Cyanic acid ester compound and method for producing same, resin composition, and cured product

US10174149B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10174149-B2
Application numberUS-201515519306-A
CountryUS
Kind codeB2
Filing dateNov 24, 2015
Priority dateDec 18, 2014
Publication dateJan 8, 2019
Grant dateJan 8, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention provides a cyanic acid ester compound having a structure represented by the following general formula (1): wherein n represents an integer of 1 or larger.

First claim

Opening claim text (preview).

The invention claimed is: 1. A resin composition comprising a cyanic acid ester compound (A) and 2,2-bis(4-cyanatophenyl)propane, the cyanic acid ester compound (A) having a structure represented by the following formula (1): wherein n represents an integer of 1 or larger. 2. The resin composition according to claim 1 , wherein the cyanic acid ester compound has a weight-average molecular weight Mw of 100 to 5000. 3. The resin composition according to claim 1 , further comprising one or more components selected from the group consisting of a maleimide compound (C), a phenol resin (D), an epoxy resin (E), an oxetane resin (F), a benzoxazine compound (G), and a compound (H) having a polymerizable unsaturated group. 4. The resin composition according to claim 3 , comprising an epoxy resin (E), wherein the epoxy resin (E) comprises one or more resins selected from the group consisting of a biphenyl aralkyl-based epoxy resin, a naphthylene ether-based epoxy resin, a polyfunctional phenol-based epoxy resin, and a naphthalene-based epoxy resin. 5. The resin composition according to claim 1 , wherein a content of the cyanic acid ester compound (A) is 1 to 90 parts by mass with respect to 100 parts by mass of resin solids in the resin composition. 6. The resin composition according to claim 1 , further comprising a filler (I). 7. The resin composition according to claim 6 , wherein a content of the filler (I) is 50 to 1600 parts by mass with respect to 100 parts by mass of resin solids in the resin composition. 8. A cured product obtained by curing the resin composition according to claim 1 . 9. A prepreg comprising a base material, and the resin composition according to claim 1 with which the base material is impregnated or coated. 10. A metal foil-clad laminate comprising one or more layers of the prepreg according to claim 9 , and a metal foil disposed on one side or both sides of the prepreg. 11. A resin sheet comprising a support, and a layer comprising the resin composition according to claim 1 disposed on a surface of the support. 12. A printed circuit board comprising an insulating layer comprising the resin composition according to claim 1 , and a conductor layer disposed on a surface of the insulating layer. 13. A material for encapsulation comprising the resin composition according to claim 1 . 14. A fiber-reinforced composite material comprising the resin composition according to claim 1 . 15. An adhesive comprising the resin composition according to claim 1 .

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Classifications

  • Polyxylylenes · CPC title

  • organic · CPC title

  • using interposed adhesives or interposed materials with bonding properties · CPC title

  • Macromolecular additives · CPC title

  • Condensation polymers of aldehydes or ketones with monomers covered by at least two of the groups C09J161/04, C09J161/18 and C09J161/20 · CPC title

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Frequently asked questions

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What does patent US10174149B2 cover?
The present invention provides a cyanic acid ester compound having a structure represented by the following general formula (1): wherein n represents an integer of 1 or larger.
Who is the assignee on this patent?
Mitsubishi Gas Chemical Co
What technology area does this patent fall under?
Primary CPC classification C08G61/02. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 08 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).