High-nickel ternary core-shell precursor, positive electrode material and preparation method therefor
US-2024166533-A1 · May 23, 2024 · US
Alcohol compound
US10155784B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10155784-B2 |
| Application number | US-201815861719-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 4, 2018 |
| Priority date | Nov 13, 2012 |
| Publication date | Dec 18, 2018 |
| Grant date | Dec 18, 2018 |
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- Title
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Abstract
Official abstract text for this publication.
An alcohol compound of formula (II) in which R 4 represents a methyl group or an ethyl group, R 5 represents a hydrogen atom, and R 6 represents a C 1-3 linear or branched alkyl group. The alcohol compound has physical properties suitable for a material for forming thin films by CVD, and particularly, physical properties suitable for a material for forming metallic-copper thin films.
First claim
Opening claim text (preview).
The invention claimed is: 1. An alcohol compound of general formula (II): wherein, R 4 represents a methyl group or an ethyl group, R 5 represents a hydrogen atom, and R 6 represents a C 1-3 linear or branched alkyl group.
Assignees
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Classifications
having carbon atoms of imino groups bound to hydrogen atoms or to acyclic carbon atoms · CPC title
from metallo-organic compounds · CPC title
Titanium compounds · CPC title
of copper or solid solutions thereof · CPC title
of iron group metals · CPC title
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- What does patent US10155784B2 cover?
- An alcohol compound of formula (II) in which R 4 represents a methyl group or an ethyl group, R 5 represents a hydrogen atom, and R 6 represents a C 1-3 linear or branched alkyl group. The alcohol compound has physical properties suitable for a material for forming thin films by CVD, and particularly, physical properties suitable for a material for forming metallic-copper thin films.
- Who is the assignee on this patent?
- Adeka Corp
- What technology area does this patent fall under?
- Primary CPC classification C07F15/065. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Dec 18 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).