-field radiation pattern of the radiation source; deriving a corresponding near-field radiation pattern from the preferred far-field radiation pattern; determining an actual near-field pattern of the radiation source; mapping an electric field and a magnetic field of the actual near-field radiation pattern to the derived near-field radiation pattern using a transfer relationship, the transfer relationship comprising required material parameters which characterise a lens or substrate, said lens or substrate comprising a host material within which is disposed at least one second, dispersed, particulate material, wherein a dispersal density of the at least one second, dispersed, particulate material varies across the lens or substrate to create a refractive index gradient; determining the required material parameters; constructing the lens or substrate according to the required material parameters; and using the lens or substrate to reshape the actual far-field radiation pattern to the preferred far-field radiation pattern. 2. The method according to claim 1 , wherein the near-field radiation pattern is derived from the preferred far-field radiation pattern using a mathematical expansion of the electric and magnetic fields of the preferred far-field radiation pattern. 3. The method according to claim 1 , wherein the actual near-field radiation pattern is derived from the actual far-field radiation pattern of the radiation source. 4. The method according to claim 3 , wherein the actual near-field radiation pattern is derived from the actual far-field radiation pattern using a mathematical expansion of the electric and magnetic fields of the actual far-field radiation pattern. 5. The method according to claim 2 , wherein the mathematical expansion comprises a Wilcox expansion. 6. The method according to claim 1 , further comprising referencing the determined material parameters to a catalogue to provide a physical material make-up of the lens which provides the preferred far-field radiation pattern. 7. An article of manufacture comprising: non-transient media containing a computer program operable on a computing device so as to cause the computing device to: derive a near-field radiation pattern corresponding to a preferred far-field radiation pattern; map an electric field and a magnetic field of an actual near-field radiation pattern to the derived near-field radiation pattern using a transfer relationship, the transfer relationship comprising required material parameters which characterise a lens or substrate, said lens or substrate comprising a host material within which is disposed at least one second, dispersed, particulate material, wherein a dispersal density of the at least one second, dispersed, particulate material varies across the lens or substrate to create a refractive index gradient; and determine the required material parameters. 8. An article of manufacture comprising: a lens or substrate suitable for manipulating at least a portion of a radiation pattern of a radiation source applied to the substrate, the lens or substrate comprising a host material within which is disposed at least one second, dispersed, particulate material, a dispersal density of the at least one second, dispersed, particulate material being varied within the substrate to create a refractive index gradient for manipulating at least a portion of the radiation pattern generated by the radiation source. 9. The article of manufacture according to claim 8 , wherein the lens or substrate includes a plurality of concentrically arranged regions centred on an axis of the radiation source, each of the regions comprising material having a respective material property. 10. A radiation generating apparatus comprising a substrate according to claim 8 and a radiation source disposed upon the substrate. 11. The apparatus according to claim 10 , wherein the radiation source comprises a spiral antenna. 12. The method of claim 1 , wherein the radiation source is a spiral antenna, and determining the material parameters comprises discretizing the lens or substrate into a plurality of concentrically arranged regions, centered around a central axis of the spiral antenna, the regions comprising respective permittivity and permeability to suitably manipulate the radiation generated from the spiral antenna. 13. The article of manufacture of claim 8 , wherein the radiation source is a spiral antenna, and the lens or substrate is discretized into a plurality of concentrically arranged regions centered around a central axis of the spiral antenna, the regions comprising respective permittivity and permeability to suitably manipulate the radiation generated from the spiral antenna. 14. The article of manufacture of claim 11 , wherein the lens or substrate is discretized into a plurality of concentrically arranged regions centered around a central axis of the spiral antenna, the regions comprising respective permittivity and permeability to suitably manipulate the radiation generated from the spiral antenna. 15. The method of claim 1 , wherein the host material of the lens or substrate is a resin, and the at least one second, dispersed, particulate material includes a ceramic powder. 16. The article of manufacture of claim 8 , wherein the host material of the lens or substrate is a resin, and the at least one second, dispersed, particulate material includes a ceramic powder. 17. The article of manufacture of claim 10 , wherein the host material of the lens or substrate is a resin, and the at least one second, dispersed, particulate material includes a ceramic powder.

Assignees

Inventors

Classifications

  • Selective devices used as spatial filter or angular sidelobe filter · CPC title

  • H01Q15/10Primary

    comprising three-dimensional [3D] array of impedance discontinuities, e.g. holes in conductive surfaces or conductive discs forming artificial dielectric · CPC title

  • for focusing · CPC title

  • for broadside radiating helical antennas · CPC title

  • Theoretical analysis and design methods of such selective devices · CPC title

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What does patent US10199740B2 cover?
A lens design method is disclosed for designing a lens to reshape an actual far-field radiation pattern of a radiation source, such as a spiral antenna, to a preferred far-field radiation pattern. The method comprises:—determining a preferred far-field radiation pattern of the radiation source;—deriving a corresponding near-field radiation pattern from the preferred far-field radiation pattern;…
Who is the assignee on this patent?
Bae Systems Plc
What technology area does this patent fall under?
Primary CPC classification H01Q15/10. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 05 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).