Electroplating bath and method for producing dark chromium layers

Patent metadata

Field	Value
Publication number	US-10174432-B2
Application number	US-201514945027-A
Country	US
Kind code	B2
Filing date	Nov 18, 2015
Priority date	May 3, 2011
Publication date	Jan 8, 2019
Grant date	Jan 8, 2019

Abstract

The invention relates to methods and plating baths for electrodepositing a dark chromium layer on a workpiece. The trivalent chromium electroplating baths comprise sulphur compounds and the methods for electrodepositing a dark chromium layer employ these trivalent chromium electroplating baths. The dark chromium deposits and workpieces carrying dark chromium deposits are suited for application for decorative purposes.

First claim

The invention claimed is:

1. An electroplating bath for deposition of a dark chromium layer on a workpiece, the electroplating bath comprising:
(A) trivalent chromium ions;
(B) carboxylate ions;
(C) at least one pH buffer substance; and
(D) a mixture of coloring agents, comprising at least one coloring agent having the general Formula (I) and at least one coloring agent having the general Formula (II);
wherein general Formula (I) is defined as:

wherein
n, p, q are independently of each other integers from 0 to 4;
R 1 represents —H, —OH, —COOH, —CO—OCH 3 , —CO—OCH 2 —CH 3 , (—O—CH 2 —CH 2 —) m —OH, —CH(—NH 2 )—COOH, —CH(—NH—CH 3 )—COOH, —CH(—N(—CH 3 ) 2 )—COOH, —CH(—NH 2 )—CO—OCH 3 , —CH(—NH 2 )—CO—OCH 2 —CH 3 , —CH(—NH 2 )—CH 2 —OH, —CH(—NH—CH 3 )—CH 2 —OH, —CH(—N(—CH 3 ) 2 )—CH 2 —OH, or —SO 3 H;
m represents an integer from 5 to 15;
R 2 represents —OH, —(CH 2 —) p —C(—NH 2 )═NH, CH 2 —CH 2 —(—O—CH 2 —CH 2 —) m —OH, —R 5 , —(CH 2 —) q —CO—OCH 3 , —(CH 2 —) q —CO—OCH 2 —CH 3 , —(CH 2 —) q —S—(CH 2 —) 2 —OH, —CS—CH 3 , —CS—CH 2 —CH 3 , —CS—CH 2 —CH 2 —CH 3 ,

or
R 1 and R 2 together represent a linear chain structure in order to build one of the following ring structures including the central sulphur atom of Formula (I):

R 5 represents —CH 2 —CH 3 , —CH 2 —CH 2 —CH 3 , or —CH 2 —CH 2 —CH 2 —CH 3 ;
R 6 , R 7 , R 8 , R 9 represent independently of each other —H, —NH 2 , —SH, —OH, CH 3 , —CH 2 —CH 3 , —COOH, or —SO 3 H;
or salts, tautomeric forms, betaine structures thereof,
and wherein general Formula (II) is defined as:

wherein
═X represents ═O, or a free electron pair;
R 3 represents —R 5 , —CH═CH 2 , —CH 2 —CH═CH 2 , —CH═CH—CH 3 , CH 2 —CH 2 —CH═CH 2 , —CH 2 —CH═CH—CH 3 , —CH═CH—CH 2 —CH 3 , —C≡CH, —CH 2 —C≡CH, —C≡C—CH 3 , —CH 2 —CH 2 —C≡CH, —CH 2 —C≡C—CH 3 , —C≡C—CH 2 —CH 3 , —C(—NH 2 )═NH,

R 4 represents —R 5 , —OR 5 , —(CH 2 —) r —CH(—NH 2 )—COOH, —(CH 2 —) r —CH(—NH—CH 3 )—COOH, —(CH 2 —) r —CH(—N(—CH 3 ) 2 )—COOH, —(CH 2 —) r —CH(—NH 2 )—CO—OCH 3 , or —(CH 2 —) r —CH(—NH 2 )—CO—OCH 2 —CH 3 ;
r is an integer from 0 to 4;
R 3 and R 4 together represent a linear chain structure in order to build one of the following ring structures including the central sulphur atom of Formula (II):

R 10 represents —H, —CH 3 , —CH 2 —CH 3 , —CH 2 —CH 2 —SO 3 H;
or salts, tautomeric forms, betaine structures thereof,
wherein the electroplating bath is free of chloride ions; and
wherein in the mixture of coloring agents, the coloring agent of Formula (I) comprises 3-carbamimidoylsulfanyl-propionic acid, or salts, tautomeric forms, betaine structures thereof.

2. The electroplating bath according to claim 1 , further comprising ferrous ions.

3. The electroplating bath according to claim 2 , wherein the concentration of the ferrous ions ranges from 40 mg/L to 280 mg/L.

4. The electroplating bath according to claim 1 , wherein the concentration of each coloring agent according to general Formulae (I) and (II) ranges from 0.01 g/L to 100 g/L.

