Maskless writing of a workpiece using a plurality of exposures having different focal planes using multiple DMDs

Patent metadata

Field	Value
Publication number	US-10149390-B2
Application number	US-201314011725-A
Country	US
Kind code	B2
Filing date	Aug 27, 2013
Priority date	Aug 27, 2012
Publication date	Dec 4, 2018
Grant date	Dec 4, 2018

Abstract

The technology disclosed relates to accommodating embedded substrates during direct writing onto a printed circuit board and to other patterning problems that benefit from an extended depth of focus. In particular, it relates to multi-focus direct writing of a workpiece by the continuous or step-wise movement of the workpiece during the sequence of exposures having different focus planes. In one implementation, a multi-arm rotating direct writer is configured for interleaved writing focused on two or more focal planes that generally correspond to two or more surface heights of a radiation sensitive layer that overlays the uneven workpiece. Alternating arms can produce interleaved writing to the two or more focal planes.

First claim

We claim as follows:

1. A method of direct writing on an uneven surface of a workpiece, the method comprising:
performing laser energy pattern imaging on the uneven surface of the workpiece, which is covered with a radiation sensitive layer that produces the uneven surface and is moving in relationship to a writing head, by exposing the uneven surface using at least two laser energy exposures in direct writing operations at a particular point on the workpiece to form a pattern in the radiation sensitive layer,
wherein a first height of a first focal plane of a first laser energy exposure at the particular point on the workpiece of the at least two laser energy exposures is different from a second height of a second focal plane of a second laser energy exposure at the particular point on the workpiece of the at least two laser energy exposures, such that the first laser energy exposure at the particular point on the workpiece and the second laser energy exposure at the particular point on the workpiece form an extended total depth of focus at the particular point on the workpiece.

2. The method of claim 1 , wherein the direct writing to the uneven surface is performed in one sequence of exposures of the workpiece by moving a workpiece area to be exposed in one direction over an exposure area of a direct writing tool by one of a continuous movement or a step-wise movement in discrete steps.

3. The method of claim 1 , further including interlacing the at least two laser energy exposures by using writing heads mounted on separate arms of a rotating arm-writing platform.

4. The method of claim 1 , further including inducing the first height of the first focal plane and the second height of the second focal plane using optical components positioned in separate optical paths traversed by first and second writing beams that produce the first laser energy exposure and the second laser energy exposure.

5. The method of claim 1 , further including inducing the first height of the first focal plane and the second height of the second focal plane using optical components positioned in a common optical path traversed by first and second writing beams that produce the first laser energy exposure and the second laser energy exposure.

6. The method of claim 5 , wherein a reflective adaptive optical device is positioned in the common optical path to control the first height of the first focal plane and the second height of the second focal plane.

7. The method of claim 4 , further including using separate modulators to modulate the first and second writing beams.

8. The method of claim 5 , further including using a single modulator to modulate the first and second writing beams.

9. The method of claim 4 , wherein a difference in height between higher and lower surfaces of the uneven surface is greater than an effective focal depth of either of the first and second writing beams used in the direct writing operations.

10. The method of claim 7 ,
wherein the first and second writing beams are laser beams at different frequencies, and
wherein the method further includes:
separately modulating the first and second writing beams; and
directing the first and second writing beams through an optical train that produces different focal planes due to the different frequencies.

11. The method of claim 10 , further including:
generating, by a single laser source, two frequencies of laser radiation; and
separating the two frequencies of laser radiation to form the first and second writing beams.

12. The method of claim 10 , wherein interlaced writing passes overlap by at least 25 percent of a writing width of at least one of the first and second writing beams.

13. The method of claim 12 , wherein the first and second writing beams are swept across the uneven surface of the workpiece.

14. The method of claim 12 , wherein the first and second writing beams are flashed onto the uneven surface of the workpiece.

15. A method of direct writing a pattern to a workpiece, the method comprising:
performing laser energy pattern imaging on the uneven surface of the workpiece, which is covered with a radiation sensitive layer that produces the uneven surface and is moving in relationship to a writing head of an optical system, by:
exposing a particular point of the uneven surface of the workpiece to a first laser energy exposure by a direct writing operation utilizing the optical system to form a pattern in the radiation sensitive layer, the first laser energy exposure being at a first height of a first focal plane; and
exposing the particular point of the uneven surface of the workpiece to a second laser energy exposure by the direct writing operation utilizing the optical system, the second laser energy exposure being at a second height of a second focal plane,
wherein the first height of the first focal plane of the first laser energy exposure at the particular point on the workpiece is different from the second height of the second focal plane of the second laser energy exposure at the particular point on the workpiece, such that the first laser energy exposure at the particular point on the workpiece and the second laser energy exposure at the particular point on the workpiece form an extended total depth of focus at the particular point on the workpiece.

Assignees

• Micronic Mydata AB
• Mycronic AB

Inventors

• Askebjer Per
• Rosling Mats

Classifications

• Y10T29/49155

  Manufacturing circuit on or in base · CPC title

• G03F7/2022 Primary

  Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure · CPC title

• H05K2203/108

  Using a plurality of lasers or laser light with a plurality of wavelengths · CPC title

• G03F7/70333

  Focus drilling, i.e. increase in depth of focus for exposure by modulating focus during exposure [FLEX] · CPC title

• G03F7/70383

  Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams (maskless lithography using a programmable mask G03F7/70291) · CPC title