Energy efficient high-temperature refining
US-9802850-B2 · Oct 31, 2017 · US
Method and apparatus for adding thermal energy to a glass melt
US10167220B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10167220-B2 |
| Application number | US-201715425517-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 6, 2017 |
| Priority date | Jan 8, 2015 |
| Publication date | Jan 1, 2019 |
| Grant date | Jan 1, 2019 |
How to read this patent
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
- Title
What the patent document calls the invention.
- Abstract
A short plain-language summary of the technical disclosure.
- Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
- Key dates
Filing, priority, publication, and grant dates set the timeline.
- First independent claim
The legal scope of protection — read this for what is actually claimed.
- CPC / IPC classifications
Technology tags used to group this patent with similar filings.
- Citations and related patents
Prior art links and similar publications in this corpus.
Abstract
Official abstract text for this publication.
Disclosed herein are methods and apparatuses for adding thermal energy to a glass melt. Apparatuses for generating a thermal plasma disclosed herein comprise an electrode, a grounded electrode, a dielectric plasma confinement vessel extending between the two electrodes, and a magnetic field generator extending around the dielectric plasma confinement vessel. Also disclosed herein are methods for fining molten glass comprising generating a thermal plasma using the apparatuses disclosed herein and contacting the molten glass with the thermal plasma. Glass structures produced according to these methods are also disclosed herein.
First claim
Opening claim text (preview).
What is claimed is: 1. A method for fining molten glass comprising: introducing a gas into an apparatus for generating a thermal plasma by a radio frequency (RF) electromagnetic field, the apparatus comprising: an electrode, a grounded electrode, a dielectric plasma confinement vessel extending between the electrode and the grounded electrode, a magnetic field generator extending around the dielectric plasma confinement vessel, an inlet for delivering a gas into the dielectric plasma confinement vessel, an RF current source to create the RF electromagnetic field for converting the gas into a thermal plasma, and an outlet for delivering the thermal plasma, introducing molten glass into a fining vessel; and contacting the molten glass with the thermal plasma. 2. The method of claim 1 , wherein the gas is a noble gas chosen from argon, helium, neon, krypton, and xenon. 3. The method of claim 1 , wherein contacting the molten glass with the thermal plasma comprises directing the thermal plasma at a glass-air interface in the fining vessel. 4. The method of claim 1 , wherein contacting the molten glass with the thermal plasma comprises directing the thermal plasma at an exterior surface of the fining vessel. 5. The method of claim 1 , wherein the thermal plasma heats the molten glass to a temperature greater than or equal to about 1700° C. 6. The method of claim 1 , wherein the thermal plasma locally heats at least one predetermined region in the fining vessel through which the molten glass flows.
Assignees
Inventors
Classifications
Details, e.g. electrodes, nozzles · CPC title
Cooling arrangements · CPC title
containing an oxide of a divalent metal · CPC title
non-consumable · CPC title
Electricity · mapped topic
Patent family
Related publications grouped by family.
External sources
Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US10167220B2 cover?
- Disclosed herein are methods and apparatuses for adding thermal energy to a glass melt. Apparatuses for generating a thermal plasma disclosed herein comprise an electrode, a grounded electrode, a dielectric plasma confinement vessel extending between the two electrodes, and a magnetic field generator extending around the dielectric plasma confinement vessel. Also disclosed herein are methods fo…
- Who is the assignee on this patent?
- Corning Inc
- What technology area does this patent fall under?
- Primary CPC classification C03B5/185. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Jan 01 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).