Qubits by selective laser-modulated deposition

US10170680B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10170680-B2
Application numberUS-201514856274-A
CountryUS
Kind codeB2
Filing dateSep 16, 2015
Priority dateSep 16, 2015
Publication dateJan 1, 2019
Grant dateJan 1, 2019

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  1. Title

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  2. Abstract

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Abstract

Official abstract text for this publication.

A method for adjusting a qubit includes measuring a qubit characteristic of a qubit device and computing a modification to correct the qubit characteristic. A geometry of a shunt capacitor is adjusted using a laser direct write process. The qubit characteristic is verified.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for adjusting a qubit, comprising: measuring a qubit characteristic of a qubit device; computing a modification to correct the qubit characteristic; adjusting a geometry of a shunt capacitor using a laser direct write process; and verifying that the qubit characteristic has been corrected by the adjusting of the geometry. 2. The method as recited in claim 1 , further comprising, repeating the steps until the qubit characteristic has been corrected. 3. The method as recited in claim 1 , wherein adjusting the geometry includes adding material to the shunt capacitor. 4. The method as recited in claim 3 , wherein adding material to the shunt capacitor includes employing an argon laser with aluminum methylamine hydride to deposit aluminum on the shunt capacitor. 5. The method as recited in claim 1 , wherein adjusting the geometry includes removing material from the shunt capacitor. 6. The method as recited in claim 1 , wherein adjusting the geometry includes modifying material of the shunt capacitor. 7. The method as recited in claim 6 , wherein modifying material of the shunt capacitor includes oxidizing or nitriding the material of the shunt capacitor. 8. The method as recited in claim 1 , wherein the qubit device includes a Josephson junction. 9. The method as recited in claim 1 , wherein adjusting the geometry includes forming a correction pattern at a position of minimum electric field participation so that reduction of qubit device coherence is minimized. 10. A method for adjusting a qubit, comprising: fabricating a qubit device, wherein the qubit device includes a Josephson junction; measuring a qubit characteristic of a qubit device; computing a modification to correct the qubit characteristic to achieve a needed performance for the qubit device; adjusting a geometry of a shunt capacitor, post production, using a laser direct write process; verifying that the qubit characteristic has been changed by the adjusting of the geometry; and repeating until the qubit characteristic has been corrected. 11. The method as recited in claim 10 , wherein adjusting the geometry includes adding material to the shunt capacitor. 12. The method as recited in claim 11 , wherein adding material to the shunt capacitor includes employing an argon laser with aluminum methylamine hydride to deposit aluminum on the shunt capacitor. 13. The method as recited in claim 10 , wherein adjusting the geometry includes removing material from the shunt capacitor. 14. The method as recited in claim 10 , wherein adjusting the geometry includes modifying material of the shunt capacitor. 15. The method as recited in claim 14 , wherein modifying material of the shunt capacitor includes oxidizing or nitriding the material of the shunt capacitor. 16. The method as recited in claim 10 , wherein adjusting the geometry includes forming a correction pattern at a position of minimum electric field participation so that reduction of qubit device coherence is minimized. 17. A qubit device, comprising: a Josephson junction; and a shunt capacitor coupled to the Josephson junction, the shunt capacitor including a shape modified, post-production, to adjust a qubit characteristic for the qubit device. 18. The qubit device as recited in claim 17 , wherein the shape modified includes material added to or subtracted from the shunt capacitor using a laser. 19. The qubit device as recited in claim 17 , wherein the shape modified includes modified material of the shunt capacitor. 20. The qubit device as recited in claim 17 , wherein the shape modified includes a correction pattern at a position of minimum electric field participation so that reduction of qubit device coherence is minimized.

Assignees

Inventors

Classifications

  • Physics · mapped topic

  • Electricity · mapped topic

  • H01L39/24Primary

    Electricity · mapped topic

  • Single electron transistors; Coulomb blockade transistors · CPC title

  • Physical realisations or architectures of quantum processors or components for manipulating qubits, e.g. qubit coupling or qubit control · CPC title

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Frequently asked questions

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What does patent US10170680B2 cover?
A method for adjusting a qubit includes measuring a qubit characteristic of a qubit device and computing a modification to correct the qubit characteristic. A geometry of a shunt capacitor is adjusted using a laser direct write process. The qubit characteristic is verified.
Who is the assignee on this patent?
IBM
What technology area does this patent fall under?
Primary CPC classification H01L39/24. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jan 01 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).