Integration of millimeter wave antennas on microelectronic substrates

US10147997B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10147997-B2
Application numberUS-201715445618-A
CountryUS
Kind codeB2
Filing dateFeb 28, 2017
Priority dateMar 26, 2012
Publication dateDec 4, 2018
Grant dateDec 4, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

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A high performance antenna incorporated on a microelectronic substrate by forming low-loss dielectric material structures in the microelectronic substrates and forming the antenna on the low-loss dielectric material structures. The low-loss dielectric material structures may be fabricated by forming a cavity in a build-up layer of the microelectronic substrate and filling the cavity with a low-loss dielectric material.

First claim

Opening claim text (preview).

What is claimed is: 1. A microelectronic structure, comprising: a microelectronic substrate comprising a substrate core having a first build-up layer on a first surface thereof and a second build-up layer on a second surface of the substrate core opposing the substrate core first surface; a low-loss dielectric material structure formed within the first build-up layer, which extends through the substrate core and extends at least partially into the second build-up layer; and an antenna contacting the low-loss dielectric material structure. 2. The microelectronic structure of claim 1 , wherein the low-loss dielectric material structure contacts the substrate core of the microelectronic substrate. 3. The microelectronic structure of claim 1 , wherein the antenna is embedded in the low-loss dielectric material structure. 4. The microelectronic structure of claim 1 , wherein the low-loss dielectric material structure is selected from the group comprising epoxy, crystal polymer, benzocyclobutene, and polyimide. 5. The microelectronic structure of claim 1 , wherein the low-loss dielectric material structure includes magnetic nanoparticles. 6. The microelectronic structure of claim 1 , further including a microelectronic device attached to the microelectronic substrate and a transmission line connecting the microelectronic device to the antenna. 7. The microelectronic structure of claim 6 , further including a transmission line isolation structure formed in the microelectronic substrate, wherein the transmission line is disposed on the transmission line isolation structure. 8. The microelectronic structure of claim 1 , wherein the first build-up layer comprises a plurality of alternating metallization layers and dielectric layers. 9. A method of fabricating a microelectronic structure, comprising: forming a microelectronic substrate comprising a substrate core having a first build-up layer on a first surface thereof; forming a second build-up layer on a second surface of the substrate core opposing the substrate core first surface; forming a low-loss dielectric material structure within the first build-up layer, which extends through the substrate core and extends at least partially into the second build-up layer; and forming an antenna contacting the low-loss dielectric material structure. 10. The method of claim 9 , wherein forming the low-loss dielectric material structure comprises forming the low-loss dielectric material structure to contact the substrate core of the microelectronic substrate. 11. The method of claim 9 , wherein forming the antenna comprises embedding the antenna within the low-loss dielectric material structure. 12. The method of claim 9 , wherein forming the low-loss dielectric material structure comprises forming the low-loss dielectric material structure from a low-loss dielectric material selected from the group comprising epoxy, crystal polymer, benzocyclobutene, and polyimide. 13. The method of claim 9 , wherein forming a low-loss dielectric material structure within the microelectronic substrate comprises forming a low-loss dielectric material structure having magnetic nanoparticles dispensed therein within the microelectronic substrate. 14. The method of claim 9 , wherein the forming the low-loss dielectric material structure comprises forming a cavity in the microelectronic substrate and disposing a low-loss dielectric material within the cavity. 15. The method of claim 9 , further including attaching a microelectronic device to the microelectronic substrate and connecting the microelectronic device to the antenna with a transmission line. 16. The method of claim 15 , further including forming a transmission line isolation structure formed in the microelectronic substrate, wherein the transmission line is disposed on the transmission line isolation structure.

Assignees

Inventors

Classifications

  • H01Q1/2283Primary

    mounted in or on the surface of a semiconductor substrate as a chip-type antenna or integrated with other components into an IC package · CPC title

  • Antenna or wave energy "plumbing" making · CPC title

  • Modular arrays · CPC title

  • Apparatus or processes specially adapted for manufacturing antenna arrays (manufacturing waveguides H01P11/00) · CPC title

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What does patent US10147997B2 cover?
A high performance antenna incorporated on a microelectronic substrate by forming low-loss dielectric material structures in the microelectronic substrates and forming the antenna on the low-loss dielectric material structures. The low-loss dielectric material structures may be fabricated by forming a cavity in a build-up layer of the microelectronic substrate and filling the cavity with a low-…
Who is the assignee on this patent?
Intel Corp
What technology area does this patent fall under?
Primary CPC classification H01Q1/2283. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Dec 04 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).