Helmholtz coil assisted PECVD carbon source

Patent metadata

Field	Value
Publication number	US-10151025-B2
Application number	US-201414448639-A
Country	US
Kind code	B2
Filing date	Jul 31, 2014
Priority date	Jul 31, 2014
Publication date	Dec 11, 2018
Grant date	Dec 11, 2018

Abstract

The embodiments disclose an apparatus including at least two carbon source deposition tools for emitting electrons, at least two reflective polarity rear button permanent magnets integrated into the carbon source deposition tools for reflecting emitted electrons, and at least two paired polarity Helmholtz coils integrated into the carbon source deposition tools for forming uniform parallel magnetic field lines for confining the emitted electrons to uniformly deposit carbon onto the surfaces of a two-sided media disk.

First claim

What is claimed is:

1. An apparatus, comprising:
at least two carbon source deposition tools for emitting electrons including a first carbon source deposition tool and a second carbon source deposition tool; and
at least two Helmholtz coils integrated into the carbon source deposition tools configured to form uniform parallel magnetic field lines perpendicular to a two-sided media disk for confining the emitted electrons to uniformly deposit carbon onto the surfaces of the two-sided media disk, wherein
the at least two Helmholtz coils include a first Helmholtz coil and a second Helmholtz coil,
the first Helmholtz coil is positioned between a first rear button permanent magnet and a first filament cathode,
a first anode post is positioned between the first filament cathode and a deposition chamber, and
a second anode post is positioned between a second filament cathode and the deposition chamber.

2. The apparatus of claim 1 , further comprising a first current regulator connected to one of the Helmholtz coils and configured to adjust current in a first Helmholtz coil current flow direction.

3. The apparatus of claim 1 , further comprising a second current regulator connected to one of the Helmholtz coils and configured to adjust current in a second Helmholtz coil current flow direction.

4. The apparatus of claim 1 , wherein the deposition chamber is configured to hold the two-sided media disk during a deposition process within the uniform parallel magnetic field lines.

5. The apparatus of claim 1 , the Helmholtz coils are configured with a predetermined spacing between coils in relationship to coil diameters for producing the uniform parallel magnetic field lines for confining and concentrating the emitted electrons.

6. An apparatus, comprising:
at least two Helmholtz coils integrated into two carbon source deposition tools configured to direct electron deposition of carbon perpendicularly onto a two-sided media disk, wherein the at least two Helmholtz coils include a first Helmholtz coil and a second Helmholtz coil;
at least two reflective polarity rear button permanent magnets integrated into the carbon source deposition tools, wherein the at least two reflective polarity rear button permanent magnets include a first rear button permanent magnet and a second rear button permanent magnet;
a current regulator used to adjust the current passing through the Helmholtz coils; and
electron emitting filaments integrated into the carbon source deposition tools, wherein predetermined coil spacing, current, and temperature is regulated to control a uniform carbon deposition rate and deposition thickness, wherein
the electron emitting filaments include a first electron emitting filament and a second electron emitting filament,
the first Helmholtz coil is positioned between the first rear button permanent magnet and the first electron emitting filament,
a first anode post is positioned between the first electron emitting filament and a deposition chamber,
a first deposition tool includes the first Helmholtz coil, the first rear button permanent magnet and the first electron emitting filament,
a second deposition tool includes the second Helmholtz coil, the second rear button magnet, and the second electron emitting filament, and
a second anode post is positioned between the second electron emitting filament and the deposition chamber.

7. The apparatus of claim 6 , wherein the two Helmholtz coils produce uniform parallel magnetic field lines for confining and concentrating emitted electrons.

8. The apparatus of claim 6 , wherein the carbon source deposition tools produce first and second plasmas that are configured to be concentrated within the two Helmholtz coils produced uniform parallel magnetic field lines.

9. The apparatus of claim 6 , wherein the at least one electron emitting filament is configured to emit electrons accelerated to form a plasma.

10. The apparatus of claim 6 , wherein the at least two reflective polarity rear button permanent magnets are configured to pinch magnetic fields down at ends of a magnetic bottle.

Assignees

• Seagate Technology Llc

Inventors

• Platt Christopher Loren
• Fan Zhaohui
• Tanaka Samuel Lewis
• Tong Chun Wai Joseph
• Greenberg Thomas Larson
• Ma Xiaoding

Classifications

• C23C16/50

  using electric discharges {(generation and control of plasma in discharge tubes for surface treatment H01J37/32, H01J37/34)} · CPC title

• H01J37/32568

  Relative arrangement or disposition of electrodes; moving means · CPC title

• H01J37/32422 Primary

  Arrangement for selecting ions or species in the plasma · CPC title

• C23C16/26

  Deposition of carbon only · CPC title

• C23C14/35 Primary

  by application of a magnetic field, e.g. magnetron sputtering {(C23C14/3457 takes precedence)} · CPC title