Resist composition, method of forming resist pattern and compound
US-9063416-B2 · Jun 23, 2015 · US
Resist composition, method of forming resist pattern, compound, and acid diffusion control agent
US10180625B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10180625-B2 |
| Application number | US-201715634941-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 27, 2017 |
| Priority date | Oct 6, 2015 |
| Publication date | Jan 15, 2019 |
| Grant date | Jan 15, 2019 |
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- Title
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Abstract
Official abstract text for this publication.
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a compound (D1) represented by general formula (d1), wherein Z − represents an anion having an aromatic ring containing a hydroxybenzoic acid skeleton, provided that at least one hydrogen atom of the aromatic ring has been substituted with a halogen atom; m represents an integer of 1 or more; and M m+ represents an organic cation having a valency of m. Z − (M m+ ) 1,m (d1)
First claim
Opening claim text (preview).
What is claimed is: 1. A compound represented by general formula (d1-10) shown below: wherein R 201 to R 203 each independently represents an aryl group or an alkenyl group, provided that two of R 201 to R 203 may be mutually bonded to form a ring with the sulfur atom; Rh represents a fluorine atom; and d0 represents an integer of 1 to 4. 2. An acid diffusion control agent comprising a compound of claim 1 .
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the macromolecular compound being present in a chemically amplified negative photoresist composition · CPC title
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- What does patent US10180625B2 cover?
- A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a compound (D1) represented by general formula (d1), wherein Z − represents an anion having an aromatic ring containing a …
- Who is the assignee on this patent?
- Tokyo Ohka Kogyo Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification G03F7/0045. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Jan 15 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).