Adjusting device and adjusting method for exposure device

Patent metadata

Field	Value
Publication number	US-10197919-B2
Application number	US-201515523140-A
Country	US
Kind code	B2
Filing date	Oct 27, 2015
Priority date	Oct 29, 2014
Publication date	Feb 5, 2019
Grant date	Feb 5, 2019

Abstract

An adjustment apparatus which is an optical system having an incident face and a light exit face that is parallel to the incident face. The optical system is disposed in an exposure device. The adjustment apparatus includes at least one wedge lens and a plurality of optical lenses configured such that at least one of focal plane adjustment, magnification adjustment and position adjustment for a field of view corresponding to the exposure device is made possible through changing relative positions of at least one pair of neighboring ones of the lenses. An adjustment method corresponding to the adjustment apparatus is also provided for the focal plane adjustment, magnification adjustment and position adjustment for the field of view corresponding to the exposure device.

First claim

What is claimed is:

1. An adjustment apparatus, which is an optical system having an incident face and a light exit face that is parallel to the incident face, the optical system being disposed in an exposure device, wherein the adjustment apparatus comprises:
a first wedge lens having a first bevel and a first wedge angle;
a first optical lens having a second bevel and a first curved face opposing the second bevel, the second bevel proximal and parallel to the first bevel, the second bevel having the first wedge angle, the first curved face having a first radius of curvature;
a second optical lens having a second curved face and a third curved face opposing the second curved face, the second curved face proximal to the first curved face, the second curved face having a second radius of curvature that is same as or substantially same as the first radius of curvature, the third curved face having a third radius of curvature; and
a third optical lens having a fourth curved face proximal to the third curved face, the fourth curved face having a fourth radius of curvature that is same as or substantially same as the third radius of curvature, and
wherein the adjustment apparatus is configured to adjust at least one of a focal plane, a magnification and a position for a field of view corresponding to the exposure device through changing relative positions of at least one pair of neighboring ones of the lenses.

2. The adjustment apparatus according to claim 1 , wherein the exposure device comprises a light source, a mask, a projection optical system and a photosensitive substrate, wherein the adjustment apparatus is positioned between the mask and the projection optical system, or between the projection optical system and the photosensitive substrate, or within the projection optical system, and wherein the light source illuminates a pattern on the mask, thereby forming an image of the pattern which is then subjected to an optical path adjustment by the adjustment apparatus and projected and exposed onto the photosensitive substrate.

3. The adjustment apparatus according to claim 2 , wherein the projection optical system comprises at least one Dyson optical system, the Dyson optical system comprising a right-angle reflector, a lens and a concave reflector.

4. The adjustment apparatus according to claim 3 , wherein the adjustment apparatus is disposed between adjacent ones of the at least one Dyson optical system or between the right-angle reflector and the lens in one of the at least one Dyson optical system.

5. The adjustment apparatus according to claim 1 , wherein the first wedge angle of the adjustment apparatus ranges from 0.5° to 10°.

6. The adjustment apparatus according to claim 1 , wherein each of the first radius of curvature, the second radius of curvature, the third radius of curvature and the fourth radius of curvature ranges from 200 mm to 2000 mm.

7. The adjustment apparatus according to claim 1 , wherein
the third optical lens further has a third bevel opposing the fourth curved face, the third bevel parallel to the first bevel, the third bevel having a second wedge angle; and
the adjustment apparatus further comprises a second wedge lens having a fourth bevel and the second wedge angle, the fourth bevel proximal to the third bevel and parallel to the first bevel.

8. The adjustment apparatus according to claim 7 , wherein each of the first wedge angle and the second wedge angle of the adjustment apparatus ranges from 0.5° to 10°.

9. The adjustment apparatus according to claim 7 , wherein each of the first radius of curvature, the second radius of curvature, the third radius of curvature and the fourth radius of curvature ranges from 200 mm to 2000 mm.

10. An adjustment method, comprising: placing an adjustment apparatus in an exposure device, wherein the adjustment apparatus is an optical system having an incident face and a light exit face that is parallel to the incident face and comprises a first wedge lens, a first optical lens, a second optical lens and a third optical lens, wherein the first wedge lens has a first bevel and a first wedge angle, wherein the adjustment method further comprises adjusting at least one of a focal plane, a magnification and a position of a field of view corresponding to the exposure device through changing relative positions of at least one pair of neighboring ones of lenses, and wherein the magnification is adjusted by moving one or more of the first optical lens, the second optical lens and the third optical lens along an optical axis and by moving the first wedge lens in a direction of the first bevel so that there is no focal plane change occurring during adjusting the magnification.

11. The adjustment method according to claim 10 , wherein the focal plane is adjusted by moving the first wedge lens in a direction of the first bevel.

12. The adjustment method according to claim 10 , wherein the magnification is adjusted by moving one or more of the first optical lens, the second optical lens and the third optical lens along an optical axis.

13. The adjustment method according to claim 10 , wherein the position is adjusted by translational and/or rotational adjustment of an image exposed on a photosensitive substrate through tilting the adjustment apparatus as a whole and/or rotating the first wedge lens about an optical axis.

14. The adjustment method according to claim 10 , wherein the adjustment apparatus further comprises a second wedge lens having a fourth bevel and a second wedge angle, the fourth bevel parallel to the first bevel.

15. The adjustment method according to claim 14 , wherein the focal plane is adjusted by moving the first wedge lens or the second wedge lens with respect to each other in a direction of the first bevel.

16. The adjustment method according to claim 14 , wherein the magnification is adjusted by moving one or more of the first optical lens, the second optical lens and the third optical lens along an optical axis and by moving one or more of the first wedge lens and the second wedge lens in a direction of the first bevel so that there is no focal plane change occurring during adjusting the magnification.

17. The adjustment method according to claim 14 , wherein the position is adjusted by translational and/or rotational adjustment of an image exposed on a photosensitive substrate through tilting the adjustment apparatus as a whole and/or rotating the first wedge lens and/or the second wedge lens about an exposure optical path axis.

18. An exposure device, wherein the exposure device comprises a light source, a mask, a photosensitive substrate and an adjustment apparatus, wherein the adjustment apparatus comprises:
a first wedge lens having a first bevel and a first wedge angle;
a first optical lens having a second bevel and a first curved face opposing the second bevel, the second bevel proximal and parallel to the first bevel, the second bevel having the first wedge angle, the first curved face having a first radius of curvature;
a second optical lens having a second curved face and a third curved face opposing the second curved face, the second curved face proximal to the first curved face, the second curved face having a second radius of curvature that is same as or substantially same as the first radius of curvature, the third curved face having a third radius of curvature; and
a third optical lens having a fourth curved face proximal to the third curved face, the fourth curved face having a fourth radius of curvature that is same as or substantially same as the third radius of curvat

Assignees

• Shanghai Microelectronics Equi
• Shanghai Micro Electronics Equipment Group Co Ltd

Inventors

• Sun Jinglu

Classifications

• G02B13/0015

  characterised by the lens design · CPC title

• G03F7/70641

  Focus · CPC title

• G03F7/70266

  Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction · CPC title

• G03F7/70241

  Optical aspects of refractive lens systems, i.e. comprising only refractive elements · CPC title

• G02B17/08

  Catadioptric systems {(used in non-imaging applications G02B19/00)} · CPC title