Superconducting three-terminal device and logic gates
US-9509315-B2 · Nov 29, 2016 · US
US10197440B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10197440-B2 |
| Application number | US-201816012520-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 19, 2018 |
| Priority date | Jun 15, 2017 |
| Publication date | Feb 5, 2019 |
| Grant date | Feb 5, 2019 |
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The various embodiments described herein include methods, devices, and systems for fabricating and operating niobium-germanium-based superconducting devices. In one aspect, a device includes a superconducting nanowire composed of niobium-germanium, a protective layer configured to inhibit oxidation of the superconducting nanowire, and a current source configured to supply a current to the superconducting nanowire. In another aspect, a method of fabrication includes: (1) depositing a layer of niobium-germanium on a substrate; (2) removing one or more portions of the layer of niobium-germanium to define one or more nanowires; and (3) depositing a protective layer over the one or more nanowires, the protective layer adapted to inhibit oxidation of niobium-germanium in the one or more nanowires.
Opening claim text (preview).
What is claimed is: 1. A photodetector device, comprising: a superconducting nanowire composed of niobium-germanium; a protective layer configured to inhibit oxidation of the superconducting nanowire; and a current source configured to supply a current to the superconducting nanowire. 2. The device of claim 1 , wherein the superconducting nanowire is adapted to operate in a superconducting state at temperatures between 3 Kelvin and 20 Kelvin. 3. The device of claim 1 , wherein at least a portion of the superconducting nanowire consists essentially of the niobium-germanium. 4. The device of claim 1 , wherein the niobium-germanium includes niobium and germanium in a ratio between 3:1 and 3.5:1. 5. The device of claim 1 , further comprising a layer of aluminum nitride located over the superconducting nanowire. 6. The device of claim 1 , wherein the protective layer encapsulates at least a portion of the niobium-germanium in the superconducting nanowire. 7. The device of claim 6 , further comprising a layer of aluminum nitride located over the superconducting nanowire, wherein the protective layer encapsulates at least a portion of the layer of aluminum nitride and at least the portion of the niobium-germanium in the superconducting nanowire. 8. The device of claim 1 , wherein the superconducting nanowire has a width between 10 nm and 50 nm. 9. The device of claim 1 , wherein the superconducting nanowire has a thickness between 2 nm and 10 nm. 10. The device of claim 1 , wherein the current is adapted to be less than a threshold superconducting current of the superconducting nanowire. 11. The device of claim 10 , further comprising a second circuit coupled to the superconducting nanowire; and wherein the photodetector device is configured to, in response to receiving light of first intensity at the superconducting nanowire, transition the superconducting nanowire from a superconducting state to a non-superconducting state, thereby redirecting at least a portion of the current toward the second circuit. 12. The device of claim 11 , wherein the superconducting nanowire is configured to operate in the superconducting state prior to receiving the light of first intensity. 13. A method, comprising: depositing a layer of niobium-germanium on a substrate; removing one or more portions of the layer of niobium-germanium to define one or more nanowires; and depositing a protective layer over the one or more nanowires, the protective layer adapted to inhibit oxidation of niobium-germanium in the one or more nanowires. 14. The method of claim 13 , wherein the layer of niobium-germanium is deposited via physical vapor deposition. 15. The method of claim 13 , wherein the layer of niobium-germanium is deposited via sputtering. 16. The method of claim 13 , further comprising depositing a layer of aluminum nitride over the layer of niobium-germanium prior to depositing the protective layer. 17. The method of claim 16 , wherein: the layer of aluminum nitride is deposited over the layer of niobium-germanium prior to removing the one or more portions of the layer of niobium-germanium; and removing the one or more portions of the layer of niobium-germanium includes removing corresponding one or more portions of the layer of aluminum nitride. 18. The method of claim 16 , further comprising annealing the layer of niobium-germanium and the layer of aluminum nitride. 19. The method of claim 13 , wherein the depositing the layer of niobium-germanium, the removing of the one or more portions, and the depositing of the protective layer are performed within a same vacuum state. 20. The method of claim 13 , further comprising: forming a first circuit connected to a first end of a respective nanowire of the one or more nanowires and configured to supply a first current to the respective nanowire, wherein the first current is less than a first maximum superconducting current of the respective nanowire; and forming a second circuit connected to the first end of the respective nanowire, the second circuit configured to detect a current flowing through the second circuit. 21. The method of claim 13 , wherein the wherein the layer of niobium-germanium is deposited at a temperature of less than 400 degrees Celsius.
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