Slide staining assembly and cover member

US10145767B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10145767-B2
Application numberUS-201314439867-A
CountryUS
Kind codeB2
Filing dateNov 1, 2013
Priority dateNov 1, 2012
Publication dateDec 4, 2018
Grant dateDec 4, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A sample processing assembly for treatment of a sample on a substrate includes a mounting surface for the substrate and a closure body configured to releasably retain a cover member. The closure body is movable between an open position and a substantially closed position. When a substrate is placed in the assembly and the closure body is in the substantially closed position while retaining a cover member, a reaction chamber is formed for processing a sample. A cover member for use with the sample processing assembly is also provided.

First claim

Opening claim text (preview).

The invention claimed is: 1. A sample processing assembly for treatment of a sample on a substrate, the assembly comprising: a mounting surface for mounting the substrate; a cover member; and a closure body configured to releasably retain the cover member, the closure body being movable between a substantially closed position in which the cover member contacts the substrate and forms a reaction chamber therebetween, and an open position in which the cover member is removed from the substrate, wherein the cover member comprises a reservoir configured to receive and store a quantity of fluid and a fluid inlet port for ingress of the fluid from the reservoir into the reaction chamber, and wherein the cover member is releasably attached to the closure body while the closure body is disposed at the open position in which the cover member is removed from the substrate. 2. The assembly according to claim 1 , including at least one first guide configured to limit movement of a substrate in at least a first direction during placement of the substrate in the assembly. 3. The assembly according to claim 2 , wherein the at least one first guide is a protrusion on the mounting surface. 4. The assembly according to claim 1 , further comprising closing biasing means for applying a biasing force such that the closure body is biased in the substantially closed position or an opening biasing means for applying an opening biasing force. 5. The assembly according to claim 4 , further comprising a detention arm with a detent and a bearing surface disposed toward one end of the detention arm, such that when an opening force is applied to the bearing surface, the detent is released from the recess in the closure body and the closure body moves to the open position. 6. The assembly according to claim 1 , further comprising a force distribution member for distributing a force applied to the closure body. 7. The assembly according to claim 1 , wherein the closure body includes a first fluid flow path configured for fluid communication with a fluid port in a cover member when retained by the closure body, wherein in use the first flow path permits fluid transfer between the reaction chamber and a fluid source associated with the sample processing assembly. 8. The assembly according to claim 1 , further comprising a thermo module coupled with the mounting surface, the thermo module being operable to vary the temperature within the reaction chamber. 9. The assembly according to claim 1 , further comprising at least one recess in the mounting surface and arranged co-linearly with at least part of an interior wall of the cover member when retained by the closure body in a substantially closed position, the at least one recess facilitating cleaning of reagent from at least part of the cover member wall. 10. The assembly according to claim 1 , wherein the cover member comprises a release member configured to bear against the substrate to assist with separation of the cover member from the substrate. 11. The assembly according to claim 1 , wherein the reservoir is configured to receive and store a quantity of fluid sufficient for a plurality of treatment steps. 12. A cover member for use in a sample processing assembly, the cover member comprising: a first side; a second side opposing the first side; a void on a first side, the void forming a reaction chamber when the cover member contacts a substrate; and a compressible member on the first side configured to form a seal around the reaction chamber when in use, the compressible member material further extending around a fluid flow port in the cover member and comprising a sealing annulus around an opening of the fluid flow port on the cover member second side, wherein the cover member is releasably retained by a closure body of the sample processing assembly. 13. The cover member according to claim 12 , further comprising a reservoir configured to receive and store a quantity of fluid sufficient for a plurality of treatment steps, and a fluid inlet port for ingress of fluid from the reservoir into the reaction chamber. 14. The cover member according to claim 12 , further comprising a first cavity in the cover member first side which is in fluid communication with a fluid inlet, the first cavity being shaped to form a substantially orthogonal fluid front within the reaction chamber when in use. 15. The cover member according to claim 12 , further comprising a second cavity in the cover member first side which is in fluid communication with a fluid outlet, the second cavity being shaped to draw fluid from a fluid front within the reaction chamber when in use, for evacuation through the fluid outlet. 16. A sample processing assembly for treatment of a sample on a substrate, the assembly comprising: a mounting surface for the substrate; a cover member; a closure body configured to releasably retain the cover member, the closure body being movable between a substantially closed position in which the cover member contacts the substrate and forms a reaction chamber therebetween, and an open position in which the cover member is removed from the substrate; and at least one first guide configured to limit movement of a substrate in at least a first direction during placement of the substrate in the assembly, wherein the at least one first guide is a protrusion on the mounting surface, and wherein the cover member includes a notch which accommodates the first guide when the closure body is in the substantially closed position. 17. The sample processing assembly according to claim 16 , further comprising: biasing means for applying a biasing force such that the closure body is biased in the substantially closed position. 18. The sample processing assembly according to claim 16 , wherein the cover member comprises a release member configured to bear against the substrate to assist with separation of the cover member from the substrate. 19. The sample processing assembly according to claim 16 , wherein the cover member comprises a reservoir configured to receive and store a quantity of fluid sufficient for a plurality of treatment steps, and a fluid inlet port for ingress of fluid from the reservoir into the reaction chamber.

Assignees

Inventors

Classifications

  • Apparatus therefor · CPC title

  • Hinged closures · CPC title

  • rectangular shaped · CPC title

  • G01N1/312Primary

    for samples mounted on planar substrates · CPC title

  • with fluid transport, e.g. in multi-compartment structures · CPC title

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What does patent US10145767B2 cover?
A sample processing assembly for treatment of a sample on a substrate includes a mounting surface for the substrate and a closure body configured to releasably retain a cover member. The closure body is movable between an open position and a substantially closed position. When a substrate is placed in the assembly and the closure body is in the substantially closed position while retaining a co…
Who is the assignee on this patent?
Leica Biosystems Melbourne Pty
What technology area does this patent fall under?
Primary CPC classification G01N1/312. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Dec 04 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).