Patterns of fluorescent seeded nanorods

US10151049B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10151049-B2
Application numberUS-201515325483-A
CountryUS
Kind codeB2
Filing dateJul 14, 2015
Priority dateJul 15, 2014
Publication dateDec 11, 2018
Grant dateDec 11, 2018

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Abstract

Official abstract text for this publication.

Provided are printed patterns and objects including, for example, a film or 3D object, which may include one or more nanorods. According to the subject matter provided, the nanorods may reduce or diminish inter-particle interaction in the pattern or object.

First claim

Opening claim text (preview).

The invention claimed is: 1. A printed pattern composed of multiple material layers, each of said layers comprising a plurality of seeded nanorods, the seeded nanorods being selected to have substantially reduced overlap between the nanorods' absorption spectra and the nanorods' emission spectra, wherein the plurality of seeded nanorods are configured to exhibit in the pattern a reduced or diminished inter-particle interaction, wherein the printed pattern is selected from the group consisting of a film and a 3D object, and wherein the ratio of seed diameter to nanorod length is between 1:2.1 and 1:3, between 1:3 and 1:6, or between 1:6 and 1:10. 2. The printed pattern according to claim 1 , the pattern being composed of multiple material layers, each of said layers comprising a plurality of nanorods, the nanorods being selected to have substantially reduced overlap between the nanorods' absorption spectra and the nanorods' emission spectra, and wherein the plurality of nanorods are configured to adapt in the pattern an inter-particle distance controllable to a reduced or diminished inter-particle interaction. 3. The printed pattern according to claim 1 , wherein the seeded nanorods are selected amongst elongated nanoparticles embedding a seed element of a different material composition. 4. The printed pattern according to claim 3 , wherein the seed element is selected from an elongated element, a spherical element, a core/shell element and a core/multishell element. 5. The printed pattern according to claim 4 , wherein the seed is a non-core/shell structure selected from an elongated element and a spherical element, the element being of a material composition different than the material composition of the nanorod embedding the seed. 6. The printed pattern according to claim 5 , wherein the seed is a core/shell or a core/multishell element, wherein the core and/or any one of the shells may independently have a spherical or an elongated shape. 7. A printed pattern composed of multiple material layers, each of said layers comprising a plurality of seeded nanorods, the seeded nanorods being selected to have substantially reduced overlap between the nanorods' absorption spectra and the nanorods' emission spectra, and wherein the plurality of seeded nanorods are configured to exhibit in the pattern a reduced or diminished inter-particle interaction, wherein the printed pattern is selected from a film and a 3D object, wherein the seed of said seeded nanorod has a size of less than 3 nm. 8. The printed pattern according to claim 1 , wherein the nanorod material and the seed material is of a semiconducting material. 9. The printed pattern according to claim 1 , wherein the nanorod material and/or the seed material comprising a semiconductor material. 10. The printed pattern according to claim 1 , wherein the nanorod material and/or seed material is a semiconductor material selected from elements of Group I-VII, Group II-VI, Group III-V, Group IV-VI, Group and Group IV semiconductors and combinations thereof. 11. The printed pattern according to claim 10 , wherein the material is or comprises an element of Group IV. 12. The printed pattern according to claim 1 , wherein the seed material is different from the nanorod material. 13. The printed pattern according to claim 1 , being in the form of a multilayered stacked arrangement. 14. A process for forming a pattern of a plurality of seeded nanorods, according to claim 1 , the process comprising ink-jetting a formulation/dispersion of the seeded nanorods onto a surface region; wherein the nanorods are selected to have substantially reduced overlap between the nanorods' absorption spectra and the nanorods' emission spectra, the ink-jetting being configured to form a pattern of the nanorods, the pattern composed of a number of printed layers and exhibiting at least one of reduced or diminished re-absorption and reduced or diminished inter-particle interaction. 15. A device implementing at least one patterned film according to claim 1 . 16. A printed pattern composed of multiple material layers, each of said layers comprising a plurality of seeded nanorods, the seeded nanorods being selected to have substantially reduced overlap between the nanorods' absorption spectra and the nanorods' emission spectra, and wherein the plurality of seeded nanorods are configured to exhibit in the pattern a reduced or diminished inter-particle interaction, wherein the printed pattern is selected from a film and a 3D object, wherein the seed of said seeded nanorods has a size of between 1 and 5 nm.

Assignees

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Classifications

  • the crystallising materials being formed by chemical reactions in the solution · CPC title

  • Exhibiting three-dimensional carrier confinement, e.g. quantum dots · CPC title

  • characterised by the pigment · CPC title

  • Sympathetic, colour changing or similar inks · CPC title

  • Whiskers or needles · CPC title

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Frequently asked questions

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What does patent US10151049B2 cover?
Provided are printed patterns and objects including, for example, a film or 3D object, which may include one or more nanorods. According to the subject matter provided, the nanorods may reduce or diminish inter-particle interaction in the pattern or object.
Who is the assignee on this patent?
Yissum Res Dev Co Of Hebrew Univ Jerusalem Ltd
What technology area does this patent fall under?
Primary CPC classification C09K11/883. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Dec 11 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).