Method for manufacturing color photoresist pattern in color filter

US10197912B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10197912-B2
Application numberUS-201615358709-A
CountryUS
Kind codeB2
Filing dateNov 22, 2016
Priority dateMay 24, 2013
Publication dateFeb 5, 2019
Grant dateFeb 5, 2019

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  1. Title

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  2. Abstract

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

A method for manufacturing a color photoresist pattern in a color filter is provided. The method includes applying a layer of negative color resist onto a substrate; exposing the layer of negative color resist through a mask; and developing the exposed layer of negative color resist with a developer composition which comprises 0.01 to 5.0 parts by weight of inorganic or organic acids, 0.01 to 5.0 parts by weight of surfactant, 0.1 to 10.0 parts by weight of water-soluble organic solvent, 85 to 99 parts by weight of water, and 0 to 2 parts by weight of additives, based on 100 parts by weight of the developer composition.

First claim

Opening claim text (preview).

We claim: 1. A method for manufacturing a color photoresist pattern in a color filter, wherein said method comprising: applying a layer of negative color photoresist onto a substrate which has been provided with a black matrix; exposing the layer of negative color photoresist through a mask; and developing the exposed layer of negative color photoresist with an acidic developer composition, which comprises: based on 100 parts by weight of the acidic developer composition, inorganic acid 0.01 to 5.0 parts by weight, surfactant 0.01 to 5.0 parts by weight, water-soluble organic solvent 0.1 to 10.0 parts by weight, water 85 to 99 parts by weight, and additives 0 to 2 parts by weight. 2. The method of claim 1 , wherein the inorganic acid is one or more selected from the group consisting of hydrochloric acid, sulfuric add, nitric acid, phosphoric acid, carbonic acid and boric acid. 3. The method of claim 1 , wherein the surfactant comprises at least one selected from cationic surfactant, anionic surfactant and nonionic surfactant. 4. The method of claim 3 , wherein the surfactant comprises a cationic surfactant which is one or more selected from the group consisting of primary amine salts, secondary amine salts, tertiary amine salts, and quaternary ammonium salts. 5. The method of claim 3 , wherein the surfactant comprises an anionic surfactant which is one or more selected from the group consisting of carboxylates, sulfonates, sulfate and phosphates. 6. The method of claim 3 , wherein the surfactant comprises a nonionic surfactant which is one or more selected from the group consisting of polyols, polyethers, and alkanol amides nonionic surfactants. 7. The method of claim 6 , wherein the polyethers are polyoxyethylenes. 8. The method of claim 1 , wherein the water-soluble organic solvent is one or more selected from the group consisting of: methanol, ethanol, propanol, ethylene glycol, propylene glycol, isopropanol, N,N-dimethylformamide, N,N-dimethylacetaminde, acetone, N-methylpyrrolidone, and N-ethylpyrrolidone. 9. The method of claim 1 , wherein the water is deionized water. 10. The method of claim 1 , wherein the additives comprise at least one of defoamer and stabilizer. 11. The method of claim 1 , further comprising: before the applying a layer of negative color photoresist onto the substrate, cleaning and drying the substrate which has been provided with a black matrix. 12. The method of claim 1 , further comprising: drying in vacuum and prebaking the layer of negative color photoresist before the exposing the layer of negative color photoresist. 13. The method of claim 1 , further comprising: curing the developed photoresist by baking after the developing the exposed layer of negative color photoresist.

Assignees

Inventors

Classifications

  • Methods for their manufacture, e.g. printing, electro-deposition or photolithography · CPC title

  • Liquid compositions therefor, e.g. developers · CPC title

  • G03F7/0007Primary

    Filters, e.g. additive colour filters; Components for display devices · CPC title

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What does patent US10197912B2 cover?
A method for manufacturing a color photoresist pattern in a color filter is provided. The method includes applying a layer of negative color resist onto a substrate; exposing the layer of negative color resist through a mask; and developing the exposed layer of negative color resist with a developer composition which comprises 0.01 to 5.0 parts by weight of inorganic or organic acids, 0.01 to 5…
Who is the assignee on this patent?
Boe Technology Group Co Ltd, Beijing Boe Display Tech Co
What technology area does this patent fall under?
Primary CPC classification G03F7/0007. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Feb 05 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).