5. The electroplating bath according to claim 1 , wherein in the mixture of coloring agents, the coloring agent of Formula (I) is 3-carbamimidoylsulfanyl-propionic acid or salts, tautomeric forms, betaine structures thereof.

6. A method for electrodepositing a dark chromium layer on a workpiece which comprises electroplating said workpiece with the electroplating bath as defined in claim 1 .

7. An electroplating bath for deposition of a dark chromium layer on a workpiece, the electroplating bath comprising:
(A) trivalent chromium ions;
(B) carboxylate ions;
(C) at least one pH buffer substance; and
(D) 3-carbamimidoylsulfanyl-propionic acid or salts, tautomeric forms, betaine structures thereof, and
wherein the electroplating bath is free of chloride ions.

8. An electroplating bath for deposition of a dark chromium layer on a workpiece, the electroplating bath comprising:
(A) trivalent chromium ions;
(B) carboxylate ions;
(C) at least one pH buffer substance; and
(D) a mixture of coloring agents, comprising 3-carbamimidoylsulfanyl-propionic acid or salts, tautomeric forms, betaine structures thereof, and further comprising at least one coloring agent having the general Formula (I) or at least one coloring agent having the general Formula (II);
wherein general Formula (I) is defined as:

wherein
n, p, q are independently of each other integers from 0 to 4;
R 1 represents —H, —OH, —COOH, —CO—OCH 3 , —CO—OCH 2 —CH 3 , -(—O—CH 2 —CH 2 —) m —OH, —CH(—NH 2 )—COOH, —CH(—NH—CH 3 )—COOH, —CH(—N(—CH 3 ) 2 )—COOH, —CH(—NH 2 )—CO—OCH 3 , —CH(—NH 2 )—CO—OCH 2 —CH 3 , —CH(—NH 2 )—CH 2 —OH, —CH(—NH—CH 3 )—CH 2 —OH, —CH(—N(—CH 3 ) 2 )—CH 2 —OH, or —SO 3 H;
m represents an integer from 5 to 15;
R 2 represents —H, —OH, —(CH 2 —) p —OH, —(CH 2 —) p —C(—NH 2 )═NH, —CH 2 —CH 2 -(—O—CH 2 —CH 2 —) m —OH, —R 5 , —(CH 2 —) q —COOH, —(CH 2 —) q —CO—OCH 3 , —(CH 2 —) q —CO—OCH 2 —CH 3 , —(CH 2 —) q —S—(CH 2 —) 2 —OH, —CS—CH 3 , —CS—CH 2 —CH 3 , —CS—CH 2 —CH 2 —CH 3 ,

or
R 1 and R 2 together represent a linear chain structure in order to build one of the following ring structures including the central sulphur atom of Formula (I)

R 5 represents —H, —CH 3 , —CH 2 —CH 3 , —CH 2 —CH 2 —CH 3 , or CH 2 —CH 2 —CH 2 —CH 3 ;
R 6 , R 7 , R 8 , R 9 represent independently of each other —H, —NH 2 , —SH, —OH, CH 3 , —CH 2 —CH 3 , —COOH, or —SO 3 H;
or salts, tautomeric forms, betaine structures thereof,
and wherein general Formula (II) is defined as:

wherein
═X represents ═O, or a free electron pair;

R 3 represents —R 5 , —CH═CH 2 , —CH 2 —CH═CH 2 , —CH═CH—CH 3 , CH 2 —CH 2 —CH═CH 2 , —CH 2 —CH═CH—CH 3 , —CH═CH—CH 2 —CH 3 , —C≡CH, —CH 2 —C≡CH, —C═C—CH 3 , —CH 2 —CH 2 —C≡CH, CH 2 —C≡C—CH 3 , —C≡C—CH 2 —CH 3 , —C(—NH 2 )═NH,

R 4 represents —R 5 , —OR 5 , —(CH 2 —) r —CH(—NH 2 )—COOH, —(CH 2 —) r —CH(—NH—CH 3 )—COOH, —(CH 2 —) r —CH(—N(—CH 3 ) 2 )—COOH, —(CH 2 —) r —CH(—NH 2 )—CO—OCH 3 , or —(CH 2 —) r —CH(—NH 2 )—CO—OCH 2 —CH 3 ;
r is an integer from 0 to 4;
R 3 and R 4 together represent a linear chain structure in order to build one of the following ring structures including the central sulphur atom of Formula (II)

R 10 represents —H, —CH 3 , —CH 2 —CH 3 , —CH 2 —CH 2 —SO 3 H;
or salts, tautomeric forms, bet

Assignees

• Atotech Deutschland Gmbh

Inventors

• Schulz Klaus-Dieter
• Wachter Philipp
• Hartmann Philip

Classifications

• C25D3/06 Primary

  from solutions of trivalent chromium · CPC title

• C25D3/08

  Deposition of black chromium {, e.g. hexavalent chromium, CrVI} · CPC title

• C25D3/10 Primary

  characterised by the organic bath constituents used · CPC title