Method for operating a supply device which supplies a liquid to a channel, and supply device, hollow catheter, and catheter pump

US10195323B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10195323-B2
Application numberUS-201415029092-A
CountryUS
Kind codeB2
Filing dateOct 9, 2014
Priority dateOct 14, 2013
Publication dateFeb 5, 2019
Grant dateFeb 5, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention relates to a supply device for a channel ( 8 ), in particular within a hollow catheter ( 1 ), and to a method for operating a supply device of this type that supplies a channel ( 8 ) with a liquid and has two pumps ( 10, 19 ) arranged at points of the channel distanced from one another, characterized in that the parameter values of at least one operating parameter of both pumps are coordinated with one another in a controlled manner. As a result of the method, interruption-free and precisely controllable operation is to be ensured with simple structural means, in particular in the case of use of wear-free diaphragm pumps.

First claim

Opening claim text (preview).

The invention claimed is: 1. A hollow catheter comprising: a channel; a supply device for supplying the channel with a liquid, wherein the supply device comprises: a diaphragm pump; and a control device, which controls the diaphragm pump in respect of a generated pressure and/or a delivery rate, wherein a sensor is assigned to the diaphragm pump, said sensor being a liquid pressure sensor, an electric sensor for detecting the power consumption of the diaphragm pump, or a flow rate sensor; and a rotatable, flexible shaft arranged within the hollow catheter, wherein the sensor causes the control device to adapt the generated pressure and/or delivery rate of the pump as compensation for movement of liquid along the channel caused by rotation of the shaft. 2. The hollow catheter of claim 1 , configured to lubricate the shaft with the liquid. 3. The hollow catheter of claim 1 , wherein the sensor is an electric sensor for detecting a current consumption of the diaphragm pump. 4. The hollow catheter of claim 1 , comprising one or more further diaphragm pumps, wherein: said diaphragm pump and said one or more further diaphragm pumps are arranged at points of the channel distanced from one another; the control device is configured to control each of the diaphragm pump and the one or more further diaphragm pumps individually in respect of the generated pressure and/or the delivery rate; a sensor is assigned to each of one or more further diaphragm pumps; wherein, each of the sensors assigned to the one or more further diaphragm pumps is one of a liquid pressure sensor, an electric sensor for detecting the power consumption of said one or further diaphragm pumps, and a flow rate sensor. 5. A catheter pump containing a hollow catheter according to claim 1 . 6. The catheter pump of claim 5 , configured for intraventricular operation within a heart.

Assignees

Inventors

Classifications

  • Measuring or controlling the flow rate · CPC title

  • having tubular flexible members (F04B43/12 takes precedence) · CPC title

  • Pressure infusion, e.g. using pumps · CPC title

  • F04B43/04Primary

    Pumps having electric drive · CPC title

  • F04B43/02Primary

    having plate-like flexible members, e.g. diaphragms (F04B43/14 takes precedence) · CPC title

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Frequently asked questions

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What does patent US10195323B2 cover?
The present invention relates to a supply device for a channel ( 8 ), in particular within a hollow catheter ( 1 ), and to a method for operating a supply device of this type that supplies a channel ( 8 ) with a liquid and has two pumps ( 10, 19 ) arranged at points of the channel distanced from one another, characterized in that the parameter values of at least one operating parameter of both …
Who is the assignee on this patent?
Ecp Entw Mbh
What technology area does this patent fall under?
Primary CPC classification F04B43/04. Mapped technology areas include Mechanical Engineering.
When was this patent published?
Publication date Tue Feb 05 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).