Beam generation unit and X-ray small-angle scattering apparatus

US10145808B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10145808-B2
Application numberUS-201515114209-A
CountryUS
Kind codeB2
Filing dateFeb 2, 2015
Priority dateMar 27, 2014
Publication dateDec 4, 2018
Grant dateDec 4, 2018

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Abstract

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A micro beam generation unit capable of simultaneously capturing anisotropic images in a high signal-to-background ratio with a compact configuration and an X-ray small-angle scattering apparatus are provided. A micro beam generation unit 110 generates X-rays having a micro spot size, with which a sample is irradiated, in order to detect diffracted X-rays by a one-dimensional detector or a two-dimensional detector. The micro beam generation unit 110 includes a slit 115 that is provided on an X-ray optical path and reshapes X-rays into parallel beams, and two channel-cut monochromator crystals 117 and 118 that are arranged in arrangement of (+, −, −, +) and remove parasitic scattering of parallel beams reshaped by the slit. Accordingly, it is possible to simultaneously obtain anisotropic images in a high signal-to-background ratio with a compact configuration.

First claim

Opening claim text (preview).

The invention claimed is: 1. A beam generation unit that generates X-rays with which a sample is irradiated in order to detect scattered X-rays or diffracted X-rays, the beam generation unit comprising: a slit that is provided on an X-ray optical path and reshapes an X-ray beam shape; two channel-cut monochromator crystals that are arranged in arrangement of (+, −, −, +), remove parasitic scattering of parallel beams reshaped by the slit, and generate parallel and micro X-ray beams; and a first mirror that is arranged in a front stage of the slit, reflects X-rays within an optical path plane that is formed by the two channel-cut monochromator crystals, and prevents divergence of X-rays in a direction vertical to the optical path plane. 2. The beam generation unit according to claim 1 , wherein the first mirror is a focusing mirror that forms a focal point on a detector. 3. The beam generation unit according to claim 1 , wherein the two channel-cut monochromator crystals each have a pair of symmetric cut faces. 4. The beam generation unit according to claim 1 , wherein one of the two channel-cut monochromator crystals has a pair of asymmetric cut faces. 5. The beam generation unit according to claim 1 , further comprising: a second mirror that is arranged in the front stage of the slit, performs reflection within a plane vertical to the optical path plane that is formed by the two channel-cut monochromator crystals, and reshapes divergent beams into parallel beams within the optical path plane. 6. An X-ray small-angle scattering apparatus comprising: a goniometer that mounts the beam generation unit according to claim 1 on a rotary arm. 7. The X-ray small-angle scattering apparatus according to claim 6 , further comprising: a two-dimensional detector that detects scattered X-rays or diffracted X-rays generated by irradiation of a sample with X-rays generated by the beam generation unit. 8. A beam generation unit that generates X-rays with which a sample is irradiated in order to detect scattered X-rays or diffracted X-rays, the beam generation unit comprising: a slit that is provided on an X-ray optical path and reshapes an X-ray beam shape; and two channel-cut monochromator crystals that are arranged in arrangement of (+, −, −, +), remove parasitic scattering of parallel beams reshaped by the slit, and generate parallel and micro X-ray beams, wherein one of the two channel-cut monochromator crystals has a pair of asymmetric cut faces. 9. The beam generation unit according to claim 8 , further comprising: a mirror that is arranged in a front stage of the slit, performs reflection within a plane vertical to an optical path plane that is formed by the two channel-cut monochromator crystals, and reshapes divergent beams into parallel beams within the optical path plane. 10. An X-ray small-angle scattering apparatus, comprising: a goniometer that mounts the beam generation unit according to claim 8 on a rotary arm. 11. The X-ray small-angle scattering apparatus according to claim 10 , further comprising: a two-dimensional detector that detects scattered X-rays or diffracted X-rays generated by irradiation of a sample with X-rays generated by the bean generation unit. 12. An X-ray small-angle scattering apparatus comprising: a beam generation unit that generates X-rays with which a sample is irradiated in order to detect scattered X-rays or diffracted X-rays, the beam generation unit including: a slit that is provided on an X-ray optical path and reshapes an X-ray beam shape; and two channel-cut monochromator crystals that are arranged in arrangement of (+, −, −, +), remove parasitic scattering of parallel beams reshaped by the slit, and generate parallel and micro X-ray beams; and a goniometer that mounts the beam generation unit on a rotary arm. 13. The X-ray small-angle scattering apparatus according to claim 12 , wherein the two channel-cut monochromator crystals each have a pair of symmetric cut faces. 14. The X-ray small-angle scattering apparatus according to claim 12 , wherein one of the two channel-cut monochromator crystals has a pair of asymmetric cut faces. 15. The X-ray small-angle scattering apparatus according to claim 12 , further comprising: a mirror that is arranged in a front stage of the slit, performs reflection within a plane vertical to an optical path plane that is formed by the two channel-cut monochromator crystals, and reshapes divergent beams into parallel beams within the optical path plane. 16. The X-ray small-angle scattering apparatus according to claim 12 , further comprising: a two-dimensional detector that detects scattered X-rays or diffracted X-rays generated by irradiation of a sample with X-rays generated by the bean generation unit.

Assignees

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Classifications

  • monochromators · CPC title

  • Scattering devices; Absorbing devices; Ionising radiation filters · CPC title

  • using diffraction, refraction or reflection, e.g. monochromators (G21K1/10, G21K7/00 take precedence) · CPC title

  • G01N23/201Primary

    by measuring small-angle scattering · CPC title

  • Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions · CPC title

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What does patent US10145808B2 cover?
A micro beam generation unit capable of simultaneously capturing anisotropic images in a high signal-to-background ratio with a compact configuration and an X-ray small-angle scattering apparatus are provided. A micro beam generation unit 110 generates X-rays having a micro spot size, with which a sample is irradiated, in order to detect diffracted X-rays by a one-dimensional detector or a two-…
Who is the assignee on this patent?
Rigaku Denki Co Ltd
What technology area does this patent fall under?
Primary CPC classification G01N23/201. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Dec 04 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).