In-situ contactless monitoring of photomask pellicle degradation

US10161915B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10161915-B2
Application numberUS-201514932372-A
CountryUS
Kind codeB2
Filing dateNov 4, 2015
Priority dateNov 4, 2015
Publication dateDec 25, 2018
Grant dateDec 25, 2018

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  1. Title

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  2. Abstract

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method and apparatus for detecting changes in the vibrational mode spectra and/or elasticity of a pellicle without reliance upon visual inspection are provided. Embodiments include providing a pellicle, a lower surface of the pellicle attached to a photomask; directing light from a light source onto an upper surface of the pellicle at an angle to the upper surface; causing a deflection of the pellicle concurrently with the light being directed onto the pellicle; detecting light reflected off of the deflected pellicle; and characterizing a vibrational mode of the pellicle based on the detection.

First claim

Opening claim text (preview).

What is claimed is: 1. A method comprising: providing a pellicle, a lower surface of the pellicle attached to a photomask; directing light from a light source onto an upper surface of the pellicle at an angle to the upper surface; causing a deflection of the pellicle concurrently with the light being directed onto the pellicle by: generating a frequency-swept acoustic wave with a frequency generator; directing the frequency-swept acoustic wave at the pellicle via a loudspeaker; moving the light source and a photodetector for detecting the light in tandem in-plane relative to the pellicle; and moving the loudspeaker in tandem with the light source and the photodetector in-plane relative to the pellicle concurrently with directing the frequency-swept acoustic wave at the pellicle, the photodetector configured to detect light from the light source; detecting light reflected off of the deflected pellicle by the photodetector; and characterizing a vibrational mode of the pellicle based on an amplitude measurement of the detected light. 2. The method according to claim 1 , comprising: placing the pellicle in a pressure chamber prior to directing the frequency-swept acoustic wave at the pellicle; and reducing an air pressure in the pressure chamber prior to detecting the reflected light. 3. The method according to claim 1 , further comprising detecting a degradation of the pellicle based on the vibrational mode of the pellicle. 4. An apparatus comprising: an opaque molybdenum silicide (MoSi) on glass (OMOG) photomask; a supporting frame formed on an upper surface of the photomask, the supporting frame having a pellicle vent; a pellicle attached to the supporting frame; a light source; a means for deflecting the pellicle, wherein the means for deflecting comprises a frequency generator and a loudspeaker; a photodetector for detecting a light from the light source directed at and reflected off of an upper surface of the pellicle concurrently with a deflection of the pellicle; and a means for analyzing detected light, wherein the means for analyzing comprises an amplitude measurement module to characterize a vibrational mode of the pellicle, wherein the loudspeaker is directed at the pellicle, and wherein the light source, the photodetector and the loudspeaker are caused to move in-plane relative to the pellicle to generate a localized pellicle deflection and a spatially resolved measurement of the localized pellicle deflection by the amplitude measurement module. 5. The apparatus according to claim 4 , further comprising a pressure chamber wherein the photomask, the supporting frame, the pellicle, and the loudspeaker are placed in the pressure chamber, and an air pressure of the pressure chamber is reduced prior to deflection of the pellicle by the loudspeaker. 6. A method comprising: providing a pellicle, a lower surface of the pellicle attached to a photomask; directing light from a light source onto an upper surface of the pellicle at an angle to the upper surface; causing a deflection of the pellicle concurrently with the light being directed onto the pellicle by: directing air at the upper surface of the pellicle from above the pellicle via an air nozzle; moving the light source and a photodetector for detecting the light in tandem in-plane relative to the pellicle; and moving the air nozzle in tandem with the light source and the photodetector in-plane relative to the pellicle concurrently with directing the air at the pellicle, the photodetector configured to detect light from the light source; detecting light reflected off of the deflected pellicle by the photodetector; and characterizing a vibrational mode of the pellicle based on an amplitude measurement of the detected light.

Assignees

Inventors

Classifications

  • by measuring attenuation of acoustic waves · CPC title

  • by spectral analysis, e.g. Fourier analysis {or wavelet analysis (spectral signal processing per se G06F17/14)} · CPC title

  • Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof · CPC title

  • with frequency characteristics, e.g. single frequency signals, chirp signals (measuring frequency of mechanical vibrations or acoustic waves in general G01H1/06, G01H3/04; measuring frequency or analysing frequency spectra G01R23/00) · CPC title

  • Attenuation, scattering · CPC title

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What does patent US10161915B2 cover?
A method and apparatus for detecting changes in the vibrational mode spectra and/or elasticity of a pellicle without reliance upon visual inspection are provided. Embodiments include providing a pellicle, a lower surface of the pellicle attached to a photomask; directing light from a light source onto an upper surface of the pellicle at an angle to the upper surface; causing a deflection of the…
Who is the assignee on this patent?
Globalfoundries Inc, Globalfoundries
What technology area does this patent fall under?
Primary CPC classification G01N29/2418. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Dec 25 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).