Refining method for microstructure

Patent metadata

Field	Value
Publication number	US-10166571-B2
Application number	US-201415102831-A
Country	US
Kind code	B2
Filing date	Dec 8, 2014
Priority date	Dec 10, 2013
Publication date	Jan 1, 2019
Grant date	Jan 1, 2019

Abstract

Provided is a manufacturing method for a substrate having a microstructure. The manufacturing method for a substrate having a microstructure comprises the steps of: forming a microstructure on the upper surface of an auxiliary substrate; coating a base solution on the microstructure; forming a base substrate covering the microstructure by heat treating the base solution; and removing the auxiliary substrate from the base substrate.

First claim

The invention claimed is:

1. A method for refining nano/micro structures, comprising:
preparing a mixed solution including nano/micro structures with different dimensions;
spreading the mixed solution including the nano/micro structures on a substrate that is inclined to form a layer on the substrate including subsets of nano/micro structures, each of the subset having nano/micro structures with substantially same mass or size;
collecting a part of the layer on the substrate, the part of the layer including at least one subset of the nano/micro structures; and
recovering the subset of nano/micro structures included in the collected part of the layer.

2. The method for refining nano/micro structures of claim 1 , wherein the substrate is inclined to the ground.

3. The method for refining nano/micro structures of claim 1 , wherein the collected part of the layer is located within a predetermined distance range from a location at which the mixed solution is spread onto the substrate.

4. The method for refining nano/micro structures of claim 3 , wherein the collecting of the part of the layer includes:
removing the layer on the substrate except the part of the layer; and
collecting the remaining part of the layer.

5. The method for refining nano/micro structures of claim 1 , wherein the spreading of the mixed solution includes drying the mixed solution to form the layer.

6. The method for refining nano/micro structures of claim 5 , wherein the collecting of the part of the layer includes supplying a solution that dissolves the part of the layer onto the substrate.

7. The method for refining a nano/micro structure of claim 6 , wherein the recovering of the nano/micro structures includes:
recovering the nano/micro structures from the solution in which the part of the layer is dissolved in with a centrifuge.

8. The method for refining nano/micro structures of claim 6 , further comprising:
forming a peeling layer on the substrate before spreading the mixed solution onto the substrate.

9. The method for refining nano/micro structures of claim 1 , further comprising:
performing a pretreatment process for reducing surface energy of a surface of the substrate before spreading the mixed solution onto the substrate.

Assignees

• Lg Display Co Ltd

Inventors

• Kim Taewhan
• Choo Dongchul
• Lee Jungyu

Classifications

• B05D3/007 Primary

  After-treatment · CPC title

• H05K3/12

  using {thick film techniques, e.g.} printing techniques to apply the conductive material {or similar techniques for applying conductive paste or ink patterns} · CPC title

• B05D5/12

  to obtain a coating with specific electrical properties · CPC title

• B05D5/04

  to obtain a surface receptive to ink or other liquid (B05D5/02, {B41M5/52} take precedence) · CPC title

• B05D3/02

  by baking {(B05D3/04 takes precedence)} · CPC title