Gadolinium sputtering target and production method of said target

Patent metadata

Field	Value
Publication number	US-10167547-B2
Application number	US-201013517208-A
Country	US
Kind code	B2
Filing date	Dec 21, 2010
Priority date	Dec 24, 2009
Publication date	Jan 1, 2019
Grant date	Jan 1, 2019

Abstract

An assembly of a gadolinium target and a titanium backing plate, wherein the gadolinium target-titanium backing plate assembly has a solid-phase diffusion-bonded interface at a bonding interface between the gadolinium target and the titanium backing plate. An object of the present invention is to discover a backing plate that is suitable for the gadolinium sputtering target, explore the optimal bonding conditions, improve the deposition rate, stabilize the sputtering process, and prevent the occurrence of warpage and separation of the target material and the backing plate by increasing the bonding strength between the target material and the backing plate, as well as inhibit the generation of particles during sputtering.

First claim

The invention claimed is:

1. An assembly comprising a gadolinium target plate and a titanium backing plate bonded to the gadolinium target plate, the gadolinium target plate being defined by an exposed sputtering face and an opposing non-sputtering face and having a diameter of at least 450 mm, and the titanium backing plate being defined by a face which is in contact with and bonded to the non-sputtering face of the gadolinium target plate and an opposed face which forms an exposed rear face of said assembly, wherein the gadolinium target plate has a purity of 99.9% or higher and the titanium backing plate has a purity of 99.99% or higher, the non-sputtering face of the gadolinium target plate and the face of the titanium backing plate in contact with the non-sputtering face of the gadolinium target plate are bonded to each other by solid-phase diffusion bonding to provide a bonding interface.

2. A method of producing a gadolinium target and titanium backing plate assembly, comprising the step of subjecting a gadolinium target plate of 99.9% (3N) or higher purity and a titanium backing plate of 99.99% (4N) or higher purity to solid-phase diffusion bonding under an inert atmosphere at a temperature of 350 to 650° C. and pressure of 1000 to 2000 atm to provide a bonding interface, wherein the gadolinium target plate has an exposed sputtering face and an opposing non-sputtering face and has a diameter of at least 450 mm, the titanium backing plate has a face which is in contact with and bonded to the non-sputtering face of the gadolinium target plate and an opposed face which forms an exposed rear face of said assembly.

3. A method of producing a gadolinium target plate and titanium backing plate assembly, comprising the steps of subjecting gadolinium of 99.9% (3N) or higher purity to isothermal forging under an argon atmosphere at a temperature of 1000° C. or less and forging reduction of 60% or higher to prepare a gadolinium ingot, slicing the obtained ingot to an appropriate thickness to prepare a gadolinium target plate, machining a surface of the gadolinium target plate as final-finishing treatment, and subjecting the gadolinium target plate to solid-phase diffusion bonding with a titanium backing plate of 99.99% (4N) or higher purity to provide a bonding interface, wherein the gadolinium target plate has an exposed sputtering face and an opposing non-sputtering face and has a diameter of at least 450 mm, the titanium backing plate has a face which is in contact with and bonded to the non-sputtering face of the gadolinium target plate and an opposed face which forms an exposed rear face of said assembly.

4. An assembly consisting of a sputtering target bonded to a backing plate, said sputtering target consisting of gadolinium metal of 99.9% (3N) or higher purity having a diameter of at least 450 mm, said backing plate consisting of titanium metal of 99.99% (4N) or higher purity, and a bonding interface therebetween being a solid-phase diffusion-bonded interface without intermetallic compound, wherein the assembly includes an exposed sputtering face provided by the gadolinium metal and an opposite exposed backing plate face provided by the titanium metal.

5. An assembly according to claim 4 , wherein a bonding strength of the solid-phase diffusion-bonded interface is 20.6 to 31.5 kgf/mm 2 .

6. An assembly according to claim 1 , wherein a bonding strength of the bonding interface is 20.6 to 31.5 kgf/mm 2 .

Assignees

• Tsukamoto Shiro
• Jx Nippon Mining & Metals Corp

Inventors

• Tsukamoto Shiro

Classifications

• H01J37/3435

  Target holders (includes backing plates and endblocks) · CPC title

• C23C14/14

  Metallic material, boron or silicon · CPC title

• H01J37/3426

  Material · CPC title

• B23K20/021

  Isostatic pressure welding · CPC title

• H01J37/3255

  Material · CPC title