Using chemical vapor deposited films to control domain orientation in block copolymer thin films

Patent metadata

Field	Value
Publication number	US-10167410-B2
Application number	US-201514698253-A
Country	US
Kind code	B2
Filing date	Apr 28, 2015
Priority date	Feb 10, 2012
Publication date	Jan 1, 2019
Grant date	Jan 1, 2019

Abstract

Vacuum deposited thin films of material are used to create an interface that non-preferentially interacts with different domains of an underlying block copolymer film. The non-preferential interface prevents formation of a wetting layer and influences the orientation of domains in the block copolymer. The purpose of the deposited polymer is to produce nano structured features in a block copolymer film that can serve as lithographic patterns.

First claim

The invention claimed is:

1. A layered structure comprising first, second and third layers on a surface, wherein said first layer comprises a surface energy neutralizing layer, wherein said second layer comprises a block copolymer film, wherein said block copolymer comprises a triblock copolymer, and wherein said third layer comprises a poly(p-xylylene) polymer.

2. The structure of claim 1 , wherein said layered structure further comprises nano structures.

3. The structure of claim 2 , wherein said nanostructures comprise cylindrical structures, said cylindrical structures being substantially vertically aligned with respect to the plane of the surface.

4. The structure of claim 1 , wherein said surface is selected from the group consisting of: silicon, glass, or quartz.

5. The structure of claim 1 , wherein said poly(p-xylylene) polymer is selected from the group consisting of the following structures:

6. The structure of claim 1 , wherein said block copolymers selected from the group consisting of the following structures:

7. The structure of claim 1 , wherein said block copolymer is made from at least two monomers.

8. The structure of claim 7 , wherein said second monomer comprises a silicon atom that can be polymerized.

9. The structure of claim 7 , wherein said first monomer comprises a monomer lacking silicon that can be polymerized.

10. The structure of claim 7 , wherein said second monomer is trimethyl-(2-methylene-but-3-enyl)silane.

11. The structure of claim 7 , wherein said second monomer is trimethylsilylstyrene.

12. The structure of claim 7 , wherein said second monomer is a silicon-containing methacrylate.

13. The structure of claim 7 , wherein said second monomer is methacryloxymethyltrimethylsilane.

14. A layered structure comprising first, second and third layers on a surface, wherein said first layer comprises a surface energy neutralizing layer, wherein said second layer comprises a block copolymer film, and wherein said third layer comprises a poly(p-xylylene) polymer, wherein said surface energy neutralizing layer comprises a polymer selected from the group consisting of:

15. The structure of claim 14 , wherein said poly(p-xylylene) polymer is selected from the group consisting of the following structures:

16. The structure of claim 14 , wherein said block copolymers selected from the group consisting of the following structures:

17. The structure of claim 14 , wherein said layered structure further comprises nano structures.

18. The structure of claim 17 , wherein said nanostructures comprise cylindrical structures, said cylindrical structures being substantially vertically aligned with respect to the plane of the surface.

19. The structure of claim 17 , wherein said surface is selected from the group consisting of: silicon, glass, or quartz.

20. A layered structure comprising first, second and third layers on a surface, wherein said first layer comprises a surface energy neutralizing layer, wherein said second layer comprises a block copolymer film wherein said block copolymer is made from at least two monomers, wherein at least one of the monomers is methacryloxymethyltrimethylsilane, and wherein said third layer comprises a poly(p-xylylene) polymer.

Assignees

• Univ Texas

Inventors

• Wilson C Grant
• Durand William J
• Ellison Christopher John
• Bates Christopher M
• Seshimo Takehiro
• Cushen Julia
• Santos Logan J
• Dean Leon
• Rausch Erica L

Classifications

• C03C17/3405

  with at least two coatings of organic materials (C03C17/36, C03C17/42 take precedence) · CPC title

• C09D153/00 Primary

  Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers · CPC title

• Y10T428/24802

  Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] · CPC title

• Y10T428/31931

  Polyene monomer-containing · CPC title

• C03C17/30 Primary

  with silicon-containing compounds · CPC title