Charged particle beam device, and method of manufacturing component for charged particle beam device

Patent metadata

Field	Value
Publication number	US-10170273-B2
Application number	US-201615544958-A
Country	US
Kind code	B2
Filing date	Jan 21, 2016
Priority date	Jan 23, 2015
Publication date	Jan 1, 2019
Grant date	Jan 1, 2019

Abstract

The purpose of the present invention is to provide a charged particle beam device that exhibits high performance due to the use of vanadium glass coatings, and to provide a method of manufacturing a component for a charged particle beam device. Specifically provided is a charged particle beam device using a vacuum component characterized by comprising a metal container, the interior space of which is evacuated to form a high vacuum, and coating layers formed on the surface on the interior space-side of the metal container, wherein the coating layers are vanadium-containing glass, which is to say an amorphous substance. Coating vanadium glass onto walls of a space where it is desirable to form a high vacuum, for example walls in the vicinity of an electron source, reduces gas discharge in the vicinity of the electron source, and the getter effect of the coating layer induces localized evacuation and enables the formation of an extremely high vacuum, even in spaces having a complex structure, without providing a large high-vacuum pump.

First claim

The invention claimed is:

1. A charged particle beam device comprising:
an optical device that adjusts a charged particle beam emitted from a charged particle source; and
a vacuum container for forming a vacuum atmosphere in a path where the charged particle beam passes;
a first anode for extracting charged particles from the charged particle source;
a second anode for accelerating charged particles extracted by the first anode;
an insulator arranged between the first anode and the second anode; and
a vacuum pump that locally evacuates a peripheral portion of the charged particle source;
wherein the insulator is formed of vanadium-containing glass.

2. The charged particle beam device according to claim 1 ,
wherein the vanadium-containing glass contains vanadium as a main component.

3. The charged particle beam device according to claim 1 ,
wherein the optical device is an electrostatic lens.

4. The charged particle beam device according to claim 1 , further comprising:
an aberration corrector that corrects an aberration of the charged particle beam; and
a deflector that deflects the charged particle beam,
wherein at least one of the aberration corrector or the deflector is formed of vanadium-containing glass.

5. A charged particle beam device comprising:
an optical device that adjusts a charged particle beam emitted from a charged particle source; and
a vacuum container for forming a vacuum atmosphere in a path where the charged particle beam passes;
a first anode for extracting charged particles from the charged particle source;
a second anode for accelerating charged particles extracted by the first anode;
an insulator arranged between the first anode and the second anode; and
a vacuum pump that locally evacuates a peripheral portion of the charged particle source;
wherein at least one of the first anode, the second anode, and the insulator positioned inside the vacuum container is coated with a glass layer containing vanadium, at a surface on a charged particle source side.

6. The charged particle beam device according to claim 5 ,
wherein the glass layer containing vanadium contains vanadium as a main component.

7. The charged particle beam device according to claim 5 ,
wherein a degree of vacuum at a peripheral portion of the charged particle source is 10 −8 to 10 −11 [Pa].

8. The charged particle beam device according to claim 5 ,
wherein the glass layer containing vanadium has a thermal expansion coefficients of 4 to 20 ppm.

9. The charged particle beam device according to claim 5 ,
wherein the optical device is an electrostatic lens.

10. The charged particle beam device according to claim 5 ,
wherein the optical device is at least one of an aberration corrector that corrects an aberration of the charged particle beam and a deflector that deflects the charged particle beam.

11. The charged particle beam device according to claim 5 ,
wherein the glass layer containing vanadium is provided on an inner wall of a lens barrel of the charged particle beam device.

12. The charged particle beam device according to claim 5 ,
wherein the glass layer containing vanadium is provided in an optical device inside a lens barrel of the charged particle beam device.

13. A charged particle beam device comprising:
an optical device that adjusts a charged particle beam emitted from a charged particle source; and
a vacuum container for forming a vacuum atmosphere in a path where the charged particle beam passes,
wherein a member positioned inside the vacuum container is coated with a glass layer containing vanadium,
wherein the vacuum container includes a container that forms a vacuum chamber and a copper gasket for connecting the container to another member, and
an application range of the glass layer containing vanadium has a relation of E>d when a distance between the copper gasket and the glass layer containing vanadium is E and a film thickness of the glass layer containing vanadium is d.

14. A charged particle beam device comprising:
an optical device that adjusts a charged a particle beam emitted from a charged particle source:
a vacuum container for forming a vacuum atmosphere in a path where the charged particle beam passes;
a first anode for extracting charged particles from the charged particle source;
a second anode for accelerating charged particles extracted by the first anode; and
an insulator arranged between the first anode and the second anode,
wherein surfaces of the second anode and insulator on the charged particle source side located within the vacuum container are coated with the glass layer containing vanadium.

15. A method of manufacturing a member for a charged particle beam device including an optical device that adjusts a charged particle beam emitted from a charged particle source, and a vacuum container for forming a vacuum atmosphere in a path where the charged particle beam passes, the method comprising the step of:
coating a glass layer containing vanadium on a surface of a member for the charged particle beam device, which is a member placed on a vacuum space side of the charged particle beam device;
wherein the vacuum container includes a container that forms a vacuum chamber and a copper gasket for connecting to another member, and
an application range of the glass layer containing vanadium has a relation of E>d when a distance between the copper gasket and the glass layer containing vanadium is E and a film thickness of the glass layer containing vanadium is d.

16. The method of manufacturing the member for the charged particle beam device according to claim 15 ,
wherein the glass layer containing vanadium contains vanadium as a main component.

17. The method of manufacturing the member for the charged particle beam device according to claim 15 ,
wherein the glass layer containing vanadium is applied to a surface of the member by making vanadium-containing glass in a paste state or in a liquid state.

Assignees

• Hitachi High Tech Corp

Inventors

• Ichimura Takashi
• Ito Hiroyuki
• Kato Shinichi
• Murakoshi Hisaya
• Fujieda Tadashi
• Miyake Tatsuya
• Naitou Takashi
• Aoyagi Takuya
• Tanimoto Kenji

Classifications

• H01J2237/26

  Electron or ion microscopes · CPC title

• H01J37/12

  electrostatic · CPC title

• H01J9/18

  Assembling together the component parts of electrode systems · CPC title

• H01J37/065

  Construction of guns or parts thereof (H01J37/067 - H01J37/077 take precedence) · CPC title

• C23D5/02

  by wet methods · CPC title