Ion beam system

Patent metadata

Field	Value
Publication number	US-10163602-B2
Application number	US-201715635500-A
Country	US
Kind code	B2
Filing date	Jun 28, 2017
Priority date	Jul 5, 2016
Publication date	Dec 25, 2018
Grant date	Dec 25, 2018

Abstract

Provided is an ion beam system including a gas field ionization ion source which can obtain a high current sufficient for processing and stabilize an ion beam current. The ion beam system includes a gas field ionization ion source which includes: a vacuum vessel; an emitter tip holder disposed in the vacuum vessel; an emitter tip connected to the emitter tip holder; an extraction electrode opposed to the emitter tip; a gas supply portion for supplying a gas to the emitter tip; and a cold transfer member disposed in the vacuum vessel and transferring cold energy to the emitter tip holder. The cold transfer member has its surface covered with a heat insulating material in order to prevent the gas condensation.

First claim

What is claimed is:

1. An ion beam system comprising:
a gas field ionization ion source which includes:
a vacuum vessel;
an emitter tip holder disposed in the vacuum vessel;
an emitter tip connected to the emitter tip holder;
an extraction electrode opposed to the emitter tip;
a gas supply portion for supplying a gas to the emitter tip; and
a cold transfer member disposed in the vacuum vessel and transferring cold energy to the emitter tip holder,
wherein a heat insulating material covers an outer surface of the cold transfer member in order to prevent condensation of the gas.

2. The ion beam system according to claim 1 ,
wherein the cold transfer member is a metal thin film or a braided metal wire and has a heat insulating layer adhered to the surface thereof.

3. The ion beam system according to claim 1 ,
wherein the cold transfer member comprises a metal and the heat insulating material comprises a fluorine resin or ceramics.

4. The ion beam system according to claim 1 ,
wherein the gas is a gas containing any one of neon, argon, krypton and xenon.

5. The ion beam system according to claim 1 ,
wherein the gas is a gas containing any one of carbon monoxide, oxygen and nitrogen.

6. The ion beam system according to claim 1 ,
wherein the gas supply portion supplies a gas mixture of krypton gas and other gas or supplies the krypton gas and the other gas by switching between these gases, and
the emitter tip is maintained at a substantially constant temperature higher than the condensation temperatures of the gases and equal to or less than 60K.

7. The ion beam system according to claim 1 ,
wherein the gas supply portion supplies a gas mixture of argon gas and helium gas or a gas mixture of argon gas and hydrogen gas, and
the emitter tip is maintained at a substantially constant temperature higher than the condensation temperatures of the gases and equal to or less than 45K.

8. An ion beam system comprising:
a gas field ionization ion source which includes:
a vacuum vessel;
an emitter tip holder disposed in the vacuum vessel;
an emitter tip connected to the emitter tip holder;
an extraction electrode opposed to the emitter tip;
a gas supply portion for supplying a gas to the emitter tip; and
a cold transfer member disposed in the vacuum vessel and transferring cold energy to the emitter tip holder,
the system further comprising:
an adhesion member covering an outer surface of the cold transfer member; and
a heat insulating material adhered to the outer surface of the cold transfer member via the adhesion member, and covering the adhesion member.

9. The ion beam system according to claim 8 ,
wherein the cold transfer member is a metal thin film or a braided metal wire and has a heat insulating layer adhered to the surface thereof.

10. The ion beam system according to claim 8 ,
wherein the cold transfer member comprises a metal and the heat insulating material comprises a fluorine resin or ceramics.

11. The ion beam system according to claim 8 ,
wherein the gas is a gas containing any one of neon, argon, krypton and xenon.

12. The ion beam system according to claim 8 ,
wherein the gas is a gas containing any one of carbon monoxide, oxygen and nitrogen.

13. The ion beam system according to claim 8 ,
wherein the gas supply portion supplies a gas mixture of krypton gas and other gas or supplies the krypton gas and the other gas by switching between these gases, and
the emitter tip is maintained at a substantially constant temperature higher than the condensation temperatures of the gases and equal to or less than 60K.

14. The ion beam system according to claim 8 ,
wherein the gas supply portion supplies a gas mixture of argon gas and helium gas or a gas mixture of argon gas and hydrogen gas, and
the emitter tip is maintained at a substantially constant temperature higher than the condensation temperatures of the gases and equal to or less than 45K.

15. An ion beam system comprising:
a gas field ionization ion source which includes:
a vacuum vessel; an emitter tip holder disposed in the vacuum vessel;
an emitter tip connected to the emitter tip holder;
an extraction electrode opposed to the emitter tip;
a gas supply portion for supplying a gas to the emitter tip; and
a cold transfer member disposed in the vacuum vessel and transferring cold energy to the emitter tip holder,
the system further comprising:
a heat insulating material covering an outer surface of the cold transfer member;
a metal material covering an outer surface of the heat insulating material; and
a heating mechanism for heating the metal material.

Assignees

• Hitachi High Tech Science Corp

Inventors

• Shichi Hiroyasu
• Matsubara Shinichi
• Kawanami Yoshimi

Classifications

• H01J37/28

  with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} · CPC title

• H01J2237/022

  Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube · CPC title

• H01J2237/0807

  Gas field ion sources [GFIS] · CPC title

• H01J37/18

  Vacuum locks {; Means for obtaining or maintaining the desired pressure within the vessel} · CPC title

• H01J37/261

  Details · CPC title