Self-assembly of perovskite for fabrication of transparent devices

US10192689B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10192689-B2
Application numberUS-201615541726-A
CountryUS
Kind codeB2
Filing dateJan 7, 2016
Priority dateJan 7, 2015
Publication dateJan 29, 2019
Grant dateJan 29, 2019

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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Provided is a continuous material pattern, the pattern is selected to have a plurality of material-free voids, the material including at least one perovskite material.

First claim

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The invention claimed is: 1. A patterned perovskite material, comprising a plurality of continuous intersecting perovskite line patterns, defining confined regions enclosed by walls of said intersecting line patterns, wherein the confined regions are perovskite-free voids. 2. The patterned material according to claim 1 , the pattern comprising of a continuous perovskite pattern, the pattern being defined by a plurality of intersecting wire-like element(s), said element(s) defining confined regions enclosed by walls of said intersecting wire-like elements, wherein said wire-like elements are of at least one perovskite material. 3. The patterned material according to claim 1 , wherein the pattern is a continuous network or grid (mesh). 4. The patterned material according to claim 3 , wherein material coverage is less than 70% or wherein the pattern is semi-transparent or transparent or wherein the pattern is conductive. 5. The patterned material according to claim 1 , wherein the perovskite material is characterized by the structural motif AMX 3 , having a three-dimensional network of corner-sharing MX 6 octahedra, wherein M is a metal cation that may adopt an octahedral coordination of the X anions, and wherein A is a cation situated in 12-fold coordinated holes between the MX 6 octahedra. 6. The patterned material according to claim 5 , wherein the perovskite material is of the formula AMX 3 or AMX 4 or A 2 MX 4 or A 3 MX 5 or A 2 A′MX 5 or AMX 3-n X′ n , wherein A and A′ are independently selected from organic cations, metal cations and any combination of such cations; M is a metal cation or any combination of metal cations; X and X′ are independently selected from anions and any combination of anions; and n is between 0 to 3. 7. The patterned material according to claim 1 , wherein the perovskite material is an organic-inorganic perovskite structure. 8. The patterned material according to claim 7 , wherein the organic-inorganic perovskite structure is selected from the group consisting of (R—NH 3 ) 2 MX 4 and (NH—R—NH)MX; wherein X may be Cl −1 , Br −1 , or I −1 . 9. The patterned material according to claim 8 , wherein the perovskite material comprises or is selected from CH 3 NH 3 PbF 3 , CH 3 NH 3 PbCl 3 , CH 3 NH 3 PbI 3 , CH 3 NH 3 PbBr 3 , CH 3 NH 3 PbBrI 2 , CH 3 NH 3 PbBrCl 2 , CH 3 NH 3 PbIBr 2 , CH 3 NH 3 PbICl 2 , CH 3 NH 3 PbClBr 2 and CH 3 NH 3 PbI 2 Cl. 10. The patterned material according to claim 9 , wherein the perovskite material comprises or is selected from the group consisting of CH 3 NH 3 SnICl 2 , CH 3 NH 3 SnBrI 2 , CH 3 NH 3 SnBrCl 2 , CH 3 NH 3 SnF 2 Br, CH 3 NH 3 SnIBr 2 , CH 3 NH 3 SnF 2 I, CH 3 NH 3 SnClBr 2 , CH 3 NH 3 SnI 2 Cl and CH 3 NH 3 SnF 2 Cl. 11. The patterned material according to claim 9 , wherein the perovskite material comprises or is selected from the group consisting of CH 3 NH 3 PbF 3 , CH 3 NH 3 PbCl 3 , CH 3 NH 3 PbI 3 and CH 3 NH 3 PbBr 3 . 12. The patterned material according to claim 11 , wherein the perovskite material is CH 3 NH 3 PbI 3 . 13. The patterned material according to claim 1 , wherein the perovskite material is of the formula (NH 2 ═CH—NH 2 ) MX 3 . 14. The patterned material according to claim 13 , wherein the perovskite material comprises or is selected from the group consisting of (NH 2 ═CH—NH 2 )PbBr 3 , (NH 2 ═CH—NH 2 )PbI 3 , (NH 2 ═CH—NH 2 )PbCl 3 , (NH 2 ═CH—NH 2 )PbFCl 2 , (NH 2 ═CH—NH 2 )PbBrCl 2 , (NH 2 ═CH—NH 2 )PbICl 2 , (NH 2 ═CH—NH 2 )PbFCl 2 , (NH 2 ═CH—NH 2 )PbFBr 2 , (NH 2 ═CH—NH 2 )PbFI 2 and (NH 2 ═CH—NH 2 )PbIBr 2 . 15. A process for producing a continuous perovskite pattern, the process comprising: providing a substrate, the substrate having on at least one region thereof a patterning device defined by a plurality of intersecting wire-like element(s), said element(s) defining confined regions (material-free voids) enclosed by walls of said intersecting wire-like elements (a mesh); placing a solution of a perovskite material or a solution of perovskite precursors in at least one confined region on said substrate; allowing migration of the perovskite material or perovskite precursors to the walls of said confined region (voids) to form a pattern having substantially the contour of said confined region; and optionally annealing said pattern. 16. An element comprising a substrate, at least one continuous perovskite pattern according to claim 1 , at least one conductive layer, and optionally at least one additional layer selected from a scaffold structure layer, at least one hole conductive layer, and at least one additional layer. 17. An element comprising a substrate, a scaffold structure layer, at least one continuous perovskite pattern according to claim 1 , at least one conductive layer, and optionally at least one additional layer, wherein said element is devoid of a hole conductive layer. 18. An element comprising a substrate, a scaffold structure layer, at least one continuous perovskite pattern according to claim 1 , a conductive layer, optionally at least one hole conductive layer, and optionally at least one additional layer, wherein the element is semi-transparent or transparent. 19. A device comprising a perovskite pattern according to claim 1 .

Assignees

Inventors

Classifications

  • Electricity · mapped topic

  • Solid electrolytes · CPC title

  • Electricity · mapped topic

  • Electricity · mapped topic

  • H01G9/2045Primary

    comprising a semiconductor electrode comprising elements of the fourth group of the Periodic Table with or without impurities, e.g. doping materials · CPC title

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What does patent US10192689B2 cover?
Provided is a continuous material pattern, the pattern is selected to have a plurality of material-free voids, the material including at least one perovskite material.
Who is the assignee on this patent?
Yissum Res Dev Co Of Hebrew Univ Jerusalem Ltd, Yissum Res Dev Co Of Hebrew Univ Jerusalem Ltd
What technology area does this patent fall under?
Primary CPC classification H01G9/2045. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jan 29 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).