Electron-bombarded charge-coupled device and inspection systems using EBCCD detectors

Patent metadata

Field	Value
Publication number	US-10197501-B2
Application number	US-201213710315-A
Country	US
Kind code	B2
Filing date	Dec 10, 2012
Priority date	Dec 12, 2011
Publication date	Feb 5, 2019
Grant date	Feb 5, 2019

Abstract

A focusing EBCCD includes a control device positioned between a photocathode and a CCD. The control device has a plurality of holes therein, wherein the plurality of holes are formed perpendicular to a surface of the photocathode, and wherein a pattern of the plurality of holes is aligned with a pattern of pixels in the CCD. Each hole is surrounded by at least one first electrode, which is formed on a surface of the control device facing the photocathode. The control device may include a plurality of ridges between the holes. The control device may be separated from the photocathode by approximately half a shorter dimension of a CCD pixel or less. A plurality of first electrodes may be provided, wherein each first electrode surrounds a given hole and is separated from the given hole by a gap.

First claim

The invention claimed is:

1. An electron-bombarded charge-coupled device (EBCCD) comprising:
an assembly including a window;
a photocathode inside the assembly and adjacent to the window;
a CCD device inside the assembly and positioned to collect electrons emitted from the photocathode; and
a control device positioned between the photocathode and the CCD, the control device comprising a silicon wafer having a plurality of holes passing through the silicon wafer, wherein the plurality of holes are formed perpendicular to a surface of the photocathode such that minimal impact of said electrons traveling perpendicularly to the CCD occurs on sidewalls of said plurality of holes, and wherein a pattern of the plurality of holes is aligned with a pattern of pixels in the CCD such that each said hole of the plurality of holes is aligned with only one corresponding pixel of the pattern of pixels, whereby most electrons passing through said each hole of the plurality of holes land on said corresponding pixel of said pattern of pixels, each hole being surrounded by at least one first electrode formed on a surface of the silicon wafer facing the photocathode.

2. The EBCCD of claim 1 , wherein the CCD has a boron coating on its surface facing the at least one first electrode.

3. The EBCCD of claim 1 , wherein the CCD comprises a back-thinned CCD.

4. The EBCCD of claim 1 , wherein the CCD comprises a time-delay integration CCD.

5. The EBCCD of claim 1 , wherein an exterior surface of the window includes an anti-reflective coating.

6. The EBCCD of claim 1 , wherein the control device further comprises a plurality of ridges between the plurality of holes.

7. The EBCCD of claim 1 , wherein the control device is positioned to be separated from the photocathode by approximately half a shorter dimension of a CCD pixel or less.

8. The EBCCD of claim 1 , wherein the at least one first electrode includes a plurality of first electrodes, each first electrode surrounding a given hole and separated from the given hole by a gap.

9. The EBCCD of claim 1 , wherein the at least one first electrode includes a plurality of ring electrodes and one surface electrode, each of the plurality of ring electrodes separated from a given hole by a first gap, and separated from the surface electrode by a second gap.

10. The EBCCD of claim 8 , further including at least one second electrode surrounding the holes of the control device and positioned on a surface of the control device facing the CCD.

11. A method of operating an electron-bombarded charge-coupled device (EBCCD), the method comprising:
holding a photocathode of the EBCCD at a negative voltage relative to a CCD of the EBCCD; and
focusing electrons traveling from the photocathode towards pixels of the CCD by causing the electrons to pass through a plurality of holes defined in a control device disposed between the photocathode and the CCD, wherein the plurality of holes are formed perpendicular to a surface of the photocathode such that minimal impact of said electrons traveling perpendicularly to the CCD occurs on sidewalls of said plurality of holes,
wherein the control device comprises a silicon wafer processed using photolithography such that the plurality of holes are etched therethrough and arranged in a pattern corresponding to a plurality of pixels on the CCD, and
wherein focusing electrons further comprises aligning each hole of the plurality of holes of the control device with only one corresponding pixel of the plurality of pixels on the CCD such that most electrons passing through said each hole land on said corresponding pixel.

12. The method of claim 11 , further including holding inside surfaces of the holes of the control device at a positive voltage relative to the photocathode.

13. The method of claim 12 , further including holding a first electrode surrounding at least one hole at a different voltage than the inside surfaces of the holes, the first electrode positioned on a surface of the control device facing the photocathode.

14. The method of claim 13 , wherein the first electrode is held at a negative voltage relative to the inside surfaces of the holes.

15. The method of claim 14 , further including holding a second electrode at a different potential from the first electrode, the second electrode surrounding at least one hole of the control device and positioned to face the CCD.

16. The method of claim 12 , further including holding some regions of a surface of the control device closest to the photocathode at a potential similar to that of the photocathode or slightly negative relative to the photocathode.

17. A dark-field inspection system comprising:
optics for directing light to a sample being inspected;
optics for collecting scattered light from the sample and directing collected light; and
an electron-bombarded charge-coupled device (EBCCD) detector for receiving the collected light, the EBCCD detector comprising:
an assembly including a window;
a photocathode inside the assembly and adjacent to the window;
a CCD device inside the assembly and positioned to collect electrons emitted from the photocathode; and
a control device positioned between the photocathode and the CCD, the control device comprising a silicon wafer having a plurality of holes passing through the silicon wafer, wherein the plurality of through holes are formed perpendicular to a surface of the photocathode such that minimal impact of said electrons traveling perpendicularly to the CCD occurs on sidewalls of said plurality of holes, and wherein a pattern of the plurality of through holes is aligned with a pattern of pixels in the CCD such that each said through hole of the plurality of through holes is aligned with only one corresponding pixel of the pattern of pixels, whereby most electrons passing through each said through hole of the plurality of through holes land on said corresponding pixel of said pattern of pixels, each hole being surrounded by at least one first electrode formed on a surface of the silicon wafer facing the photocathode.

18. The dark-field inspection system of claim 17 , wherein the CCD is a time-delay integration CCD.

19. The dark-field inspection system of claim 18 , wherein the time-delay integration CCD comprises multiple readout registers are readable in parallel.

20. A method of inspecting a semiconductor wafer, the method comprising:
illuminating a region of the wafer with light;
collecting scattered light from the wafer; and
directing collected light to an electron-bombarded charge-coupled device (EBCCD) detector, wherein the EBCCD detector performs a process comprising:
holding a photocathode of the EBCCD at a negative voltage relative to a CCD of the EBCCD, said CCD including a plurality of pixels arranged in a pattern; and
focusing electrons traveling from the photocathode towards pixels of the CCD by causing the electrons to pass through a plurality of holes defined in a control device disposed between the photocathode and the CCD such that minimal impact of said electrons traveling perpendicularly to the CCD occurs on sidewalls of said plurality of holes, wherein the control device comprises a silicon wafer processed using photolithography such that the plurality of holes are etched therethrough and arranged in the pattern of the plurality of pixels, and wherein the control device is positioned such that each said hole of the plurality of holes is aligned with only one corresponding pixel of the pattern of pixels, whereby most electrons passing through

Assignees

• Kla Tencor Corp

Inventors

• Chuang Yung-Ho Alex
• Liu Xuefeng
• Fielden John
• Brown David L

Classifications

• G01N21/88 Primary

  Investigating the presence of flaws or contamination · CPC title

• H01L27/14806

  Electricity · mapped topic

• H01L27/14856

  Electricity · mapped topic

• G01N2021/95676

  Masks, reticles, shadow masks · CPC title

• G01N21/9501 Primary

  Semiconductor wafers (manufacturing processes per se of semiconductor devices implementing a measuring step H10P74/20) · CPC title