Plasma source

Patent metadata

Field	Value
Publication number	US-10199201-B2
Application number	US-201815902009-A
Country	US
Kind code	B2
Filing date	Feb 22, 2018
Priority date	Jun 23, 2017
Publication date	Feb 5, 2019
Grant date	Feb 5, 2019

Abstract

A plasma source is provided. The plasma source includes a chamber body, a supply passage, a vacuum connector, an antenna, a first insulator, a second insulator, and a conductor. The chamber body has an opening for emitting ions or electrons. The supply passage penetrates through a first peripheral wall of the chamber body. The vacuum connector is provided in a second peripheral wall of the chamber body at a position opposed to the opening. The antenna has a base end connected to the vacuum connector, and extends inside the chamber body toward the opening. The first insulator covers a first region of the antenna at a distal end of the antenna inside the chamber body. The second insulator covers a second region of the antenna at the base end of the antenna inside the chamber body. The conductor covers the second insulator.

First claim

What is claimed is:

1. A plasma source comprising:
a chamber body having an opening for emitting ions or electrons;
a gas supply passage penetrating through a first peripheral wall of the chamber body;
a vacuum connector provided in a second peripheral wall of the chamber body;
an antenna having a base end connected to the vacuum connector, and extending inside the chamber body toward the opening;
a first insulator covering a first region of the antenna at a distal end of the antenna inside the chamber body;
a second insulator covering a second region of the antenna at the base end of the antenna inside the chamber body; and
a conductor covering the second insulator.

2. The plasma source as recited in claim 1 , wherein the first peripheral wall and the second peripheral wall are a same wall of the chamber body.

3. The plasma source as recited in claim 2 , wherein the first peripheral wall and the second peripheral wall of the chamber body are both opposite from the opening.

4. The plasma source as recited in claim 1 , wherein the first peripheral wall is a different wall of the chamber body from the second peripheral wall.

5. The plasma source as recited in claim 1 ,
wherein the vacuum connector comprises:
a pin;
a holder formed from an insulator and holding the pin; and
a tubular member formed from an electroconductive material and comprising a first threaded section on an outer wall surface thereof, the pin being disposed inside the tubular member, and

wherein the conductor comprises a second threaded section on an inner wall surface thereof, the second threaded section being threadingly engaged with the first threaded section.

6. The plasma source as recited in claim 5 , wherein the vacuum connector has one end to which the antenna is connected, and another end to which a coaxial cable is connected, wherein a first impedance between the second region and the conductor is equal to a second impedance between an inner conductor and an outer conductor of the coaxial cable.

7. The plasma source as recited in claim 6 , wherein the first insulator comprises a plurality of insulator blocks arranged along a longitudinal direction of the antenna.

8. The plasma source as recited in claim 7 , further comprising:
a fitted member fitted into the supply passage, the fitted member having an inlet port through which gas flows into the fitted member and at least one outlet port through which gas flows out of the fitted member,
wherein, when viewed in a first direction from the chamber body toward the supply passage, the at least one outlet port and the inlet port are offset from each other in a second direction orthogonal to the first direction.

9. The plasma source as recited in claim 6 , further comprising:
a fitted member fitted into the supply passage, the fitted member having an inlet port through which gas flows into the fitted member and at least one outlet port through which gas flows out of the fitted member,
wherein, when viewed in a first direction from the chamber body toward the supply passage, the at least one outlet port and the inlet port are offset from each other in a second direction orthogonal to the first direction.

10. The plasma source as recited in claim 5 , wherein the first insulator comprises a plurality of insulator blocks arranged along a longitudinal direction of the antenna.

11. The plasma source as recited in claim 10 , further comprising:
a fitted member fitted into the supply passage, the fitted member having an inlet port through which gas flows into the fitted member and at least one outlet port through which gas flows out of the fitted member,
wherein, when viewed in a first direction from the chamber body toward the supply passage, the at least one outlet port and the inlet port are offset from each other in a second direction orthogonal to the first direction.

12. The plasma source as recited in claim 5 , further comprising:
a fitted member fitted into the supply passage, the fitted member having an inlet port through which gas flows into the fitted member and at least one outlet port through which gas flows out of the fitted member,
wherein, when viewed in a first direction from the chamber body toward the supply passage, the at least one outlet port and the inlet port are offset from each other in a second direction orthogonal to the first direction.

13. The plasma source as recited in claim 1 , wherein the vacuum connector has one end to which the antenna is connected, and another end to which a coaxial cable is connected, wherein a first impedance between the second region and the conductor is equal to a second impedance between an inner conductor and an outer conductor of the coaxial cable.

14. The plasma source as recited in claim 13 , further comprising:
a fitted member fitted into the supply passage, the fitted member having an inlet port through which gas flows into the fitted member and at least one outlet port through which gas flows out of the fitted member,
wherein, when viewed in a first direction from the chamber body toward the supply passage, the at least one outlet port and the inlet port are offset from each other in a second direction orthogonal to the first direction.

15. The plasma source as recited in claim 1 , wherein the vacuum connector has one end to which the antenna is connected, and another end to which a coaxial cable is connected, wherein a first impedance between the second region and the conductor is different from a second impedance between an inner conductor and an outer conductor of the coaxial cable.

16. The plasma source as recited in claim 1 , wherein the first insulator comprises a plurality of insulator blocks arranged along a longitudinal direction of the antenna.

17. The plasma source as recited in claim 10 , further comprising:
a fitted member fitted into the supply passage, the fitted member having an inlet port through which gas flows into the fitted member and at least one outlet port through which gas flows out of the fitted member,
wherein, when viewed in a first direction from the chamber body toward the supply passage, the at least one outlet port and the inlet port are offset from each other in a second direction orthogonal to the first direction.

18. The plasma source as recited in claim 1 , further comprising:
a fitted member fitted into the supply passage, the fitted member having an inlet port through which gas flows into the fitted member and at least one outlet port through which gas flows out of the fitted member,
wherein, when viewed in a first direction from the chamber body toward the supply passage, the at least one outlet port and the inlet port are offset from each other in a second direction orthogonal to the first direction.

19. A plasma source comprising:
a chamber body having an opening for emitting ions or electrons, and a wall opposite to the opening, a chamber being defined between the wall and the opening;
a gas supply passage penetrating through the chamber body;
a vacuum connector provided in the wall and having a portion extending into the chamber;
an antenna connected to the vacuum connector, and having an extension portion that extends into the chamber;
a first insulator covering a distal end of the extension portion of the antenna;
a second insulator covering a proximal end of the extension portion of the antenna between the wall and the first insulator; and
a conductor coaxially covering the second insulator.

20. The plasma source as recited in claim 19 , wherein th

Assignees

• Nissin Ion Equipment Co Ltd

Inventors

• Fujita Hideki
• Itoi Suguru

Classifications

• H01J37/32532

  Electrodes · CPC title

• H01J2237/032

  Mounting or supporting · CPC title

• H01J37/32467

  Material · CPC title

• H01J37/3222

  Antennas · CPC title

• H01J37/3244

  Gas supply means · CPC title