Gas floated workpiece supporting apparatus and noncontact workpiece support method

US10147625B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10147625-B2
Application numberUS-201615553990-A
CountryUS
Kind codeB2
Filing dateFeb 12, 2016
Priority dateFeb 27, 2015
Publication dateDec 4, 2018
Grant dateDec 4, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A gas floated workpiece supporting apparatus includes a gas upward ejector ejecting gas upward, and a gas downward ejector located at an upper side from the gas upward ejector and ejecting gas downward. The gas downward ejector is installed at a position where the gas downward ejector ejects the gas downward from above a plate-shaped workpiece to apply pressure to the plate-shaped workpiece that is floated and supported by the gas ejected from the gas upward ejector, whereby a uniform floating amount supports the plate-shaped workpiece with high flatness at a time of floating and supporting the plate-shaped workpiece.

First claim

Opening claim text (preview).

The invention claimed is: 1. A gas floated workpiece supporting apparatus comprising: a gas upward ejector ejecting gas upward; a gas downward ejector located at an upper side from the gas upward ejector and ejecting gas downward; and a gas flow adjusting section that is capable of adjusting at least a gas blowout flow rate and pressure of the gas upward ejector and the gas downward ejector, wherein: the gas downward ejector and the gas upward ejector are arranged such that, in a state in which a plate-shaped work piece is floated and supported by the gas floated work piece supporting apparatus, the gas downward ejector ejects the gas downward from above the plate-shaped workpiece and applies pressure to the plate-shaped workpiece that is floated and supported by the gas ejected from the gas upward ejector; a part of the gas upward ejector is arranged in a region beside and below a working area for the plate-shaped workpiece, blowing out the gas upward; the gas downward ejector is arranged in a region which corresponds to a part of the region where the gas upward ejector is arranged, except for in the working area of the plate-shaped workpiece; the gas downward ejector and the gas upward ejector are arranged such that, in the state in which the plate-shaped workpiece is floated and supported by the gas floated work piece supporting apparatus, the plate-shaped work piece is sandwiched between the gas downward ejector and the gas upward ejector on both sides of the working area for the plate-shaped workpiece, and excluding the working area; and the gas flow adjusting section is capable of adjusting at least one of the gas blowout flow rate and pressure individually for each of ejection holes through which gas flows, or for every predetermined number of the ejection holes, in the gas upward ejector and the gas downward ejector, at least in a region beside the working area. 2. The gas floated workpiece supporting apparatus according to claim 1 , wherein the gas downward ejector is arranged such that a part or a whole of the gas downward ejector corresponds to a part of the region where the gas upward ejector is arranged. 3. The gas floated workpiece supporting apparatus according to claim 1 , further comprising: a position adjusting section that adjusts blowout positions partially or entirely with respect to at least one of the ejection holes provided in the gas upward ejector and the ejection holes provided in the gas downward ejector. 4. The gas floated workpiece supporting apparatus according to claim 3 , further comprising: a control section that controls an adjustment amount of the position adjusting section at a time of floating and supporting the plate-shaped workpiece. 5. The gas floated workpiece supporting apparatus according to claim 4 , further comprising: a detection section that detects a height position of the plate-shaped workpiece, wherein the control section controls the adjustment amount based on a detection result of the detection section. 6. The gas floated workpiece supporting apparatus according to claim 1 , further comprising a position adjusting section capable of position adjustment individually for each of the ejection holes, positions of which are adjustable, or for every predetermined number of ejection holes. 7. The gas floated workpiece supporting apparatus according to claim 6 , further comprising: a control section that controls an adjustment amount of the position adjusting section at a time of floating and supporting the plate-shaped workpiece. 8. The gas floated workpiece supporting apparatus according to claim 7 , further comprising: a detection section that detects a height position of the plate-shaped workpiece, wherein the control section controls the adjustment amount based on a detection result of the detection section. 9. The gas floated workpiece supporting apparatus according to claim 1 , wherein the gas flow adjusting section adjusts at least one of the gas blowout flow rate and pressure, with respect to the ejection holes provided in the gas upward ejector, and a part or all of the ejection holes provided in the gas downward ejector. 10. The gas floated workpiece supporting apparatus according to claim 1 , further comprising: a control section that controls an adjustment amount of the gas flow adjusting section at a time of floating and supporting the plate-shaped workpiece. 11. The gas floated workpiece supporting apparatus according to claim 1 , wherein some or all of the ejection holes provided in the gas downward ejector are overlaid on the ejection holes provided in the gas upward ejector, in mutual blowout directions. 12. A noncontact workpiece support method comprising ejecting gas to a plate-shaped workpiece from above and below the plate-shaped workpiece respectively, to float and support the plate-shaped workpiece in a noncontact manner while the plate-shaped workpiece is sandwiched by the gas, wherein ejecting the gas from below the plate-shaped workpiece comprises ejecting the gas upward from a region including an area below a working area for the plate-shaped workpiece, and wherein ejecting the gas from above the plate-shaped workpiece comprises ejecting the gas from an area except for the working area for the plate-shaped workpiece and in correspondence with a part of the region where the gas is ejected upward from below the workpiece. 13. The noncontact workpiece support method according to claim 12 , further comprising adjusting at least one of a gap amount of ejection positions of gas to the plate-shaped workpiece, and a flow rate of the gas, in order to correct a warp or a curve of the plate-shaped workpiece to flatten the plate-shaped workpiece.

Assignees

Inventors

Classifications

  • for supporting or gripping · CPC title

  • H10P72/30Primary

    for conveying, e.g. between different workstations · CPC title

  • Handling tools for semiconductor devices · CPC title

  • via supply slits · CPC title

  • via porous material · CPC title

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What does patent US10147625B2 cover?
A gas floated workpiece supporting apparatus includes a gas upward ejector ejecting gas upward, and a gas downward ejector located at an upper side from the gas upward ejector and ejecting gas downward. The gas downward ejector is installed at a position where the gas downward ejector ejects the gas downward from above a plate-shaped workpiece to apply pressure to the plate-shaped workpiece tha…
Who is the assignee on this patent?
Japan Steel Works Ltd
What technology area does this patent fall under?
Primary CPC classification H10P72/30. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Dec 04 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).